Baonan Jia*ab,
Jingming Gaob,
Jiaxiang Zhaob,
Jiahe Lianga,
Xinhui Zhangc,
Wendong Xiaoa,
Xiaoning Guan
*b and
Pengfei Lu
b
aKey Laboratory of Knowledge Automation for Industrial Processes of Ministry of Education, School of Automation and Electrical Engineering, University of Science and Technology Beijing, Beijing 100083, China. E-mail: jiabaonan@163.com
bState Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China. E-mail: guanxn@bupt.edu.cn
cSchool of Science, Xi'an University of Architecture and Technology, Xi'an 710055, China
First published on 17th January 2025
Modification of the dielectric friction layer materials is an ideal way to enhance the output performance of a triboelectric nanogenerator (TENG), but current research mostly focuses on the metal–polymer or metal–SiO2 materials. In this work, we constructed different TENG models based on polymer CxFy–SiO2 electret materials, and the electronic properties of the different contact surfaces were investigated using first principles. We found that the charge transfer in CxFy–SiO2 materials occurred only at the contact interface, and it was partially affected by the terminal atoms near the SiO2 interface. The charge transfer of the polymer CxFy that was in contact with the O-terminated SiO2 achieved a more satisfactory effect. Among them, the II-C3F6–O model exhibited the highest amount of charge transfer because of the better hybridization of II-C3F6 with the O atoms of SiO2 layer. Our study showed that instead of adding different types of dielectric friction layers, varying the configurations of the same types of dielectric friction layers is an alternative way to regulate charge transfer. Furthermore, this strategy could provide new ideas for enhancing the performance of TENGs.
In recent years, the performance enhancement of TENG has been focused on the modification of its dielectric friction layers.26–31 Owing to their excellent ability to store charge for long periods, electret materials have become emerging materials for dielectric friction layers. Common electret materials mainly include inorganic electret materials, such as silicon dioxide, and organic electret materials, such as various polymers. In 2018, Wu et al.32 first investigated the mechanism of metal–polymer contact charging electrification via first-principles calculations and found that the stress on the contact region has a significant effect on the charge transfer. Further, Wu et al.33 investigated the charge transfer mechanism between metal and amorphous polymers and found that the modification of contact materials is an important method to improve the output power of TENG. Subsequently, Al–PE polymer,26 Cu–PVDF polymer,34 Au–PTFE polymer35 and Au–Nylon polymer35 have attracted widespread attention from researchers through first-principles investigations. In 2021, Antony et al.36 studied the electronic charge transfer of the hydroxylated metal/SiO2 interface using density functional theory and found that the separation distance between the contact surfaces must be small enough to produce electronic states within the apparent insulating bandgap. Owing to the unique physicochemical properties of metals, researchers have also paid significant attention to metal–SiO2 materials,37,38 such as Cu–SiO2, Au–SiO2, Pd–SiO2, Al–SiO2 and Ag–SiO2. In summary, current research on dielectric friction layers mainly focus on single electret materials, such as metal–polymer and metal–SiO2 materials; however, few studies are reported on polymer–SiO2 composite electret materials, indicating that there is still room for enhancing the output performance of TENG0073.
On this basis, we constructed polymer–SiO2 composite electret materials and modified the dielectric friction layers by changing the contact atoms and further altering the charge transfer. In this paper, interface models consisting of polymer CxFy (x = 2, y = 4; x = 3, y = 6) and SiO2 layer were considered, and the effect of different contact atoms on the electron transfer was investigated by first-principles calculations. The II-C3F6–O model, which consists of II-C3F6 and O-terminated SiO2, shows the best performance of electron transfer because II-C3F6 can hybridize more significantly with the O atoms of the SiO2 layer. Our study suggests that for the design of TENG, in addition to considering the different types of dielectric friction layers, different configurations of the same types can also be considered to enhance the performance of TENG.
