Open Access Article
Kumpei Koboria,
Shuji Ogata
*b,
Shintaro Yamamotoc,
Yusuke Takahashic and
Takayuki Miyamae
*ade
aGraduate School of Science and Engineering, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan. E-mail: t-miyamae@chiba-u.jp
bGraduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan. E-mail: ogata@nitech.ac.jp
cMaterials Research Laboratory, Technical Development Group, Kobe Steel Ltd. 5-5 Takatsukadai 1-chome, Nishi-ku, Kobe 651-2271, Japan
dMolecular Chirality Research Centre, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba-shi 263-8522, Japan
eSoft Molecular Activation Research Centre, Chiba University, 1-33 Yayoi-cho, Inage-ku, Chiba 263-8522, Japan
First published on 26th January 2026
Adhesive bonding, particularly with epoxy resins for lightweight metals such as aluminum, is crucial across various industries due to their excellent adhesion and stability. This study utilizes sum frequency generation (SFG) spectroscopy with model surfaces to examine the impact of the amine molecules in epoxy adhesives adsorbed onto aluminum surfaces. We investigated the Lewis acidity of the aluminum surfaces treated with three different silane agents—1,2-bis(triethoxysilyl)ethane (BTSE), octadecyltrimethoxysilane (OTS), and tetramethyl orthosilicate (TMOS)—by evaluating from the peak shifts of the surface hydroxyl groups observed in SFG using the Drago–Wayland method combined with the Badger–Bauer equation, and investigated the correlation with the respective adhesion characteristics. Our results reveal that the Lewis acidity (hardness of acid) of hydroxyl groups on the silane-treated surfaces is a critical factor in adhesive bonding. Surfaces treated with TMOS exhibit the hardest Lewis acid character, followed by BTSE and OTS, which directly correlated with the observed adhesion strengths. This suggests that stronger electrostatic interactions between the silane-treated surface (acting as a Lewis acid) and amine curing agents (acting as a Lewis base) enhance adhesion. Density-functional theory-based molecular dynamics simulations employing the H+-shift method were used to investigate the acid dissociation constant (pKα) of the hydroxyl group in TMOS and BTSE connected to HO-terminated γ-alumina. The calculated pKα values showed a significant difference between single BTSE and bridged BTSE. Similarly, TMOS exhibited different acidic character depending on its adsorption forms. These findings suggest that the hydroxyl groups of bridged BTSE and the TMOS dimer show acidic character. These molecular-level insights indicate that when the hydroxyl groups are present on the surfaces, their adsorption states alter surface acidity, thereby impacting adhesion strength. Furthermore, these findings rationally explain well the previously observed amine segregation mystery at the adhesive interfaces in relation to adhesion strengths. These mechanism yields crucial insights for improving the adhesion and long-term stability of epoxy adhesives.
Generally, when bonding metals, the surface condition of the metals greatly impacts adhesion strength.1,2,21–25 Under atmospheric conditions, metal surfaces such as steel and aluminum are covered by a natural oxide layer, and the condition of the metal surface often becomes non-uniform due to the effects of the material components, processes such as rolling, extrusion, cutting, heating, and water-cooling during manufacturing, resulting in excessive growth of the oxide layer, structural defects, deterioration, corrosion, and other problems.1,21,22 Furthermore, organic compounds derived from processing oils, packaging materials, and storage environments can adsorb onto the oxide layer, which significantly affect the adhesiveness of the metals. If these organic compounds remain on the adherend surface, the contact area between the adhesive and the adherend surface will decrease, preventing the adhesive from achieving its expected adhesion strength. Therefore, it is necessary to clean the surface of the adherend before bonding.21,22 However, despite cleaning, the oxide layer readily adsorbs organic compounds and moisture from the atmosphere, causing surface conditions to change over time and resulting in variable adhesion strength. Therefore, to achieve stable adhesion strength, it is necessary to perform surface modification treatment to chemically stabilize the oxide film against fluctuations in temperature and humidity.26 Indeed, European and American automobile manufacturers have made surface modification treatment standard in addition to surface cleaning for the purpose of improving the adhesion and storage stability of aluminum alloy oxide films, thereby ensuring long-term stability of adhesion strength.27 To address this, a surface protective layer formed by surface treatment with silane agents, even those without reactive functional groups, has been recently reported.26 Takahashi et al. reported that durability of adhesion strength between polyurethane or epoxy resin and aluminum substrates even in moisture is significantly improved.26 However, the detailed adhesion mechanism of the surface functional groups by the silane agent treatment remains unclear.
