Open Access Article
Jian-An Huang‡
,
Yingqi Zhao‡,
Xiaoyue Zhu and
Wenjun Zhang*
Center of Super-Diamond and Advanced Films (COSDAF), Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR. E-mail: apwjzh@cityu.edu.hk
First published on 17th January 2017
While the surface-enhanced Raman spectroscopy (SERS) technique has the merit of an inherent ultrahigh sensitivity, low signal reproducibility due to nonuniformities in SERS substrates is a challenge to be considered for its practical applications. Utilizing averaging effects to improve the signal reproducibility can be achieved by either increasing hot spot density on the SERS substrates or using large laser spots to enlarge the probing area. However, mechanisms of how the averaging effects overcome the nonuniformities and improve the reproducibility remain unclear. Herein, we use ordered SERS substrates with designed gap-based and gap-free electric fields in the hot spots to systematically study the mechanisms. Our result suggests that the highest reproducibility comes from the gap-free hot spots that depend on the least parameters. In contrast to the gap-based substrate with a trade-off relation between reproducibility and enhancement, the gap-free substrate exhibits both high reproducibility and high enhancement. Our findings clarify the contributions of the SERS substrate to the averaging effect and could pave the way to the design of reproducible SERS substrates for further practical applications.
In order to generate reproducible SERS spectra at any positions of a gap-based SERS substrate, in general, three scales of uniformity in the substrate should be achieved: (1) uniform distribution of enhancing nanostructures over the SERS substrate, (2) uniform distribution of the hot spot over all enhancing nanostructures and (3) uniform distribution of analyte molecules over all hot spots. An enhancing nanostructure can be a metal nanocolloid, a metal nanoparticle dimer, or a metal nanotip that can be used for the SERS applications. When the metal nanocolloids are dropped and then dried on a silicon wafer, they will distribute randomly on the wafer depending on solution drying dynamics. The uniform distribution of the enhancing nanostructures requires that the number of the enhancing nanostructures under an excitation spot should remain the same in different positions over the SERS substrate, which could be achieved in SERS systems based on ordered plasmonic structures by top-down fabrications, such as nanosphere lithography-fabricated plasmonic nanosphere array.24
In addition, a hot spot can be any enhancing nanostructures as mentioned that exhibit enhanced electric field at surface plasmon resonance for molecule excitation.15,25,26 The field intensity characterizes how “hot” a hot spot can be and depends on the morphology of the enhancing nanostructures, such as size, shape and inter-particle spacing of the metal nanoparticle dimer. The uniform distribution of the hot spot or the field over all metal nanoparticle dimers therefore requires all dimers on the SERS substrate have similar size, shape and the inter-particle spacing. One problem with the gap-based SERS substrates is the strong dependence of electric field on the inter-particle spacing (<10 nm), yet the fabrication of dimer-based substrates with highly precise control of the gap size less than 10 nm is very challenging.27,28
As the final piece of the puzzle, the hot spots cannot generate SERS signals without being occupied by analyte molecules. The even distribution of molecules requires that the number of molecules and their positions in the hot spot remain the same throughout the SERS substrate. However, even on the highly-ordered plasmonic nanosphere array with precisely controlled gap size, the homogeneous adsorptions of molecules in the gaps are inherently difficult to achieve. In particular, the high SERS enhancement requires small gap distance, but the narrow gaps make molecules extremely difficult to distribute uniformly on the gaps.18
Averaging effect, a common way to improve signal reproducibility in SERS, is based on collecting more SERS signals from either more hot spots or more molecules in one Raman measurement. It can be achieved by modifying either the SERS substrates or Raman measurement settings. For example, in the colloidal-based SERS systems, signal reproducibility can be improved by prolonging signal acquisition time or allowing flowing colloids to enter the collection volume of the Raman measurement objective.29,30 On solid-state SERS substrates, the averaging effect can be achieved by enlarging excitation laser spots through changing different measurement objectives to cover more hot spots.31 However, excitation of more hot spots might include more array defects. Furthermore, large laser spot must be obtained by a low-magnification objective which corresponds to low signal-collection efficiency. Although the averaging effect could improve the reproducibility of many gap-based SERS substrates, its relation to the electric fields of the enhancing structures and connection to the three scales of uniformity remain unclear. The vague understanding of the averaging effect actually hampers the development of reproducible SERS systems.
