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Themed collection Spotlight Collection: Atomic and Molecular Layer Deposition

21 items
Perspective

Liquid atomic layer deposition as emergent technology for the fabrication of thin films

Liquid atomic layer deposition (LALD) has emerged as a complementary technology of atomic layer deposition (ALD) to help overcome some of the challenges currently faced from working in the gas-phase.

Graphical abstract: Liquid atomic layer deposition as emergent technology for the fabrication of thin films
From the themed collection: 2021 Frontier and Perspective articles
Perspective

The chemistry of guanidinate complexes of the platinum group metals

In the present Perspective article, synthetic and structural aspects, reactivity studies and applications of platinum group metal complexes containing guanidinate ligands are discussed.

Graphical abstract: The chemistry of guanidinate complexes of the platinum group metals
Communication

Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films

Vapor-phase fabrication of the metal–organic framework ZIF-8 through the conversion of precursors prepared by physical, atomic, and molecular layer deposition.

Graphical abstract: Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films
Communication

Synthesis of volatile, reactive coinage metal 5,5-bicyclic amidinates with enhanced thermal stability for chemical vapor deposition

Coinage metal bicyclic amidinates for chemical vapor deposition.

Graphical abstract: Synthesis of volatile, reactive coinage metal 5,5-bicyclic amidinates with enhanced thermal stability for chemical vapor deposition
Open Access Paper

Quinizarin: a large aromatic molecule well suited for atomic layer deposition

Quinizarin is a well-suited molecule for obtaining strongly colored materials by atomic layer deposition.

Graphical abstract: Quinizarin: a large aromatic molecule well suited for atomic layer deposition
Open Access Paper

About the importance of purge time in molecular layer deposition of alucone films

In MLD of alucone using trimethylaluminum (TMA) and ethylene glycol (EG), TMA is known to infiltrate into the MLD film taking very long to outgas. An insufficient purge can then lead to an additional CVD component in the overall growth.

Graphical abstract: About the importance of purge time in molecular layer deposition of alucone films
Paper

Multi-metal coordination polymers grown through hybrid molecular layer deposition

Ternary coordination polymers deposited by hybrid molecular layer deposition (MLD) techniques are of interest as highly conformal, functional materials.

Graphical abstract: Multi-metal coordination polymers grown through hybrid molecular layer deposition
Paper

Novel hierarchical CuNiAl LDH nanotubes with excellent peroxidase-like activity for wide-range detection of glucose

Novel hierarchical CuNiAl layered double hydroxide (CuNiAl LDH) nanotubes were prepared with the help of atomic layer deposition (ALD) method and exhibited excellent peroxidase mimicking property.

Graphical abstract: Novel hierarchical CuNiAl LDH nanotubes with excellent peroxidase-like activity for wide-range detection of glucose
Paper

A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur

Crystalline MoS2 thin films are deposited via MOCVD using a new molybdenum precursor, 1,4-di-tert-butyl-1,4-diazabutadienyl-bis(tert-butylimido)molybdenum(VI) [Mo(NtBu)2(tBu2DAD)], and elemental sulfur.

Graphical abstract: A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
Paper

Understanding KOtBu in atomic layer deposition – in situ mechanistic studies of the KNbO3 growth process

Providing a deeper understanding of alkali metal-containing ternary processes in ALD by in situ FT-IR and QCM mechanistic studies.

Graphical abstract: Understanding KOtBu in atomic layer deposition – in situ mechanistic studies of the KNbO3 growth process
Open Access Paper

Composition-tuned metal–organic thin-film structures based on photoswitchable azobenzene by ALD/MLD

We demonstrate the fabrication of in-situ crystalline thin films of various azobenzene (AZO) based photoresponsive metal–organic structures using the atomic/molecular layer deposition (ALD/MLD) technique.

Graphical abstract: Composition-tuned metal–organic thin-film structures based on photoswitchable azobenzene by ALD/MLD
Paper

Molecular layer deposited alucone thin films from long-chain organic precursors: from brittle to ductile mechanical characteristics

We tailor mechanical properties of molecular-layer-deposited inorganic–organic films through control over the organic precursor length, relevant for battery applications.

