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Quantifying low-energy ICP-MS isotope deposition

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Abstract

Mass spectrometry (MS) offers an alternative approach to chemical or chromatographic separations to selectively isolate and collect individual isotopes of an element for analytical purposes. During this MS isotopic isolation process, the amount of material deposited on to a target can be conveniently quantified by measuring the ion current or accumulated charge. In this paper we report the first study comparing measurement of isotope deposition amount with separated isotope ion current for isotopes of six different elements (88Sr, 107Ag, 133Cs, 140Ce, 175Lu and 205Tl). These isotopes were sequentially deposited on a conductive substrate located in place of the standard electron multiplier in a quadrupole inductively coupled plasma MS. The results indicate good correlation between measured ion current and deposited mass as verified by quantitative analysis. This empirically confirms a means to quantify total mass deposition by ion charge measurements at implantation energies of 5–10 eV.

Graphical abstract: Quantifying low-energy ICP-MS isotope deposition

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Publication details

The article was received on 21 Dec 2018, accepted on 11 Mar 2019 and first published on 12 Apr 2019


Article type: Paper
DOI: 10.1039/C8JA00447A
Citation: J. Anal. At. Spectrom., 2019, Advance Article

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    Quantifying low-energy ICP-MS isotope deposition

    M. Liezers, M. P. Dion, G. C. Eiden and M. P. Thomas, J. Anal. At. Spectrom., 2019, Advance Article , DOI: 10.1039/C8JA00447A

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