Issue 1, 2026

First principles design and band engineering of type-II As2C3/Sc2CF2 van der Waals heterostructure

Abstract

In this work, we systematically investigate the structural, electronic, mechanical, thermal, and optical properties of a two-dimensional (2D) As2C3/Sc2CF2 van der Waals (vdW) heterostructure using first-principles calculations. All stacking configurations preserve the semiconducting nature of their constituent monolayers with indirect bandgaps and form a type-II band alignment, favorable for efficient charge separation. The As2C3/Sc2CF2 heterostructure exhibits excellent mechanical robustness and thermal stability. Optical absorption spectra reveal a significant enhancement across a broad spectral range, with the absorption coefficient reaching up to 3.5 × 105 cm−1. Furthermore, the electronic properties and contact behavior of the heterostructure can be effectively tuned by applying an external electric field. Notably, a semiconductor-to-metal transition is induced under negative electric field, while a reversible switching between type-II and type-I band alignments is achieved under the positive direction. These results underscore the potential of the As2C3/Sc2CF2 heterostructure as a versatile candidate for future nanoelectronic, optoelectronic, and field-effect device applications.

Graphical abstract: First principles design and band engineering of type-II As2C3/Sc2CF2 van der Waals heterostructure

Article information

Article type
Paper
Submitted
07 Oct 2025
Accepted
08 Dec 2025
First published
05 Jan 2026
This article is Open Access
Creative Commons BY license

RSC Adv., 2026,16, 788-796

First principles design and band engineering of type-II As2C3/Sc2CF2 van der Waals heterostructure

N. X. Sang, N. Q. Cuong and L. P. Long, RSC Adv., 2026, 16, 788 DOI: 10.1039/D5RA07652H

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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