Sum frequency generation (SFG) spectroscopy is a powerful technique for in situ, nondestructive observation of molecular interactions at the surface and interfaces.28,29 Since SFG utilizes second-order nonlinear optical effects, it provides specific information about molecular functional groups at surfaces and interfaces where the inversion symmetry is necessarily broken.30–33 SFG has been successfully applied to probe surfaces and buried interfaces of various polymer materials.34–44 As the substrate is solid while the adhesive is in the liquid phase before curing, systematic attempts have been conducted to elucidate the adhesion mechanism during curing by understanding the interaction between the substrate surface and the adhesive, which causes the molecules in the adhesive to be specifically attracted to the interface. For analyzing the interaction at the adhesive interfaces, the method based on acid–base interactions45–49 is highly effective for investigating the substrate-functional group interaction. Characterizing acid–base interactions based on the Drago–Wayland method50 combined with the Badger–Bauer equation51 by the pioneering work of Dhinojwala's group can help us better understand the aforementioned interfacial phenomena.46–49
In this study, we focus on silane coupling agents used as metal protection layers and investigate the interaction between silane-treated surfaces and amine molecules contained in epoxy adhesives using surface-specific vibrational SFG spectroscopy. The affinity between the adhesive and the protection layer is examined based on the acid–base interactions by comparing the adhesion strength of aluminum treated with three different silane agents: 1,2-bis(triethoxysilyl)ethane (BTSE), octadecyltrimethoxysilane (OTS), and tetramethyl orthosilicate (TMOS). BTSE is a silane coupling agent often used as a protective layer for the thin oxide films on chemically cleaned aluminum surfaces.52 SFG spectroscopy is employed to characterize the surface properties of each silane agent treated surface using the Drago–Wayland method,50 and to evaluate the interaction at the silane/epoxy interfaces. To achieve this, AlOx thin-film-coated CaF2 substrates serve as ideal aluminum surface models for SFG measurements. Aluminum surfaces that undergo chemical cleaning with acid and alkaline solutions are covered by a thin aluminum oxide layer, making them well-suited for studying the interaction between AlOx and silane coupling agents, as well as for modeling silane-coated aluminum component surfaces. By conducting a detailed investigation using the Drago–Wayland method by Kurian et al.46 into our silane modified systems, we find that the acidity (hardness of acid) of silane-treated surfaces plays a crucial role in electrostatic interaction with the amine compounds in epoxy adhesive, and positively correlates with adhesion strength to the epoxy adhesives. The hardness of the acid on the silane-treated surfaces is found for the first time to be positively correlated with the adhesion strength to epoxy adhesives. Furthermore, to verify the acid–base interaction on the silane-modified surfaces theoretically, molecular dynamics (MD) simulations with DFT calculations were performed utilizing γ-alumina as a model substrate, and the dissociated BTSE and TMOS surfaces positively exhibit acidity depending on the adsorption states, possessing an attractive effect on Lewis basic amines. These findings provide the first reasonable explanation for the previously puzzling interface segregation of amines at adhesive interfaces.10,17
| ΔHab = EaEb + CaCb, | (1) |
| ΔHab = mΔνab + C. | (2) |
The m and C parameters in eqn (2) are empirically determined constants for a particular functional group. Specifically, sample surfaces are put in contact with several solvents having known values of Eb and Cb, and the interaction enthalpy is obtained using eqn (2) of the Badger–Bauer equation from the Δνab of the surface vibrational mode observed in SFG that occurs when the functional groups of interest are in contact with the solvents. In this study, we focused on the peak wavenumber shift of the hydroxyl groups present on the silane coupling agent-treated surfaces when they were in contact with various solvents. Then, the values of Ea and Ca for each surface can be determined using the Drago–Wayland equation, and the surface Lewis acidity is identified.
