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Issue 17, 2010
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Holey nanosheets by patterning with UV/ozone

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Abstract

Self-assembled monolayers (SAMs) of 1,1′-biphenyl-4-thiol are patterned by using UV/ozone treatment through a shadow mask. After subsequent irradiation with low-energy electrons, the SAM is cross-linked to form a two-dimensional, holey nanosheet with a thickness of ∼1 nm. This nanosheet is mechanically stable and can be released from the original gold substrate and transferred to new substrates, including transmission electron microscopy (TEM) grids. The process is monitored by complementary microscopic techniques as well as X-ray photoelectron spectroscopy (XPS).

Graphical abstract: Holey nanosheets by patterning with UV/ozone

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Publication details

The article was received on 12 Nov 2009, accepted on 14 Jan 2010 and first published on 17 Feb 2010


Article type: Paper
DOI: 10.1039/B923863H
Phys. Chem. Chem. Phys., 2010,12, 4324-4328

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    Holey nanosheets by patterning with UV/ozone

    C. T. Nottbohm, S. Wiegmann, A. Beyer and A. Gölzhäuser, Phys. Chem. Chem. Phys., 2010, 12, 4324
    DOI: 10.1039/B923863H

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