Issue 20, 2021

Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films

Abstract

Chemical vapor deposition of metal–organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to a MOF through exposure to linker vapor. We herein report the impact of different metal oxide and metalcone layers as precursors for zeolitic imidazolate framework ZIF-8 films.

Graphical abstract: Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films

Supplementary files

Article information

Article type
Communication
Submitted
21 mars 2021
Accepted
05 mai 2021
First published
05 mai 2021

Dalton Trans., 2021,50, 6784-6788

Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films

A. J. Cruz, G. Arnauts, M. Obst, D. E. Kravchenko, P. M. Vereecken, S. De Feyter, I. Stassen, T. Hauffman and R. Ameloot, Dalton Trans., 2021, 50, 6784 DOI: 10.1039/D1DT00927C

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