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Issue 13, 2016
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Sol–gel preparation of low oxygen content, high surface area silicon nitride and imidonitride materials

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Abstract

Reactions of Si(NHMe)4 with ammonia are effectively catalysed by small ammonium triflate concentrations, and can be used to produce free-standing silicon imide gels. Firing at various temperatures produces amorphous or partially crystallised silicon imidonitride/nitride samples with high surface areas and low oxygen contents. The crystalline phase is entirely α-Si3N4 and structural similarities are observed between the amorphous and crystallised materials.

Graphical abstract: Sol–gel preparation of low oxygen content, high surface area silicon nitride and imidonitride materials

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Publication details

The article was received on 21 Dec 2015, accepted on 24 Feb 2016 and first published on 24 Feb 2016


Article type: Paper
DOI: 10.1039/C5DT04961J
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Dalton Trans., 2016,45, 5765-5774
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    Sol–gel preparation of low oxygen content, high surface area silicon nitride and imidonitride materials

    K. Sardar, R. Bounds, M. Carravetta, G. Cutts, J. S. J. Hargreaves, A. L. Hector, J. A. Hriljac, W. Levason and F. Wilson, Dalton Trans., 2016, 45, 5765
    DOI: 10.1039/C5DT04961J

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