By introducing iodo, we developed a novel Hf precursor for the HfO2 ALD deposition process that improved the adsorption characteristics and, in turn, suppressed interfacial layer formation, and enhanced leakage current characteristics.
This study applies microwave-assisted drying (MAD) using the grams per watt (g W−1) ratio as a control parameter to modulate the physicochemical, techno-functional and phytochemical properties for cocoa pod husk (CPH) valorisation.
Simple, stable, and low-toxicity chemical solution for deposition of ferroelectric Ca:HfO2 films.
Glass-like alkali metal lead oxides X2PbO3 (X = Li, Na, K, Rb, Cs) are explored and their suitability for piezoelectric and thermoelectric applications assessed.
A HfO2 film was grown using discrete feeding ALD, an advanced ALD process designed to improve the surface coverage of the precursor, which decreased the residual impurities in the film and increased the film density.