In this paper, we report a systematical investigation of two approaches leading to the averaging effects on solid-state SERS substrates: increasing hot spot density on the SERS substrates or using large laser spots to enlarge probing area. The connection between the averaging effects and the three scales of uniformity were analyzed by studying the SERS reproducibility of three ordered SERS substrates: two gap-based substrates including Ag nanoparticles coated on Si nanowire array (AgNP/SiNW) and continuous Ag film coated on hexagonal-close-packed nanospheres (AgFON), and one gap-free substrate comprising continuous Ag film coated on Si nanowire array (Ag/SiNW). The electric fields of the AgNP/SiNWs depend on particle size and inter-particle spacing. Together with particle size and inter-particle spacing, the electric field of the AgFON also depends on the nanosphere array defects. In contrary to these gap-based substrates, the gap-free Ag/SiNWs exhibit electric fields that depend only on nanowire size rather than the inter-particle gaps.32,33 By the designed electric fields of these SERS substrates, we are able to study how averaging effect can take effect through the electric fields to improve the reproducibility. The influence of molecular distribution, molecule type and laser beam size on the averaging effect and reproducibility are also discussed. The results are useful to discriminate contributions of the substrate to the SERS reproducibility and pave a way to the design and optimization of SERS substrates for further practical applications.
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1 (volume) with ethanol and injected slowly onto water surface to form a monolayer. Then, the monolayer was transferred to a clean silicon wafer by lifting up the Si wafer that was placed previously in the water and drying it in the atmosphere. O2 plasma etching was carried out in the Plasma-Therm 790 RIE system to reduce the PS diameter to 110 nm. During etching, the O2 flow rate was 40 sccm, pressure 37 mTorr, radio frequency power 30 W and duration 5 minutes. Then a 20 nm-thick gold layer was coated by electron beam evaporation. After removing PS in chloroform, metal-assisted chemical etching was performed to form a SiNW array by placing the as-prepared substrate in to a mixed etchant solution of hydrofluoric acid and hydrogen peroxide for a few minutes depending on the wire length.35,36 For Ag/SiNWs, a ∼40 nm-thick continuous silver layer was deposited on the SiNWs by high-vacuum magnetron sputtering at a pressure of 10−5 mBar. AgNP/SiNWs were fabricated by decorating AgNPs on SiNW in a low-vacuum sputtering coater at a pressure ∼10−3 mBar. The low vacuum leads to large-sized Ag particles sputtered by the plasma. The deposition time was adjusted from 30 s, 90 s to 180 s to fabricate high-density AgNP/SiNWs samples. Low-density AgNP/SiNWs sample that decorated large AgNP on SiNWs was fabricated by annealing the AgNPs on SiNW samples at 400 °C for 30 min under nitrogen atmosphere at a pressure of 1 Bar.
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1 volume) were injected slowly onto water surface to form a monolayer. By lifting up the Si wafer from the water the monolayer was transferred to a clean silicon wafer, and dried in the atmosphere. Then the wafer was loaded in the thermal evaporation chamber. A silver film of ∼40 nm was evaporated on the top of the nanosphere array to form an AgFON structure.