Graphical abstract: Molecular layer deposited alucone thin films from long-chain organic precursors: from brittle to ductile mechanical characteristics
Paper

First principles study of reactions in alucone growth: the role of the organic precursor

First principles investigation of the molecular mechanism of the growth of hybrid organic–inorganic thin films of aluminium alkoxides, known as “alucones”.

Graphical abstract: First principles study of reactions in alucone growth: the role of the organic precursor
Paper

Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition

Novel zinc precursors were designed, synthesized and used for the deposition of ZnO thin films by ALD.

Graphical abstract: Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition
Open Access Paper

Homogeneous Fe2O3 coatings on carbon nanotube structures for supercapacitors

The combination of carbon nanotubes with transition metal oxides can exhibit complementary charge storage properties for use as electrode materials for next generation energy storage devices.

Graphical abstract: Homogeneous Fe2O3 coatings on carbon nanotube structures for supercapacitors
Open Access Paper

Atomic/molecular layer deposition and electrochemical performance of dilithium 2-aminoterephthalate

Crystalline Li-terephthalate and amino-functionalized Li-terephthalate thin film electrodes are fabricated from gaseous precursors with ALD/MLD to show that the electron-donating amino group lowers the redox potential.

Graphical abstract: Atomic/molecular layer deposition and electrochemical performance of dilithium 2-aminoterephthalate
Open Access Paper

Mesoporous ZnO thin films obtained from molecular layer deposited “zincones”

The synthesis of MLD-derived mesoporous ZnO with 20% of porosity is demonstrated and studied by advanced in situ characterization techniques.

Graphical abstract: Mesoporous ZnO thin films obtained from molecular layer deposited “zincones”
Paper

Improving photoelectrochemical response of ZnO nanowire arrays by coating with p-type ZnO-resembling metal–organic framework

Superior photoelectrochemical performance of zinc oxide nanowire arrays is achieved by compactly coating MOF zinc glycolate with p-type conductivity.

Graphical abstract: Improving photoelectrochemical response of ZnO nanowire arrays by coating with p-type ZnO-resembling metal–organic framework
Paper

On the role of micro-porosity in affecting the environmental stability of atomic/molecular layer deposited (ZnO)a(Zn–O–C6H4–O)b films

Correlation between the porosity and environmental stability of Zn-based hybrid multilayer films is studied by means of ellipsometric porosimetry.

Graphical abstract: On the role of micro-porosity in affecting the environmental stability of atomic/molecular layer deposited (ZnO)a(Zn–O–C6H4–O)b films
Paper

Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films

Aluminum dihydride complexes containing amido-amine ligands were synthesized and evaluated as potential reducing precursors for thermal atomic layer deposition (ALD).

Graphical abstract: Aluminum dihydride complexes and their unexpected application in atomic layer deposition of titanium carbonitride films
Paper

The transformation behaviour of “alucones”, deposited by molecular layer deposition, in nanoporous Al2O3 layers

Wet and heat treatments of different alucones result in porous alumina with tuneable porosity and pore size.

Graphical abstract: The transformation behaviour of “alucones”, deposited by molecular layer deposition, in nanoporous Al2O3 layers
21 items

About this collection

Atomic layer deposition (ALD) has been the fastest growing thin-film technology in the semiconductor industry for the last few decades, and is applied in photovoltaics systems and displays. The industrial applications naturally concern only few prototype materials (Al2O3, HfO2, ZnO, TiO2, etc.). However, in recent years the technique has been increasingly exploited towards new application domains and new materials, driving a continued demand for new precursors.

Molecular layer deposition (MLD) is a much less exploited counterpart of ALD for purely organic thin films. Particularly interesting though is the combination of ALD and MLD for hybrid inorganic-organic materials. This combined ALD/MLD technique was introduced in 2008 and it is now strongly emerging for various new MOF-like metal-organic materials and inorganic-organic multilayer structures which are believed to open up novel application possibilities.

This collection is guest edited by Dalton Transactions Associate Editor Prof. Maarit Karppinen (Aalto University) alongside Prof. Anjana Devi (Ruhr-University) and Prof. Jolien Dendooven (Ghent University)

Articles will be added to this themed collection as soon as possible after they are published. Please return to this page frequently to see the collection grow.

If you would like to contribute an article to this collection, please contact the Editorial Office at dalton-rsc@rsc.org with your proposed topic.

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