Open Access Article
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Correction: Nanometer-level high-accuracy molding using a photo-curable silicone elastomer by suppressing thermal shrinkage
Katsuo
Mogi
,
Yuki
Hashimoto
,
Takehiko
Tsukahara
,
Motoki
Terano
,
Masahiko
Yoshino
and
Takatoki
Yamamoto
*
Tokyo Institute of Technology, Department of Mechanical and Control Engineering, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8550, Japan. E-mail: yamamoto@mes.titech.ac.jp; Fax: +81-3-5734-3182; Tel: +81-3-5734-3182
First published on 26th January 2015
Abstract
Correction for ‘Nanometer-level high-accuracy molding using a photo-curable silicone elastomer by suppressing thermal shrinkage’ by Katsuo Mogi et al., RSC Adv., 2015, 5, 10172–10177.
The name of the third author is incorrect in the paper. The correct name is ‘Takehiko Tsukahara’, as shown above.
The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.
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