The change from AgNPs to the formation of Ag film on the SiNW is accompanied by evolution of the electric fields. As shown in Fig. 2a and ESI Fig. S1,† the electric field due to localized surface plasmon resonance (LSPR) of the AgNPs is confined on the surface of the nanoparticles and depends on the size when AgNPs are largely separated in low-density AgNP/SiNWs. When the AgNPs are close to each other as in the case of the high-density AgNP/SiNWs, the field will couple to each other to form gap-based field that depends on both the particle size and the gap spacing between neighboring nanoparticles as shown in Fig. 2b.37–40
When the sputtered Ag forms a continuous film on the SiNWs as the Ag/SiNWs sample, the electric field becomes widely distributed on the wire surface as shown in Fig. 2c. The wide electric field is due to propagating surface plasmon travelling on the Ag surface and depends on the wire diameter (ESI Fig. S2†). The wide field free from influence of inter-particle gaps makes Ag/SiNWs a gap-free SERS substrate.9,33 Furthermore, due to poor coupling of the illumination light to the localized surface plasmon, the rough Ag film makes negligible contribution to SERS enhancement as proved in ESI Fig. S3.† Thus, the SERS performance of the Ag/SiNWs substrate depends mainly on the gap-free field on the wire. Another contribution to the field enhancement could be grating effect of two dimensional arrays of metal nanoparticles due to dipolar interaction among the nanoparticles.41,42 In the case of Ag/SiNWs sample, the inter-wire spacing is about 150 nm such that the grating effect should be very weak.
In contrast, AgFON made by coating a continuous Ag film on a hexagonal-close-packed (HCP) monolayer of uniform nanospheres exhibits a gap-based field that depends mainly on the inter-sphere gaps, as shown in Fig. 2d. Similar to Ag/SiNWs, the roughness of the deposited Ag film made no contributions to the SERS enhancement. However, the roughness can lead to variation of the inter-sphere gap spacing, significantly change the gap-based field and thus affect the signal reproducibility. Furthermore, the gap-based field is subject to defects of the HCP nanosphere monolayer such as line defect and inconsistent gap distance as shown in ESI Fig. S4.† With the gap-free field from the Ag/SiNWs and the gap-based field from the AgFON, we will be able to investigate how the field distribution within the hot spot affects the averaging effect on the reproducibility in the following sections.
The signal reproducibility of a SERS substrate is evaluated by the relative standard deviation (RSD, defined as the standard deviation divided by the mean) of enhancement factors (EFs) of selected peaks of 4-ABT SERS spectra obtained by Raman mapping on a 120 μm × 120 μm area on the SERS substrates. The EFs of the gap-based AgNP/SiNWs is at the scale of 104, but the EFs of the gap-based AgFON and gap-free Ag/SiNW are as similar as 7 × 105, as calculated in ESI.† The lower the RSD is, the higher the signal reproducibility the SERS substrate will be. In the following sections, the reproducibility by two averaging effects on the SERS substrate will be evaluated and the mechanism of the reproducibility enhancement by the averaging effects will be analyzed based on the three scales of uniformity: uniform distribution of enhancing nanostructures over a SERS substrate, uniform distribution of the hot spot (or electric field) over all enhancing nanostructures and uniform distribution of analyte molecules over all hot spots.
The reproducibility improvement by increasing hot spot density in the high-density AgNP/SiNWs should be due to the uniform electric fields of the AgNPs. The AgNPs exhibit more uniform distribution in particle size and spatial distribution on the wire as the density increase from sample A to C in Fig. 3b, which leads to the increased similarity of the AgNP gap-based fields from wire to wire (Fig. 2b).46 When the AgNPs are so dense that they form a continuous Ag film on the SiNW as the AgNP/SiNWs sample D, the RSD approaches to that of the Ag/SiNW and the field is expected to become the gap-free field as in Fig. 2c that is subject only to the nanowire size. Since the SiNWs are uniform in the array, the gap-free field of the AgNP/SiNW sample D is uniform from wire to wire such that the reproducibility is further increased. The small RSD (<15%) of the AgNP/SiNW sample D and the Ag/SiNWs should be due to the gap-free field variation resulted from the Ag film roughness on the wires.
On the other hand, AgFON exhibits the lower density of hot spots compared to the AgNP/SiNWs substrates. Different from the gap-based field of AgNP/SiNW, the AgFON gap-based field would depend on Ag roughness as well as defects in the nanosphere assembly array, such as non-HCP line defect and inconsistent gap distance as shown in ESI Fig. S4.† Therefore, a low reproducibility of AgFON can be expected. As shown in Fig. 4, the RSDs (>40%) of the AgFON are more than two times higher than those on the Ag/SiNW substrate having the same period of 470 nm. The averaging effect on improving the signal reproducibility in AgFON can reply on using small nanospheres or larger probing areas, as described in the following section.
