C. Y. Wanga,
H. Han*a,
D. Wickramaratneb,
W. Zhanga,
H. Wangc,
X. X. Yea,
Y. L. Guoa,
K. Shaoa and
P. Huai*a
aShanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, P. R. China. E-mail: hanhanfudan@gmail.com; huaiping@sinap.ac.cn
bMaterials Department, University of California, Santa Barbara, CA 93106, USA
cSchool of Physics and Engineering, Henan University of Science and Technology, Luoyang 471003, P. R. China
First published on 24th January 2017
The knowledge of the behavior of Te in nickel grain boundaries (GB) is of significant importance for the application of nickel alloys in molten salt reactors. The atomic structures, stabilities, segregation behaviors and diffusion barriers of Te are studied for the bulk, surfaces and four kinds of GBs of nickel. Our first-principles calculations indicate the segregation of Te is most favorable at Σ = 5 (021) GB and the weakest at Σ = 3 (111) GB. The diffusion barriers of Te increase in sequence: Σ = 11 (11), Σ = 9 (221), Σ = 3 (111) and Σ = 5 (021). The calculated diffusion barrier of Te on Σ = 11 (11) is 0.35 eV lower than in the bulk, indicating a fast diffusion of Te along this GB. We also consider the effect of strain on the diffusion and find it to be sensitive to the different GB types. When the tensile strain is up to 4%, the diffusion barriers of Te are lowered by 0.51 eV and 0.15 eV for Σ = 5 (021) and Σ = 11 (11), respectively. In contrast, this effect for Σ = 3 (111) is negligible.
GBs are 2-dimentional defects in the crystal structure which are composed by two differently oriented grains. In solids, GBs belong to the most important defects and the properties of GBs are different from that in the crystal interior. In theory there can be a wide range of GB orientations that can occur. For the purposes of this study, we limit our investigations to GB orientations that are most commonly observed in Ni alloys which are computationally tractable, specifically, the symmetrical tilt grain boundary (STGB).6 In the STGBs, Σ = 3 (111), Σ = 5 (021), Σ = 9 (221) and Σ = 11 (11) GBs are all the experimentally confirmed STGB structures in nickel. Σ = 3 (111) GB is the most commonly observed by experiments.7 Σ = 5 (021) is the most frequently used theoretical STGB model which has been utilized in many works.2,8,9 GB diffusion describes the movement of atoms along the GBs under a driving force, i.e., the difference in chemical potentials. It is well known that atoms move in GBs predominantly by simple exchanges with vacancies, i.e., vacancy-mediated diffusion.10 The fact that the impurity atom preferentially diffuses along GBs has already been observed in many other cases, e.g. thorium in tungsten, molybdenum in tungsten, copper in aluminium and copper in nickel.11 However the diffusion properties of Te in Ni grain boundaries remains unexplored. The implications of these properties on the performance of MSR experiments motivate such an investigation.
In this work, the diffusion and segregation behaviors of Te atom along different GB orientations are investigated with the effects of strain included. These results extend our understanding of the physical properties of Te in nickel based alloys and will give a theoretical guide to the experimental work. Then the high corrosion resistant nickel alloys may be manufactured by controlling the concentrations and proportions of different types of GBs. Our results on Te segregation and diffusion variation with respect to the GB orientation emphasize the GB misorientation dependence phenomena existed in crystals.12
(1) |
Impurity atoms in a crystal can either occupy the interstitial or substitutional site. The large difference in atomic radii between Te (1.40 A) and Ni (1.24 A) would lead to a large local strain for Te being incorporated interstitially. According to our first-principles calculations, the solution energy of Te atom in the octahedral interstitial site of nickel is 6.29 eV while the value in the tetrahedral interstitial site is even larger, which is 6.93 eV. In contrast, the solution energy of Te in the substitutional configuration is only 0.66 eV. Since the interstitial tellurium in nickel is significantly high in energy it is unlikely to occur when Te is incorporated in Ni. Hence, only the substitutional configuration is considered in our further investigation.
