Jump to main content
Jump to site search

Issue 96, 2017
Previous Article Next Article

Controlled fabrication of osmium nanocrystals by electron, laser and microwave irradiation and characterisation by microfocus X-ray absorption spectroscopy

Author affiliations

Abstract

Osmium nanocrystals can be fabricated by electron (3–50 nm, formed by atom migration), 785–815 nm laser (20–50 nm, in micelle islands), and microwave (ca. 1 nm in arrays, >100 mg scale) irradiation of a polymer-encapsulated OsII carborane; microfocus X-ray absorption studies at the Os LIII-edge show differences between the three preparation methods, suggesting that the electron-beam irradiated materials have a significant support interaction and/or surface oxidation, while the laser and microwave samples are more like metallic osmium.

Graphical abstract: Controlled fabrication of osmium nanocrystals by electron, laser and microwave irradiation and characterisation by microfocus X-ray absorption spectroscopy

Back to tab navigation

Supplementary files

Article information


Submitted
12 Sep 2017
Accepted
11 Oct 2017
First published
23 Oct 2017

Chem. Commun., 2017,53, 12898-12901
Article type
Communication

Controlled fabrication of osmium nanocrystals by electron, laser and microwave irradiation and characterisation by microfocus X-ray absorption spectroscopy

A. Pitto-Barry, K. Geraki, M. D. Horbury, V. G. Stavros, J. F. W. Mosselmans, R. I. Walton, P. J. Sadler and N. P. E. Barry, Chem. Commun., 2017, 53, 12898
DOI: 10.1039/C7CC07133G

Social activity

Search articles by author

Spotlight

Advertisements