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| Fig. 4 (a) The RSDs of 4-ABT monolayer on AgFON and Ag/SiNW. (b) The colored Raman mapping of the normalized 1076 cm−1 intensity on 120 μm × 120 μm areas of the corresponding samples. | ||
Fig. 5a and b compare the RSDs of three signature peaks of 4-ABT monolayer on the Ag/SiNW and the AgFON substrate with the same period (P) of 470 nm under different probing areas. The RSDs of Ag/SiNW in Fig. 5a decreases by 20% when the objective changes from the 100× to the 20×. Since the gap-free field of Ag/SiNW depends only on the nanowire size, the RSD drop is due to the suppression of the size variation of the nanowires by probing a 3 μm spot of the array. In contrast, the RSD of 4-ABT of AgFON drops by >40% in Fig. 5b. Significantly, the RSD of 1179 cm−1 peak decreases by almost 100%. The 1179 cm−1 peak was attributed to the transformation of 4-ABT molecules to 4,4′-dimercaptoazobenzene (DMAB) under laser excitation.47 The sharp RSD drop of the 1179 cm−1 peak on AgFON could be due to more 4-ABT molecules transformed to DMAB because the 100× objective delivered much higher excitation energy for the transformation than the 20× objective. Due to the nature of the AgFON gap-based field, the RSD drops of other two 4-ABT peaks should correspond to the suppression of defects that the HCP nanoparticle array may have in a 1 μm spot, including non-uniform sphere size, non-HCP line defect and inconsistent gap distance. This implies that the array defects that are different in the scale of 1 μm become more similar at the scale of 3 μm.
Similarly, in the Ag/SiNW substrate with a period of 300 nm in Fig. 5c, the reproducibility enhancement is also about 20% by increasing probing area by changing the 100× objective to the 20×, indicating similar size variation of the nanowires. However, the biggest RSD drop of the AgNP/SiNW of 300 nm period in Fig. 5d is also about 20%, which emphasizes the significant difference between the AgNP gap-based fields and the AgFON gap-based field. The AgNP field depends on the size and gap spacing of AgNPs on an individual nanowire and is not affected by the defects of the nanowire array.
We can summarize how the reproducibility is affected by the substrate uniformity through the electric fields. The reproducibility of the Ag/SiNW is the highest because its gap-free field is only affected by the nanowire size variation. AgNP/SiNWs exhibit lower reproducibility because the AgNP gap-based field is affected by AgNP size and the inter-particle gap spacing. The reproducibility of the AgFON is the lowest because the AgFON gap-based field depends on many array defects. The best reproducibility of a SERS substrate corresponds to the field that depends on the least parameters.
It is well-known that the signal reproducibility increases at the cost of SERS enhancement,14 and this is the case to the gap-based AgNP/SiNWs and AgFON substrates. For example in Fig. 5, the RSDs of the 1076 cm−1 peak under 100× objective are ∼40% for the AgNP/SiNWs and ∼80% for the AgFON, respectively, while the corresponding EFs on the two substrates are 2.0 × 104 and 4.7 × 105. The trade-off relation between reproducibility and enhancement for the gap-based substrates is because smaller nanogaps (<10 nm) in the hot spots required by higher enhancement can hardly be fabricated uniformly by current nanotechnologies.
However, the trade-off relation does not apply to the gap-free Ag/SiNWs substrate. In all the cases we discussed above, the Ag/SiNWs exhibit higher reproducibility and higher EFs than the AgNP/SiNWs. Similarly, the Ag/SiNWs demonstrate higher reproducibility than the AgFON and their EFs are at the same level. Although AgFON performance can be increased by other fabrication parameters,48 the fabrications of the Ag/SiNWs and the AgFON used the same parameters to achieve LSPR at 633 nm wavelength: same nanosphere array as template and same Ag sputtering time for the continuous Ag layer. It rules out the SERS performance differences being due to different fabrication parameters. The high reproducibility and high enhancement of the Ag/SiNWs is actually due to the gap-free electric field as the hot spots: high enhancement requires high density of the gap-free Φ 150 nm nanopillars that can be fabricated uniformly over a large area by nanosphere lithography. Furthermore, the gap-free hot spots allow uniform absorption of analytes while the gap-based hot spots do not, as described in the next section.