As a large solution species, the diffusion of Te atom in nickel is dominated by the vacancy-mediated mechanism, as shown in Fig. 1(a).19–22 According to our calculation, the vacancy formation energy in nickel is 1.44 eV, which is comparable to that in Cu (1.04 eV) and Ir (1.43 eV) obtained by Nazarov et al.23 The calculated diffusion barrier of a substitutional Te atom to the nearest nickel vacancy is 0.75 eV.
Due to the surface effect,24 the properties of Te on different surfaces differ from the bulk properties. The properties of Te on the nickel surfaces were studied by simulating an atomic Te on the top layer of the surfaces. Fig. 1(b–d) depict the investigated diffusion path of Te atom on Ni(111), (021), (221) and (11) surfaces, respectively. The vacancy formation energy (EFVNi), substitutional Te solution energy (ESolTe) and the diffusion barrier (BDif) of Te by the vacancy-mediated mechanism on these nickel surfaces are listed in Table 1. Compared to the EFVNi value in the nickel bulk (1.44 eV), the values for the surfaces decrease obviously, indicating that the nickel surfaces should have larger vacancy concentrations than the bulk. The Ni(021) surface has the lowest value of 0.54 eV, suggesting the vacancies are easily distributed on this surface. Similarly, the solution energy and the diffusion barrier of Te on surfaces are also decreased. The Ni(221) surface has the lowest ESolTe of −2.02 eV. The dramatically lowered ESolTe suggest that Te atom tends to substitute the Ni atom on the surfaces. The Ni(11) surface has the lowest diffusion barrier of Te with the value of only 0.50 eV, suggesting a faster diffusion velocity of Te along this type of GB.
EFVNi | ESolTe | BDif | |
---|---|---|---|
Bulk | 1.44 | 0.66 | 0.75 |
(111) surface | 1.27 | −1.50 | 0.71 |
(021) surface | 0.54 | −1.94 | 0.71 |
(221) surface | 0.63 | −2.02 | 0.89 |
(11) surface | 0.62 | −1.94 | 0.50 |
As we know, atoms at the GB interface have a different arrangement compared to that in the nickel crystal interior. Fig. 2 shows the structures of Σ = 3 (111), Σ = 5 (021), Σ = 9 (221) and Σ = 11 (11) GBs. Three STGB axes of the investigated four GBs are also depicted in Fig. 2. To obtain the GB structures, the length of the computational box along the direction parallel to the GB interface (axis b and c) is fixed, while along the other direction perpendicular to the plane of the GB interface (axis a) the box size is determined based on the lowest grain boundary energy of GB (γ) with all the internal atoms fully relaxed. The energy is plotted as a function of the strain, as shown in Fig. 3. The optimized box sizes perpendicular to the Σ = 3 (111), Σ = 5 (021), Σ = 9 (221) and Σ = 11 (11) GBs interface plane are 24.43 Å, 16.45 Å, 25.22 Å and 23.70 Å, respectively.
The stability of the GBs is usually assessed by their grain boundary energies34 defined as:
γ = (Etot − NEcoh)/2A | (2) |
δV = (Vtot − NΩbulk)/2A | (3) |
Our calculated grain boundary energies and excess volume values are listed in Table 2. The grain boundary energies are ordered in the sequence of Σ = 3 (111) < Σ = 11 (11) < Σ = 5 (021) < Σ = 9 (221). In general the volume expansion of GBs is directly related to the grain boundary energy.36 The excess volumes behave approximately linearly with the grain boundary energies, except for the Σ = 9 (221) GB. The large grain boundary energy of Σ = 9 (221) STGB is originated from the fact that Σ = 9 (221) transitional tilt GB is more stable than Σ = 9 (221) STGB. However, we still employed Σ = 9 (221) STGB just like the GB model of Alexandrov et al.30 in this work because the diffusion study needs tremendous computing workload for Σ = 9 (221) transitional tilt GB. As shown in Table 2, it is obvious that Σ = 3 (111) GB has the lowest excess volume and grain boundary energy. It is reasonable since the interface plane of Σ = 3 (111) GB is the close-packed (111) surface of nickel in which the atomic arrangement is only slightly distorted compared to that in the bulk interior. In contrast, for the other GBs (Σ = 5 (021), Σ = 9 (221) and Σ = 11 (11)), the excess volume of these GBs is relatively larger with respect to Σ = 3 (111) and the atomic arrangement is significantly distorted.
