Issue 13, 2016

Sol–gel preparation of low oxygen content, high surface area silicon nitride and imidonitride materials

Abstract

Reactions of Si(NHMe)4 with ammonia are effectively catalysed by small ammonium triflate concentrations, and can be used to produce free-standing silicon imide gels. Firing at various temperatures produces amorphous or partially crystallised silicon imidonitride/nitride samples with high surface areas and low oxygen contents. The crystalline phase is entirely α-Si3N4 and structural similarities are observed between the amorphous and crystallised materials.

Graphical abstract: Sol–gel preparation of low oxygen content, high surface area silicon nitride and imidonitride materials

Supplementary files

Article information

Article type
Paper
Submitted
21 Dec 2015
Accepted
24 Feb 2016
First published
24 Feb 2016
This article is Open Access
Creative Commons BY license

Dalton Trans., 2016,45, 5765-5774

Author version available

Sol–gel preparation of low oxygen content, high surface area silicon nitride and imidonitride materials

K. Sardar, R. Bounds, M. Carravetta, G. Cutts, J. S. J. Hargreaves, A. L. Hector, J. A. Hriljac, W. Levason and F. Wilson, Dalton Trans., 2016, 45, 5765 DOI: 10.1039/C5DT04961J

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