![]() | (3) |
The static contact angles of the surfaces treated with silane coupling agents were measured using an SImage AUTO 100 (Excimer, Inc., Japan). The contact angle was determined using the average value of at least three individual measurements.55 X-ray photoelectron spectroscopy (XPS) measurements were performed using a JPS-9030 manufactured by JEOL Ltd. The X-ray source used in XPS was AlKα. Attenuated total reflection infrared (ATR-IR) measurements were performed using a Fourier transform infrared spectrometer (FT/IR-6600) manufactured by JASCO Co. with 128 accumulation cycles and a resolution of 4 cm−1. A diamond prism was used for ATR measurements.
A tabletop tensile and compression tester (MCT-2150, A&D Company, Ltd., Japan) was utilized for the lap-shear tests. In this study, the adhesive strength was estimated by dividing the maximum value of the load–displacement curve by the adhesive area (7 × 3 mm2). Therefore, the adhesive strength represents the stress at the sample break. The speed of the tensile test was adjusted to 100 mm min−1. The thickness of the XD911 adhesive was controlled to be 100 μm using glass beads. The curing temperature of epoxy adhesives was 150 °C for 40 min. In addition to the adhesion strength of Al surfaces modified with three types of silane coupling agents, the adhesion strength of the epoxy adhesive on a cleaned Al substrate was also evaluated as a control. The adhesion strengths were determined by averaging at least eight independent test specimens. The error bars represent the standard errors of each surface treated test specimen.
For the SFG experiments, a 3 mm-thick CaF2 substrate (30 mmϕ, Pier Optics Co., Ltd., Japan) coated with 100 nm-thick AlOx was used. The AlOx-coated CaF2 was ultrasonicated in ethanol and acetone for 15 min each, followed by plasma treatment for 15 min using a plasma cleaner (PDC-32G, Harrick Plasma, USA) to remove surface contaminants. The cleanliness of the AlOx-coated CaF2 surfaces was confirmed by SFG to verify the absence of contamination (Fig. S3(d)).
Surface modification using silane coupling agents were performed by immersing chemically polished Al substrates and AlOx-coated CaF2 substrates in 1.5 mmol L−1 ethanol solution of each silane coupling agent with 30 μL acetic acid added for 24 h to prepare the silane coupling coatings. The samples were then ultrasonicated in ethanol for 15 min.
![]() | ||
| Fig. 4 Adhesion strength of Al substrates treated with OTS, BTSE, and TMOS with untreated Al substrates. | ||
To further investigate the surface condition of silane-treated surfaces, the hydroxyl groups on these silane-treated surfaces were analyzed using SFG spectroscopy under atmospheric conditions. CaF2 substrates coated with a 100 nm-thick AlOx layer were used to observe the surface adsorbed with silane molecules. Fig. 5 presents the SSP-polarized SFG spectra collected under identical adsorption conditions. On AlOx surfaces without silane treatment, the band attributed to free OH groups appears at 3710 cm−1, while broad bands of hydrogen-bonded OH bands, which are associated with adsorbed water, are observed from the 3000 to 3600 cm−1 region. In contrast, the OH band on silane-adsorbed surfaces shifts to approximately 3650 cm−1, which shows a lower frequency shift and broader peak width compared to untreated AlOx surfaces. These spectral changes likely result from the interactions between hydrolyzed silane-derived OH groups and the alkyl groups. Notably, OH groups are scarcely detectable on OTS monolayers adsorbed onto glass surfaces, whereas they appear on OTS-adsorbed AlOx surfaces, suggesting differences in the alkyl chain orientation order between glass and AlOx. This distinction is further validated by significant variations in SFG spectra within the CH stretching region (Fig. S3 and S4). The OTS adsorbed on glass exhibits distinct peaks originating from CH3 in both SSP and PPP polarization combinations, indicating that the alkyl chains are in an all-trans orientation. In contrast, peaks from CH2 are observed on AlOx, suggesting the presence of a gauche structure. This indicates that alkyl chains exhibit a more disordered orientation on AlOx. In other words, the adsorption behavior of silane agents on AlOx markedly differs from that on glass substrates. While silane coupling agents with alkyl chains tend to adopt a well-ordered orientation on glass and silicon oxide substrate surfaces, their adsorption behavior varies significantly on aluminum oxide and other metal substrates.56–58 This conclusion is further supported by differences in water contact angles: 119° for OTS on glass versus 69° for OTS on AlOx, underscoring substantial differences in wettability. Ultimately, when silane molecules adsorb onto AlOx surfaces, hydroxyl groups remain present to some extent, contributing to variations in surface chemistry and adsorption behavior.