GBs | Σ = 3 (111) | Σ = 5 (021) | Σ = 9 (221) | Σ = 11 (11) |
---|---|---|---|---|
γ | 0.0072 | 0.0818 | 0.1208 | 0.0291 |
δV | 0.0959 | 0.4039 | 0.2652 | 0.2276 |
ESeg = EGBb − Ebulkb | (4) |
Eb = EtotGB,Te − EbulkTe − EtotGB + EbulkNi | (5) |
The binding energy (Eb) and segregation energy (ESeg) of Te at different GB sites are calculated for Σ = 3 (111), Σ = 5 (021) and Σ = 11 (11) GBs, as shown in Fig. 4. However, the related results of Σ = 9 (221) GB cannot be obtained, due to the instability of Σ = 9 (221) STGB after Te doping. This instability is owed to the broken symmetry induced by the impurity doping, which is consistent with the previous studies.32,37 Although a symmetric Σ = 9 (221) GB is a good model to study the diffusion properties of impurities,30 it is not suitable to study the segregation behavior. For Σ = 3 (111), Σ = 5 (021) and Σ = 11 (11) GBs, the most active segregation sites are all at the GB interface plane. The segregation energies increase from the interface plane to the bulk area of the GB for all three GBs. For Σ = 3 (111) and Σ = 11 (11) GBs, the relative large segregation energy (−0.35 eV and −0.54 eV) for Te at the interface layer indicates weak segregation. For Σ = 5 (021) GB, the segregation energy is under −1 eV at the interface. The gradient of its segregation energy is also very large, which indicates a strong tendency for Te segregating to the interface. Therefore, the segregation of Te is most favorable at Σ = 5 (021) GB, while it is the weakest at Σ = 3 (111) GB.
Fig. 4 Calculated binding energy (Eb) and segregation energy (ESeg) for one Te atom at each atomic site (the numbers of atomic sites having been labelled in Fig. 2) in the investigated supercells for (a) Σ = 3 (111), (b) Σ = 5 (021) and (c) Σ = 11 (11) GBs. The lines joining the calculated quantities are drew as eye guidance. |
The embrittlement caused by impurities can also be evaluated by embrittling energy.38 According to the Rice-Wang model, the embrittling energy (ΔEE) can be expressed as the difference between the binding energies of Te atoms at the GB (ΔEGB) and the free surface (ΔEFS):
ΔEE = ΔEGB − ΔEFS | (6) |
(7) |
(8) |
Based on our calculation, the embrittling energies for Σ = 3 (111), Σ = 5 (021), Σ = 9 (221) and Σ = 11 (11) GBs are 2.66 eV, 1.63 eV, 1.74 eV and 2.13 eV, respectively. In terms of the definition of ΔEE, a negative value of ΔEE means enhancement of the GB cohesion, and a positive value corresponds to GB embrittlement. Therefore, the introduced Te atom would cause embrittlement for all these four GBs in nickel alloy.
In the state of tension, the increasing strain will cause the GB interface to fracture into different surfaces. The stress relief by the formation of the corresponding surfaces could change the diffusion barrier of Te atom. Therefore, the above results for Te diffusion at different GBs are compared with the ones on their corresponding surfaces. As listed in Table 1, the calculated diffusion barriers for Ni(111), (021), (221) and (11) surfaces are 0.71 eV, 0.71 eV, 0.89 eV and 0.50 eV, respectively. The diffusion barrier value of 0.71 eV on Ni(111) surface is similar with that at Σ = 3 (111) GB, with a negligible difference of 0.03 eV. The Te atom diffusion barrier value on Ni(021) surface is smaller than the one at Σ = 5 (021) GB by 0.7 eV. In contrast, the Te atom diffusion barrier values on Ni(221) and Ni(11) surfaces are both larger than their counterparts at the GBs by 0.23 eV and 0.10 eV, respectively.
