Issue 19, 1992

Adsorption of the trimethylamine adduct of aluminium hydride on silicon oxide

Abstract

X-Ray photoelectron spectroscopy (XPS) and static secondary ion mass spectroscopy (SSIMS) studies of surface adsorbed H3AINMe3 on a SiO2 substrate support molecular adsorption, most likely as a five coordinate species, H3AINMe3(O[double bond, length half m-dash]), and an aluminium rich species (Al : N 2 : 1) sensitive to the amount of exposure to the vapour; ab initio molecular orbital calculations on H3AINH3 and H2O gave formation of H3AINH3(OH2) as energetically favoured by 4.53 kcal mol–1, and fragmentation of H3AINH3(OH2) to H3AIOH2 and NH3 requiring 13.16 kcal mol–1(1 cal = 4.184 J).

Article information

Article type
Paper

J. Chem. Soc., Chem. Commun., 1992, 1423-1425

Adsorption of the trimethylamine adduct of aluminium hydride on silicon oxide

F. M. Elms, R. N. Lamb, P. J. Pigram, M. G. Gardiner, B. J. Wood and C. L. Raston, J. Chem. Soc., Chem. Commun., 1992, 1423 DOI: 10.1039/C39920001423

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