Regarding BTSE, the ethoxy group is fully dissociated by adding a tiny amount of acetic acid during adsorption onto the AlOx surfaces. In the SFG spectra of BTSE adsorbed surfaces in Fig. S3 and S4, not only the CH3-derived SFG peak disappears in SSP, but the methyl asymmetric stretching at 2970 cm−1 is also completely absent in PPP polarization. Thus, the peaks observed in the SFG spectra of BTSE is attributable to CH2 within the molecules, not to undissociated ethoxy groups. On the SFG spectra of TMOS-adsorbed AlOx surfaces (Fig. S3), peaks corresponding to CH2 and CH3 groups are slightly observed. This is considered to be due to the residual ethanol on the surfaces. However, the TMOS surface exhibits sufficient adhesion strength as compared to Al, suggesting that the residual ethanol has a negligible impact on adhesion strength. Therefore, the influence of the trace amount of ethanol is not considered in the analysis. When the methoxy group on TMOS dissociates, the surface is covered with hydroxyl groups. This likely makes it difficult for adsorbed ethanol to desorb easily due to hydrogen bonding.
![]() | ||
| Fig. 6 SSP-polarized SFG spectra collected for four different liquids in contact with (a) OTS-treated, (b) BTSE-treated, and (c) TMOS-treated AlOx surfaces in the hydroxyl stretching region. The spectra have been fitted using eqn (3) and are shown alongside the collected spectra. | ||
| OTS | ||||
|---|---|---|---|---|
| Solvent | ωq (cm−1) | Γq (cm−1) | Δν (cm−1) | ΔHab (kcal mol−1) |
| Pyridine | 3592 | 108.7 | 55 | 0.63 |
| Triethylamine | 3591 | 97.9 | 56 | 0.64 |
| Dimethylformamide | 3589 | 131.6 | 58 | 0.66 |
| Acetone | 3604 | 166.3 | 43 | 0.50 |
| Air | 3647 | 117.5 | 0 | — |
| BTSE | ||||
|---|---|---|---|---|
| Pyridine | 3590 | 133.3 | 65 | 0.74 |
| Triethylamine | 3590 | 121.9 | 65 | 0.74 |
| Dimethylformamide | 3589 | 120.5 | 66 | 0.75 |
| Acetone | 3601 | 123.4 | 54 | 0.62 |
| Air | 3655 | 131.9 | 0 | — |
| TMOS | ||||
|---|---|---|---|---|
| Pyridine | 3597 | 161.0 | 68 | 0.77 |
| Triethylamine | 3593 | 115.0 | 72 | 0.81 |
| Dimethylformamide | 3598 | 119.4 | 67 | 0.76 |
| Acetone | 3604 | 140.1 | 61 | 0.69 |
| Air | 3665 | 136.8 | 0 | — |
Next, in Fig. 8, we present the SFG spectra of these three silane-treated surfaces in contact with 10 wt% dicyandiamide–DMF solution. Dicyandiamide is one of the most widely used latent hardeners for epoxy resins and serves as the primary agent for high-temperature curing of one-component epoxy adhesive formulations. The fitting summary is shown in Table S2. A slight amine stretching vibration can be observed around 3300 cm−1 at the interface with the dicyandiamide–DMF solution for all silane-treated surfaces, though the signal-to-noise ratio is not good. For comparison, Fig. 8 also shows the SFG spectra of the OH region when DMF without dicyandiamide is in contact with each silane-treated surface. The presence of the peak at 3300 cm−1 is evident by comparing with the SFG spectra of the DMF interfaces without dicyandiamide. When the dicyandiamide–DMF solution contacts these silane-treated surfaces, the OH peak position undergoes a significant red-shift in the order described above. The OH band positions for the silane-treated surfaces, when in contact with a dicyandiamide solution, showed red shifts of 42 cm−1 for OTS, 42 cm−1 for BTSE, and 59 cm−1 for TMOS, respectively, compared to the OH peak positions obtained with DMF interfaces. Based on these results, the acid hardness of the surface hydroxyl groups on the silane-treated surfaces differs among the silane-treated surfaces. Consequently, we conclude that the difference in the adhesion strength shown Fig. 4 is the reason for the difference in the acid hardness of the residual surface hydroxyl groups on the silane-treated surfaces. The curing agent, which contains amines classified as Lewis bases, is attracted to the surface hydroxyl groups on the silane-treated surfaces, which are thought to be Lewis acids, through acid–base interactions. This mechanism can explain the variations in adhesion strength associated with different silane agents. In recent years, advances in analytical techniques and computational science have frequently revealed the segregation of nitrogen atoms derived from amines at epoxy adhesive interfaces.10,17,59–62 When the substrate surfaces exhibit Lewis acidity, this characteristic provide a reasonable explanation for the concentration of amines at the interfaces during epoxy adhesive curing.
