Sheng-shi Li,
Chang-wen Zhang*,
Run-wu Zhang,
Ping Li,
Feng Li,
Min Yuan,
Miao-juan Ren,
Wei-xiao Ji and
Pei-ji Wang
School of Physics and Technology, University of Jinan, Jinan, Shandong 250022, People's Republic of China. E-mail: zhchwsd@163.com
First published on 9th January 2014
Based on first-principles calculations, we study the effects of the chlorine atoms on electronic and magnetic properties of AlN nanosheets (NS). We find that both the bare and fully-chlorinated AlNNRs demonstrate semiconducting behavior, while the half-chlorination on surface Al sites leads to the semiconductor-ferromagnetism transition. More interestingly, the chlorination on surface Al sites in monolayer and bilayer AlNNSs demonstrates the half-metallic ferromagnetic (FM) behavior with 100% spin-polarized currents at the Fermi level, suitable for applications in spintronics at the nanoscale.
The intense research dedicated to graphene generally triggered exploration into other 2D graphene-like networks including SiC, ZnO, and BNNSs,8–10 which is considered of particular interest as a nanoelectronic device. The 2D BNNS has been exfoliated, which is a prerequisite for developing the full potential of h-BN in applications ranging from electronics to energy storage.11 The problems related to geometric stability and electronic properties of 2D NSs of other III-Nitrides, including AlNNS, are recently becoming a “hot” research topic, which can expand the range of possible applications of III-Nitrides and open new perspectives for miniaturization in engineering functional nanodevices. Recently, the single crystalline AlNNSs has been successfully fabricated by a vapor-phase transport method, using Al powder and ammonia as the source materials.12 Further examinations of the transmission electron microscopy (TEM) and scanning electron microscopy (SEM) demonstrated that the fabricated AlNNSs are uniform and smooth. Theoretically, Peng et al.13 reported the mechanical properties of AlNNS by density-functional theory (DFT) calculations, and found that the tunable sound velocities have promising applications in nanowaveguides and surface acoustic wave sensors. Rastegarn et al.14 found that the AlNNS can selectively detect NO2 molecules in the presence of NH3 molecules on AlNNS surface. Jiao et al.15 investigated the character of adsorption of CO2 and nitrogen on single-layer AlN nanostructures, suggesting the potential application of AlNNS for CO2 capture and storage.
Currently, there is an urgent interest in modifying 2D materials by the foreign atom adsorption to realize FM order in spintronics. For example, some previous results on graphene16 and silicene17 have shown the possibility of realizing intriguing magnetic orders. However, despite the progress in the fabrication of such AlNNS, less work on its magnetic properties has been reported on AlNNS. In our recent works,18 we investigated the electronic and magnetic properties of AlN nanostructure decorated with hydrogen atoms, and found the intriguing long-range FM orders. In this work, we further perform DFT simulations to investigate how to tune the magnetic properties of multi-layer (ML) AlNNSs by chlorine atom adsorption on AlNNS surface. One can see that the band gap of AlNNS can be significantly tuned when it is decorated with chlorine atoms. Of particular interest is the realization of the long-range FM order in such a 2D chlorinated AlNNS, which may open a new route to AlN nanostructures in spintronics.
Since the AlNNSs are cut from wurtzite bulk phase, the benchmark computations are performed for bulk model of wurtzite AlN. The optimized lattice parameters of bulk AlN are a = 3.087 Å, c = 4.962 Å. The calculated Al–N bond length is 1.872 Å, and Al–N–Al bond angles are 108.32°, all in good agreement with experimental values and other theoretical results.23–28 The bulk AlN has an indirect band gap of 4.1 eV at the Γ point along Γ–Z direction in reciprocal spaces, close to the previous GGA results.29 However, it is 0.8 eV higher than the value calculated with FLAPW method.30 The possible reason can be attributed to the adopted different exchange and correlation potentials. It is well known that GGA typically underestimates the energy gap. However, since energy gaps are not the main focus of our work, the basic physics reported here should not be changed by using the GGA approach.
Examinations of band structure of the ML-AlNNSs indicate that they all exhibit semiconducting behaviors, with the band gap increasing monotonically as a function of the number layer N. In Fig. 2 we display the representative band structure and corresponding density of states (DOS) of SL-AlNNS with the band gap of 2.93 eV. One can see that the contribution of N-2pz is pronounced for the filled band at the valence band maximum (VBM), while the conductor band minimum (CBM) comes from Al-3pz states. The formed π- and π*- bands of 2D AlNNS which cross at K- and K*-points of the BZ in graphene open a gap in 2D AlNNS as a bonding and antibonding combination of N-2pz and Al-3pz orbitals. When further increases N of AlNNSs, the bands of each layer are not fully degenerated due to the layer–layer interaction, thus changes the band gap of AlNNS significantly.
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Fig. 2 The calculated band structure and corresponding DOS SL-AlNNS. The horizontal dotted line in (a) and the vertical dotted line in (b) refer to the EF, respectively. |
Generally, the Al and N atoms in AlNNSs are more reactive than those of bulk AlN due to their dangling bonds on the surface atoms. To stabilize the plannar configuration, the conventional approach is decorating the surface Al and N atoms with the foreign atoms to saturate the dangling bonds, which can also be achieved by applying an external electric field perpendicularly to AlN (0001) surface. Different from the equivalent carbon atoms in graphene, AlNNS has two different kinds of atoms, and thus there are four different adsorbing configuration, i.e., top Al (TAl) or N (TN) sites, bridge site (B), and hollow site (H), as shown in Fig. 3(a). The relative stabilities of the adsorbing configurations is determined from the formation energy which is defined as Ef = E(AlN) + 1/2nμCl − E(AlN@Cln), where E(AlN@Cln) and E(AlN) are the total energies of AlNNSs with and without the chlorine atoms, respectively. μCl is the chemical potential of gases Cl2, and n is the concentrations of Cl atoms in AlNNSs. Fig. 3(b) shows the calculated formation energy for four different sites. One can see that TAl has the lowest formation energy, and thus the adsorption site TAl would preferably be realized in experiments.