VASP software was used to optimize the atomic structures and calculate the electronic properties of different contact models. The input energy was chosen to be 400 eV to ensure accuracy of calculations. For geometry optimization, all atomic positions and lattice structures were fully relaxed until convergence criteria were reached, with forces less than 0.05 eV per Å per atom and a total energy convergence criterion of 1.0 × 10−5 eV. For electronic properties, the same computational accuracy was used to obtain reliable results. According to previous studies,43,44 a vacuum layer of 20 Å was added to the z-axis to eliminate periodicity and avoid interaction between the two periodic units. In addition, considering the large contact models, we used a 10 × 10 × 1 K-point mesh around the gamma point in reciprocal space. The interlayer interaction of all interface models was carried out using Grimme's D3 correction45,46 to address the deficiencies in van der Waals forces.
To determine the stability of the structure and the nature of interaction force between the two dielectric friction layers, the binding energies of interface models with different configurations were calculated as follows
Eb = (ECxFy–SiO2 − ECxFy − ESiO2)/A | (1) |
Material | Atomic number | a/Å | b/Å | Interlayer thickness/Å2 | Binding energy eV Å−2 |
---|---|---|---|---|---|
C2F4–SiO2–O | 45 | 5.46 | 4.87 | 2.719 | 0.034 |
C2F4–SiO2–Si | 43 | 5.46 | 4.87 | 2.740 | 0.011 |
C2F4–SiO2–SiO | 44 | 5.46 | 4.87 | 2.369 | 0.053 |
I-C3F6–O | 54 | 6.37 | 4.89 | 2.024 | 0.038 |
I-C3F6–Si | 52 | 6.37 | 4.89 | 2.093 | 0.032 |
I-C3F6–SiO | 53 | 6.37 | 4.89 | 2.362 | 0.008 |
II-C3F6–O | 57 | 6.37 | 4.89 | 1.568 | 0.046 |
II-C3F6–Si | 55 | 6.37 | 4.89 | 1.378 | 0.024 |
II-C3F6–SiO | 56 | 6.37 | 4.89 | 2.038 | 0.012 |
III-C3F6–O | 56 | 6.37 | 4.89 | 1.118 | 0.019 |
III-C3F6–Si | 54 | 6.37 | 4.89 | 1.426 | 0.002 |
III-C3F6–SiO | 55 | 6.37 | 4.89 | 1.356 | 0.002 |
Analysis of the values in Table 1 indicates that when C2F4 and C3F6 are combined with SiO2, the contact area of C2F4 is smaller than that of C3F6 while the interlayer thickness is larger than that of C3F6. Consequently, it is easier for C3F6 to form a contact interface model with SiO2 than C2F4. Among the interface models consisting of SiO2 with different C3F6 configurations, the I-C3F6 model always has the largest interlayer thickness, whereas the II-C3F6 model has a suitable interlayer thickness. For the interface models consisting of C3F6 with different SiO2 configurations, the binding energies of the C3F6–O configurations are consistently larger than those of the C3F6–Si configurations and larger than those of the C3F6–SiO configurations. Based on previous studies,49,50 we screened the interface models with van der Waals interactions using 20–40 meV Å−1 as the range of binding energies. When the polymer C3F6 layer contacted with SiO-terminated SiO2, the binding energy is less than 0.02 eV Å−2. When the SiO2 layer contacted with II-C3F6, the formed configuration has the largest binding energy, of which the II-C3F6–O configuration has the most suitable binding energy of 0.046 eV Å−2.
In order to better understand the output performance, we analyzed the plane-averaged charge density difference of these 12 interface models and attempted a preliminary screening based on the amount and direction of charge transfer between the contact surfaces. It can be inferred from Fig. 2 that when the polymer CxFy is contacted with O-terminated SiO2 to form the CxFy–O interface model, the values of average charge density difference all reach up to 6 × 10−3 e Å−1. In contrast, when it is contacted with Si-terminated and SiO-terminated SiO2 to form the CxFy–Si and CxFy–SiO interface models, respectively, the values are much less likely to reach the same level in both dielectric friction layers.