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| Fig. 8 SFG spectra collected for DMF and 10 wt% dicyandiamide–DMF solution in contact with (a) TMOS-treated (blue), (b) BTSE-treated (red), and (c) OTS-treated (black) AlOx surfaces. Open circles represent the SFG spectra at the interfaces between three different silane-treated surfaces and DMF, while filled circles correspond to spectra obtained when the samples were in contact with the 10 wt% dicyandiamide–DMF solution. SFG intensities have been normalized to highlight the shift in peak positions. Solid lines indicate the fitting curves using eqn (3). | ||
The H+-shift method15 was applied to calculate the pKα with DFT-MD simulation. The acid dissociation of compound AH in water
| AH(aq) + δFAH = A−(aq) + H+(aq) | (4) |
pKα = δFAH/(ln 10·kBT)
| (5) |
The H+ ion adsorbs onto a single H2O molecule to form the Eigen core of H3O+(aq), and then repeatedly migrates with a timescale of 1 ps to neighboring H2O molecules through the formation of the Zundel core structure (H2O·H+·OH2).63 In the H+-shift method,15 configuration samplings of the solvation structure were conducted for H3O+(aq) by suppressing the H+ migration in the DFT-MD simulation. The free-energy difference between H+(aq) and H3O+(aq) is approximated considering the translation free-energy of H+ as
![]() | (6) |
and
= −7.3918 for C0 = 1 mol/(0.1 m)3, the mass mH+ = 1.6725 × 10−27 kg, and T = 298 K for the standard state. Eqn (4) can be rewritten using eqn (6) as| AH(aq) + H2O(aq) + ΔFAH = A−(aq) + H3O+(aq) | (7) |
![]() | (8) |
ΔFAH is the free energy required to shift H+ from AH to an H2O molecule to form a stable H3O+(aq), which is obtained via two subprocesses: (i) and (ii) as ΔFAH = ΔF(i)AH + ΔF(ii)AO as explained below.
When an H3O+ in water is gradually shifted to A−(aq) from a mutually well-separated position, the H3O+ initially experiences repulsive forces due to breaking of water-solvation and subsequently attractive forces prior to its dissociation to transfer H+ to A−(aq). This metastable state is denoted as A−(aq)·H3O+(aq). Based on this consideration, the H+-transfer process was divided into two subprocesses: (i) a subprocess changing between the states of AH(aq) + H2O(aq) and A−(aq)·H3O+(aq), and (ii) a subprocess between the states of A−(aq)·H3O+(aq) and A−(aq) + H3O+(aq). Corresponding free-energy changes ΔF(i)AH and ΔF(ii)AO for subprocesses (i) and (ii) are calculated by thermodynamic integration of the applied work:
![]() | (9) |
ij| = |
i −
j| between atom-i and atom-j is fixed using the RATTLE method64 during the time average 〈⋯〉 in DFT-MD sampling,
ij =
ij/rij and
ij =
i −
j. Thus, the atomic pair (i, j) was set as (A−, H+ of H3O+) for subprocess (i) and (A−, O of H3O+) for subprocess (ii) to have better sampling statistics for
ij. Auxiliary inter-atomic potentials vsupport were added to the system, which does not create additional atomic forces in both the initial and final states and therefore does not affect the calculated value of ΔF(i),(ii)AH. With the incorporation of vsupport, no H+-transfer between mutually neighboring H2O molecules nor between H2O and A− occurred.