The RSD difference on the Ag/SiNWs in Fig. 6a decreases with increasing R6G concentration and reaches minimum at 0.02 mM, suggesting that R6G monolayer is formed on Ag surface at 0.02 mM and the peak fluctuation is dominated by hot spot variation. The monolayer formation is supported by calculating the needed amount of R6G molecules for forming a monolayer. In our experiment, a 2 μL droplet of R6G solution spreads out as a 3 mm circle on the SERS substrate. For the Ag/SiNWs with 700 nm height, 150 nm diameter and 470 nm period, the surface area covered by the 5 mm circle of the 2 μL droplet is ∼4.1 × 1013 nm2. One R6G molecule occupies 0.4 nm2 in perpendicular orientation to Ag surface and 4 nm2 in parallel orientation, respectively.54,55 Thus the number of R6G molecules to form monolayer on the Ag/SiNW sample is at the scale between 1013 and 1014. Therefore, a 2 μL droplet of 0.004 mM R6G solution contains 1012 molecules which are not enough to form a monolayer. The obvious RSD difference among the Raman peaks at 4 × 10−6 M in Fig. 6a is likely due to different molecular orientations of adsorption such that different parts of the molecules experience different electric fields at the hot spots. In contrast, the molecule amount of 2 μL 0.02 mM R6G solution reaches 1013 that can form monolayer. The RSD difference at 0.02 mM of the Ag/SiNWs sample reaches minimum and keep stable in 0.08 and 0.2 mM, indicating that all peaks fluctuate similarly depending mainly on the hot spot field distribution. Similar trend can also be observed in the case of the AgNP/SiNWs sample in Fig. 6b and the same assumption of monolayer formation at 0.02 mM applies.
Although the monolayer is formed, the occupations of nanogaps by the R6G molecules are still not uniform and increases with concentrations. As the R6G concentration increases from 0.02 to 0.2 mM, the RSDs of the AgFON decrease from 55% to 40% in Fig. 6a. The RSD drop should be due to the increased occupation of the AgFON gaps by the R6G molecules of high concentration. The AgFON gaps are too narrow to allow uniform adsorption of the R6G molecules in them.18 As more R6G molecules are adsorbed on the AgFON, the probability of the R6G molecule entering the AgFON gaps increases and thus the occupation of the hot spots becomes more uniform. Similar increased occupation of AgNP gaps also accounts for the ∼15% drop of RSDs in the AgNP/SiNWs from concentration at 0.02 to 0.2 mM in Fig. 6b. The ∼15% RSDs of AgNP/SiNWs at 0.2 mM against the high RSD (40%) of AgFON at the same concentration should be attributed to the averaging effect of increased hot spot density, because the AgNP/SiNWs exhibits much more nanogap hot spots than AgFON.
On the other hand, the RSDs of the gap-free Ag/SiNWs (Fig. 6b) exhibit little changes during the concentration changing, which is due to the gap-free field as well as large wire-to-wire separation. The wire-to-wire separation of the Ag/SiNWs is 150 nm and allows the R6G molecules of low concentration easily adsorb on the wire sidewall and excited by the gap-free field, thus avoiding the occupation problem in the gap-based substrates. In this regard, high R6G concentration will have more R6G molecules adsorb on the wire surface and increase the signal intensity. The molecule distribution in the gap-free field is not changed and thus has little impact to the reproducibility.
Footnotes |
| † Electronic supplementary information (ESI) available: Enhancement factor calculations, additional information, figures, and references. See DOI: 10.1039/c6ra28364k |
| ‡ These authors contributed equally to this work. |
| This journal is © The Royal Society of Chemistry 2017 |