Fig. 7 gives the calculated diffusion barrier of Te atom along four kinds of GBs under different strains. Overall, the results show that the interfacial strain has a similar effect on the Te diffusion behavior at different GBs. The diffusion barriers increase with the GBs under a compressive strain, and decrease under a tensile strain. Therefore, it implies that a tensile strain can increase the diffusivity of Te at nickel GBs. In details, the structures of GBs is also very sensitive to the strain effect. The strain effect for Σ = 3 (111) GB is the smallest and the diffusion barriers' variation is below 0.05 eV for both tension and compression up to 4%. The strain effect for Σ = 9 (221) GB is also relatively small, but the diffusion barrier has a relatively large drop when the tensile strain reach 4% owing to the fact that Σ = 9 (221) transitional tilt GB is more stable than Σ = 9 (221) STGB. The diffusion barrier for Σ = 11 (11) GB is the smallest among the investigated four GBs while the strain effect for this GB is very large. When the tensile strain reaches 4%, the Te diffusion barrier is lowered by 0.15 eV. The lowered barrier is only 0.25 eV, suggesting that Te diffuses fast along the strained Σ = 11 (11) GB. Moreover, it can be found that the Σ = 5 (021) GB exhibits the most remarkable strain effect, and the Te diffusion barrier drops 0.51 eV under a tensile strain of 4%, indicating that Σ = 5 (021) GB is the most sensitive to the tensile strain.
In order to clarify the origin of the strong strain effect on the diffusion barrier of Te at Σ = 5 (021) GB, the variation of interlayer distances (Δd) under 4% tensile strain is analyzed. As shown in Fig. 8, for Σ = 3 (111) and Σ = 11 (11) GBs, their interlayer distances increase uniformly under the tensile strain. In contrast, Δd near the interface layer for Σ = 9 (221) GB oscillates strongly. Interestingly, Σ = 5 (021) GB has an obviously different property from the above discussed GBs. As shown in Fig. 8(b), the strain brings about large oscillation of Δd in the two layer region adjacent to the GB interface plane and Δd is up to 13%. When goes beyond the two layers, the oscillation of Δd becomes very small. Therefore, Σ = 5 (021) GB has very large structural variation while being stretched, which explains the strong strain effect on the diffusion barrier of Te. One may argue the Σ = 5 (021) GB has the fewest atoms in our simulations, which may make differences when under a strain. In order to ensure the slab is thick enough to repeat the properties of the Σ = 5 (021) GB, a similar calculation is carried out with the number of layers doubled. As shown in Fig. 8(b), the values obtained by the model with the doubled thickness are consistent with the origin one, indicating the model with 120 atoms is sufficient for Σ = 5 (021) GB.
(1) Te is energetically favourable at the substitutional site of nickel for its large atomic volume. Compared to the energy in the nickel bulk, the values of vacancy formation energy, Te substitutional solution energy, and Te diffusion barrier are all decreased obviously on the surfaces, indicating that Te is more easily to diffuse on nickel surfaces by the vacancy-mediated mechanism.
(2) The stability of the GBs is studied by their grain boundary energies. The calculated grain boundary energies are ordered by the following sequences: Σ = 3 (111) < Σ = 11 (11) < Σ = 5 (021) < Σ = 9 (221). And the calculated excess volumes behave approximately linearly to the grain boundary energies, except for the Σ = 9 (221) GB, which originates from the fact that Σ = 9 (221) transitional tilt GB is more stable than Σ = 9 (221) STGB.
(3) The calculated segregation energies indicate that Te has a strong tendency to segregate to the interface layer of the GB. The calculated embrittling energies for nickel GBs are all positive, verifying the embrittling effect of Te atom. The diffusion barrier values are very sensitive to the GB types, and increase in sequence: Σ = 11 (11), Σ = 9 (221), Σ = 3 (111) and Σ = 5 (021) GBs.
(4) The exploration of the applied strain influence on the diffusion barriers is conducted and the diffusion barriers show obvious variations. Our results imply that a tensile strain can greatly increase the diffusivity of Te at nickel GBs, especially for Σ = 5 (021). This is due to the large structural change near the interface layer caused by strain, which explains the strong strain effect on the diffusion barrier of Te at Σ = 5 (021) GB.
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