Issue 8, 2014

Photochemical and Ga2O3-photoassisted decomposition of the insecticide Fipronil in aqueous media upon UVC radiation

Abstract

Fipronil is a phenylpyrazole-based insecticide and one of the relatively new widely used generations of insecticides whose biochemical action differs from the more traditional insecticides such as the organo-phosphates and -carbamates. Although several studies have been reported to determine the fate of Fipronil under environmental field conditions, including irradiation with UVB/UVA natural or simulated sunlight (wavelength >290–300 nm), which resulted in the formation of products that retained the basic phenylpyrazole structure, the present article examines the photodegradation of Fipronil upon irradiation of aqueous solutions under both reducing (nitrogen) and oxidative (air oxygen) atmospheric conditions at 254 nm (UVC; low-pressure Hg lamp), and for comparison purposes in the presence of the wide band-gap (4.8–5.0 eV) gallium sesquioxide (β-Ga2O3) semiconductor (and for comparison also TiO2). The fate of the insecticide under such conditions was ascertained by absorption spectroscopy in the UVC spectral region, by HPLC techniques for the desulfonation, defluorination, dechlorination and formation of both nitrate and ammonium ions, in addition to ESI-TOF-MS mass spectral methods to identify some of the possible intermediates that may have formed following the breakup of the phenyl and pyrazole rings. Mass spectra indicated that within 30 min filoprin was converted to Fipronil-desulfinyl (loss of S[double bond, length as m-dash]O fragment; photoproduct (III)) and in less than 1 hour of irradiation a significant quantity of the insecticide's photoproduct (III) had also decomposed as no significant mass peaks were seen above m/z = 319. The largest yields of SO42− (79%), F (44%), Cl (33%), NO3 (34%) and NH4+ (15%) were obtained under air-equilibrated conditions in the presence of the metal oxide β-Ga2O3 (Ga2O3/O2), followed by air O2, Ga2O3/N2 and under N2 atmospheric conditions. Frontier electron densities and partial charges on all the atoms of Fipronil were calculated (hf/6-31g* configuration; Gaussian 09 software) to infer a possible, albeit not detailed, pathway(s) for the direct photolysis and when the metal oxides were involved in the photodegradation. In addition, Ames tests were carried out on the intermediate products of the photodegradation of Fipronil after 3 h and 24 h of UVC illumination; none of the intermediates displayed mutagenic activity.

Graphical abstract: Photochemical and Ga2O3-photoassisted decomposition of the insecticide Fipronil in aqueous media upon UVC radiation

Supplementary files

Article information

Article type
Paper
Submitted
07 Apr 2014
Accepted
11 Jun 2014
First published
11 Jun 2014

New J. Chem., 2014,38, 3939-3952

Author version available

Photochemical and Ga2O3-photoassisted decomposition of the insecticide Fipronil in aqueous media upon UVC radiation

H. Hidaka, T. Tsukamoto, Y. Mitsutsuka, T. Takamura and N. Serpone, New J. Chem., 2014, 38, 3939 DOI: 10.1039/C4NJ00527A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements