Issue 42, 2024

Supramolecular tunnelling junctions with robust high rectification based on assembly effects

Abstract

The performance of large-area molecular diodes can in rare cases approach the lower limit of commercial semiconductor devices but predictive structure–property design remains difficult as the rectification ratio (R) achieved by self-assembled monolayer (SAM) based diodes depends on several intertwined parameters. This paper describes a systematic approach to achieve high rectification in bisferrocenyl-based molecular diodes, HSCnFc–C[triple bond, length as m-dash]C–Fc (n = 9–15) immobilised on metal surfaces (Ag, Au and Pt). Experiments supported by molecular dynamics simulations show that the molecular length and bottom electrode influence the SAM packing, which affects the breakdown voltage (VBD), the associated maximum R (Rmax), and the bias at which the Rmax is achieved (Vsat,R). From the electrical characterisation of the most stable Pt–SCnFc–C[triple bond, length as m-dash]C–Fc//GaOx/EGaIn junctions, we found that VBD, Vsat,R, and Rmax all scale linearly with the spacer length of Cn, and that Rmax for all the SAMs consistently exceeds the “Landauer limit” of 103. Our data shows that the robust switching of M–SCnFc–C[triple bond, length as m-dash]C–Fc//GaOx/EGaIn junctions is the result of the combined optimisation of parameters involving the molecular structure, the type of metal substrate, and the applied operating conditions (bias window), to create stable and high-performance junctions.

Graphical abstract: Supramolecular tunnelling junctions with robust high rectification based on assembly effects

Supplementary files

Article information

Article type
Paper
Submitted
07 avr. 2024
Accepted
06 sept. 2024
First published
11 sept. 2024
This article is Open Access
Creative Commons BY license

Nanoscale, 2024,16, 19683-19691

Supramolecular tunnelling junctions with robust high rectification based on assembly effects

M. Roemer, X. Chen, Y. Li, L. Wang, X. Yu, P. Cazade, C. Nickle, R. Akter, E. Del Barco, D. Thompson and C. A. Nijhuis, Nanoscale, 2024, 16, 19683 DOI: 10.1039/D4NR01514B

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