Issue 46, 2013

Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

Abstract

This feature article provides an overview of several mechanical-based micro- and nanopatterning technologies that can achieve continuous and high-throughput fabrication of various sub-wavelength structures without resorting to the conventional optical lithography technique. These include a template-based and versatile roll-to-roll nanoimprint lithography technique, cost-effective dynamic mould sweeping patterning as well as mould-free patterning methods. Examples of demonstrated and potential applications in optoelectronics and photonics are also discussed.

Graphical abstract: Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

Article information

Article type
Feature Article
Submitted
15 mai 2013
Accepted
18 juil. 2013
First published
18 juil. 2013

J. Mater. Chem. C, 2013,1, 7681-7691

Continuous and high-throughput nanopatterning methodologies based on mechanical deformation

J. G. Ok, S. H. Ahn, M. K. Kwak and L. J. Guo, J. Mater. Chem. C, 2013, 1, 7681 DOI: 10.1039/C3TC30908H

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