Issue 42, 2019

Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

Abstract

Metal-oxide thin films are used extensively in electronic and energy applications. Solution processing offers a potentially scalable and inexpensive deposition method to expand the applications of metal-oxide films and to complement vacuum-deposition techniques. Among precursors for solution deposition, metal nitrates stand out for their ability to form high-quality metal-oxide thin films. This review focuses on unique aspects of metal-nitrate chemistry that have been exploited to advance the development of solution-processed thin films. We discuss the solid-state bulk, solution, and thin-film chemical reactions involving metal nitrates and illustrate how the resulting metal-oxide thin-film properties depend on the entire reaction pathway. To conclude, we offer perspective as to how understanding the chemistry of film formation from metal-nitrate precursors is useful for addressing the primary drivers for industrial manufacturing of solution-processed metal-oxide thin films.

Graphical abstract: Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

Article information

Article type
Review Article
Submitted
17 juil. 2019
Accepted
23 sept. 2019
First published
23 sept. 2019

J. Mater. Chem. A, 2019,7, 24124-24149

Author version available

Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

E. A. Cochran, K. N. Woods, D. W. Johnson, C. J. Page and S. W. Boettcher, J. Mater. Chem. A, 2019, 7, 24124 DOI: 10.1039/C9TA07727H

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