Amine-terminated nanoparticle films: pattern deposition by a simple nanostencilling technique and stability studies under X-ray irradiation

Abstract

Thin films made up of arrays of amine-terminated silicon nanoparticles (NH₂-SiNPs) synthesized by a new evaporation technique have been formed by employing TEM grids as nanostencils. FTIR imaging illustrates the feasibility of the method in nanoscale device fabrication applications. Micro-mapping over areas of the nanoparticle material allows the surface chemistry to be examined. FTIR imaging shows trace amounts of oxide confined to the NP surfaces. Thicker films formed by dropcasting allowed the nanoparticle behaviour to be studied under conditions of extended exposure to 150 eV photons radiation by X-ray photoelectron spectroscopy (XPS). The XPS spectrum was monitored over the Si2p region and the initial peak at 100.53 eV was observed to shift to higher binding energies as irradiation progressed which is indicative of charge trapping within the film. This result has potential consequences for applications where NH₂-SiNPs are used in X-ray environments such as in bioimaging where the increasing charge buildup is related to enhanced cytotoxicity.