The numerical integration in eqn (9) and its error analysis were performed as follows. Without loss of generality, we consider a numerical integration
of a time-fluctuating quantity g(r). For this purpose, we set discrete n-points ri = rinit + iΔr with Δr = (rfinal − rinit)/n for i = {0, 1, …, n} in the range [rinit, rfinal]; extension to the case of non-uniform discrete points is straightforward. We sample gi ≡ g(ri) for a given ri at every timestep through a DFT-MD simulation run to find the time-averaged value ḡi. We conduct the integration
using {ḡi} by the trapezoidal rule:
![]() | (10) |
The standard error s(IT) of IT relating to the time-fluctuation of gi is evaluated through the well-known error propagation formula as
![]() | (11) |
The H+-shift method was applied to liquid water (128 H2O molecules) under the PBCs at 298 K simulated using the real-space-grid type DFT code (DC-RGDFT),
= 1.215 ± 0.015 eV for subprocess (i) and
= −0.134 ± 0.003 eV for subprocess (ii), that is, ΔFH2O =
= 1.081 ± 0.015 eV.15 This corresponds to pKα 15.1 ± 0.3. Comparing with the experimental value of
, we anticipate that the H+-shift method with DC-RGDFT gives pKα within a possible deviation of ∼0.5.
To calculate the free-energy change ΔF(i)NH, an H3O+ ion was initially prepared close to the target O− in water by shifting H+ from –OH to H2O with a distance of rOH = 1.8 Å between the O− and the closest H+ of H3O+, where the H+ experiences a weak attractive force from the O−, i.e.,
OH·
OH < 0. Zoom-in views of representative configurations are shown in Fig. 9 (top). The value of rOH was then changed in a stepwise manner to find two extreme values of rOH, where the time-average of
OH is zero, the shorter extreme value corresponds to the state AH(aq) + H2O(aq), and the longer extreme value corresponds to the metastable state A−(aq)·H3O+(aq). At each value of rOH, a simulation run was performed for 6.0–8.0 ps after the relaxation run of about 3.0 ps. The 1.0 ps-block averaged values were used to evaluate the standard errors. The time-averaged values, 〈
OH·
OH〉, are plotted in Fig. 9 (middle), which were used for the integration in eqn (9). We thereby obtained ΔF(i)NH = 0.762 ± 0.031 eV for the single BTSE and 0.697 ± 0.025 eV for the bridged BTSE.
For the calculation of the free-energy change ΔF(ii)NH, the metastable state found in subprocess (i) (i.e., A−(aq)·H3O+(aq)) was used as the starting point, wherein the value of rOO between the O− and the O of H3O+ was set at 3.0–3.3 Å and 〈
OO〉 = 0. Similar to subprocess (i), the rOO was extended stepwise until 〈
OO·
OO〉 = 0 at rOO = 3.7–3.9 Å. The time-averaged values, 〈
OO·
OO〉, shown in Fig. 9 (bottom) were used for the integration in eqn (9). The calculated values were ΔF(ii)NH = −0.026 ± 0.005 eV for the single BTSE and −0.273 ± 0.006 eV for the bridged BTSE.