For the sake of comparison with TAl, we first study the case of fully chlorination on both Al and N sties in AlNNSs, as shown in Fig. 4(a). The relaxed Al–N plane is found to be buckled with a height of 0.65 Å between Al and N atoms, attributed to transformation from bare AlNNS sp2 hybridization to AlN@Cln sp3 hybridization between Al and N atoms. The Cl atoms are adsorbed on Al and N atoms with Cl–Al and Cl–N bond lengths of 2.07 Å and 1.79 Å, respectively. Obviously, the Cl–Al bond length is larger than that of Cl–N bonding because of the difference in bonding character. Fig. 4(b) presents the band structure of fully chlorinated AlNNS. It exhibits semiconducting character with a direct band gap of 0.52 eV, smaller than that of pristine AlNNS. This is because the adsorbed Cl atoms on both Al and N side lead to the strong hybridization at VBM mainly dominated by Cl-p, while the hybridization of Al-p and N-p orbitals is not affected in conduction band minimum (CBM).
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Fig. 4 (a) Top and side view of geometry of fully-chlorinated AlNNS, and the corresponding band structure (b). |
In the cases of half-chlorinated AlNNS, the structural relaxation of TAl results in a trilayer configuration consisting of an Al plane sandwiched between Cl and N planes, as shown in Fig. 5(a). The distance d between Al and N planes is found to be 0.38 Å, while Cl–Al bond length d0 is 1.71 Å. Also, we give the charge density difference (CDD) of TAl on AlNNS in Fig. 5(b). The CDD is calculated by subtracting charge densities of free Cl atoms and AlN crystal from the charge density of 2D half-chlorinated AlNNS, i.e., Δρ = ρ(Cl@Al) − ρ(Cl) − ρ(AlN). One can see that high density contour plots around N atoms indicate no charge transfer from Al to N atoms significantly. The amount of transfer of charge is calculated by Bader charge analysis to be ΔQ = 0.01 electrons, which is consistent with CDD plots.
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Fig. 5 (a) Top and side view of geometry of half-chlorinated AlNNS, and the corresponding charge–density difference ρCl@AlN − ρCl − ρAl − ρN of ML-Cl@AlN (b). |
As discussed above, the chlorination on Al sites results in the strongly covalent bonds within Cl–Al atoms, which leads to sp3 hybridization in Al and N atoms, and thus no charge transfer occurs from Al to N, leaving electrons in N atoms unpaired. As a result, the N-2p states are spin-polarized with a net magnetic moment of 0.49μB, whereas the Cl atoms carry very small spins (0.08μB). To study the preferred magnetic coupling between N atoms, the energy difference, ΔEFM = EAFM − EFM, between FM and antiferromagnetic (AFM) states, and spin polarization energy, ΔESP = ENM − EFM, between NM and FM states, are calculated. We find ΔEFM = 0.18 eV and ΔESP = 0.84 eV, respectively. This indicates that TAl prefers FM state. Noticeably, the N p states are rather extended. The extended p–p interaction between N atoms prefers a long-range FM coupling as found in graphene and BN sheets.37
Fig. 6 presents the total and partial DOS of half-chlorinated AlNNS. It is obvious that the orbital hybridizations are mainly from N and Cl p orbitals. The large spin exchange interaction leads to spin-down p states move to EF, while N 2pz orbitals are pushed above EF. Most importantly, the spin-down channel is metallic with the N p states crossing EF, while the spin-up channel is semiconducting with a band gap of about 5.46 eV, exhibiting half-metallic properties, which is an ideal for high temperature operation up to room temperature.
In experiments, AlNNS prefers ML layers due to their low formation energies. Thus we further consider what would occur if increase the thickness N of AlNNS. The structural relaxations demonstrate that, similar to the pristine AlNNS, the half-chlorination on TAl site leads to the reduction in the intralayer Al–N bonds, while the distance between the neighboring sheets becomes larger. Especially, the farther the Al–N layer is from Cl atoms, the larger the distance d is. As a result, these lead to the interlayer binding energies increases, and thus result in different magnetic properties from the case of AlN monolayer.
Finally, in Fig. 7 we present the band structure of ML-Cl@Al with N = 2 and 3, respectively. One can see that they are both spin-polarized clearly, suggesting magnetic properties. In the case of N = 2, the half-metallicity can be preserved and the half-metal gap is still large enough (0.52 eV) [Fig. 7(a)], while N = 3, the metallic behavior is observed since the bands in spin-up channel cross EF, as shown in Fig. 7(b). The possible reason can be explained as follows; the Al atoms in inner layer provide electrons to transfer to N atoms at surface, reducing the number of unpaired N p electrons. Thus, the electrons of N in inner layer can't gain enough electrons from the neighboring Al atoms, leading to part of N p electrons in inner layer unpaired. In such a way, the local magnetic moments on N atoms are handed on layer by layer with increasing the number of Al–N layer. So, it is expected that the net magnetic moment in half-chlorinated AlNNSs is mainly constituted in unsaturated N p orbital in surface layer.
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