Enhanced Performance of Graphene Transparent Conductive Films by Introducing SiO2 Bilayer Antireflection Nanostructure
Performance of graphene transparent conductive films (TCFs) can be greatly enhanced by introducing antireflection (AR) nanostructure. We directly deposited graphene on silica nanospheres/acid-catalyzed silica layer (SNSs/a-SL) AR nanostructure assisted catalyzed by Cu nanoparticles in ambient pressure chemical vapor deposition to obtain graphene composite TCFs. By introducing SNSs/a-SL AR nanostructure, the transmittance and sheet resistance of graphene TCFs achieve 89.65% and 2.04 kΩ·sq-1, respectively. Compared to graphene films, the transmittance is improved by 5.5% and sheet resistance reduces by 0.44 kΩ·sq-1. SNSs/a-SL AR nanostructure effectively reduces reflection from substrates owing to the structure of gradient refractive index and exhibits good stability at high temperature because of the existence of a-SL. The AR nanostructure also can provide more electronic transport channels to achieve regulation for electrical property of graphene TCFs. This method simultaneously improves transmittance and conductivity of graphene TCFs by facile process, indicating a considerable recipe to prepare graphene TCFs with excellent performance.