From the subprocesses (i) and (ii), we found ΔFNH = ΔF(i)NH + ΔF(ii)NO = 0.736 ± 0.031 eV for the single BTSE and 0.423 ± 0.026 eV for the bridged BTSE. Adding the translational free-energy of an H+ ion, we obtained pKα of the –OH as 9.24 ± 0.5 for the single BTSE and 3.94 ± 0.5 for the bridged BTSE. In contrast, for bridged-BTSE, where one ethoxy group is undissociated, the pKα value was 11.2 ± 0.5 indicating that complete dissociation of the ethoxy group is effective for enhancing surface acidity. By taking into account the inherent error ∼0.5 in pKα by the H+-shift method with DC-RGDFT (see section 4.3), we conclude that the –OH of the bridged BTSE connected to HO-terminated γ-alumina is acidic, while that of single BTSE is basic. These results suggest that bridged BTSE interacts more effectively with Lewis basic molecules contained in adhesives. We also calculated the pKα of the dissociated TMOS connected to HO-terminated γ-alumina in three forms (see Fig. S6). For dimerized TMOS, the calculated pKα is 3.81 ± 0.5, which is significantly smaller than 8.32 ± 0.5 (9.14 ± 0.5) for single (bridged) TMOS. It is well established experimentally that monomer Si(OH)4 readily dimerizes in water.66 Consequently, the dimerized form of TMOS is anticipated on HO-terminated γ-alumina. Given that the acidity of dimerized TMOS and bridged BTSE is approximately equivalent, we propose that the observed higher acidity of TMOS compared to BTSE in the current experiments is due to the potentially higher smoothness of the TMOS-connected γ-alumina surface, attributed to the smaller size of TMOS relative to BTSE. This finding supports their superior adhesion to epoxy adhesives.
Our investigations revealed that the Lewis acidity, or “hardness”, of the hydroxyl groups present on the silane-treated surfaces is a crucial factor influencing adhesive performance. TMOS-treated surfaces exhibited the hardest Lewis acid character, followed by BTSE and then OTS. Crucially, this hierarchy of Lewis acidity directly correlated with the observed adhesion strengths, demonstrating that surfaces with harder Lewis acid facilitate stronger bonding.
The interaction analysis with a representative amine curing agent (dicyandiamide) further validated this mechanism, showing distinct spectral shifts indicative of acid–base interactions. These findings strongly suggest that enhanced electrostatic interactions between the Lewis acidic hydroxyl groups on the modified surface and the Lewis basic amine curing agents are key to improving adhesion. This molecular-level insight offers a comprehensive explanation for variations in adhesion strengths across different surface treatments and aligns with previous observations of amine segregation at adhesive interfaces during curing.
Furthermore, a simulation system of BTSE or TMOS connected to HO-terminated γ-alumina was successfully employed to investigate the pKα of the hydroxyl group in BTSE and TMOS using the H+-shift method with DFT-MD simulations. The H+-shift method allowed for the calculation of the pKα by determining the free energy required to shift a proton from AH to an H2O molecule, which was divided into two subprocesses involving the displacement of H+ and H3O+ ions. Numerical integration with error analysis was performed to ensure the reliability of the calculated free-energy changes. The calculated pKα values for the hydroxyl group of BTSE connected to HO-terminated γ-alumina revealed a significant difference between the single and bridged BTSE forms. Specifically, the single BTSE exhibited a pKα of 9.24 ± 0.5, while the bridged BTSE showed a pKα of 3.94 ± 0.5. For dimerized TMOS, the calculated pKα is 3.81 ± 0.5, which is significantly smaller than 8.32 ± 0.5 (9.14 ± 0.5) for single (bridged) TMOS. Accounting for an inherent error of approximately 0.5 in the H+-shift method with DC-RGDFT, these results strongly suggest that the –OH group of bridged BTSE and dimerized TMOS connected to HO-terminated γ-alumina is acidic, whereas that of single BTSE and single (bridged) TMOS is rather basic.
SFG experiments clarified that the TMOS-treated and BTSE-treated AlOx surfaces exhibit Lewis acidity. In addition, DFT-MD calculations revealed that the bridged BTSE connected to OH groups on the AlOx surface was more acidic than BTSE with a single form. These results demonstrate that the adsorption configuration of each silane agent and the resulting Lewis acidity of the hydroxyl groups are crucial for molecular reactivity during adhesion. Ultimately, this work provides valuable insights into the fundamental interactions at buried adhesive interfaces, which are essential for the rational design and development of stable, durable, and high-performance epoxy adhesive systems. This understanding is particularly relevant for applications in humid environments, where maintaining adhesion integrity is often challenging.
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