For the CxFy–O, I-C3F6–SiO, and II-C3F6–SiO configurations, as shown in Fig. 2(a)–(d), (j) and (k), the six configurations have similar charge transfer modes. The difference values between the CxFy and SiO2 layers are almost equal, indicating a nearly unidirectional electron transfer. The configurations terminated with O atoms show a significantly larger charge transfer than those terminated with SiO atoms. In particular, the II-C3F6–O configuration has better charge transfer capacity with a larger amount of charge transfer, and the values of the average charge density difference reach up to 7.6 × 10−3 e Å−1, which represents an increase of 26.7% compared to the previously mentioned average value. For the CxFy–Si and C2F4–SiO configurations, as shown in Fig. 2(e)–(i), the frequent charge transfer at the interface implies that the electrons of these models do not simply transfer between the CxFy and SiO2 layers; some electrons accumulate near the interface instead of moving unidirectionally. For the III-C3F6–Si and III-C3F6–SiO configurations, as shown in Fig. 2(h) and (i), the charge transfers are too small and not considered in the subsequent calculations. In summary, among the above 12 interface conformations, the II-C3F6–O model has the most charge transfer and unidirectional electrons transfer.
In order to understand the effect of different polymer friction layers on the interfacial properties, the charge density difference Δρ at the interfaces was computed to further investigate the charge transfer and charge redistribution between the CxFy and SiO2 interfaces.51
Δρ = ρCxFy–SiO2 − ρCxFy − ρSiO2 | (2) |
It can be inferred from Fig. 3 that the yellow area indicates the charge depletion region and the blue area indicates the charge aggregation region. Charge transfer at the contact interface can be visualized more intuitively through the differential charge density map. We can judge the level of charge density based on the size of the area where the charge accumulates. The charge aggregation and depletion mainly occur at the contact interface between the polymer CxFy and SiO2 electret materials. There is more charge transfer occurring between the CxFy and O-terminated SiO2, no significant charge transfer between the CxFy and Si-terminated SiO2, and less charge transfer between the CxFy and SiO-terminated SiO2. For the polymer CxFy contacting the SiO2–O interface, as shown in Fig. 3(a–d), CxFy acquires electrons from the SiO2 interface, forming a charge depletion region at the SiO2 layer and a charge aggregation region at the CxFy layer. As shown in Fig. 3(c), II-C3F6 contact with the SiO2–O interface has a greater charge density. This indicates that the II-C3F6–O model has a strong charge transfer capability as the electret materials of the triboelectric nanogenerator. For the polymer II-C3F6 contacting different termination atoms of SiO2, as shown in Fig. 3(c, e and f), based on the different contact surfaces as well as the different sizes of the charge transfer region, it can be further judged that the II-C3F6–O structure has a better charge transfer ability and is more suitable to be the electret material for triboelectric nanogenerator.
The electrostatic potential difference between the two dielectric friction layers can be used to understand the amount of charge transfer and the time of storing charge. All configurations were analyzed by the value of differential charge density, and the variation of electrostatic potential along the z-direction was plotted, as shown in Fig. 4.52 The electrostatic potential differences between CxFy and SiO2–O, II-C3F6 and SiO2–Si, II-C3F6 and SiO2–SiO configurations were investigated. The electrostatic potential of the SiO2 layer is shown on the left side of the figure and that of the polymer layer is on the right side. By quantitatively analyzing the electrostatic potential, for the configurations of the CxFy contacting the O-terminated SiO2, as shown in Fig. 4(a–d), the difference in electrostatic potentials of the C3F6–O interface is significantly larger than that of the C2F4–O interface, which indicated that the charge transfer between the dielectric friction layers of the C3F6 and SiO2–O interfaces is closer, among which the II-C3F6 configuration performs optimally. For the configurations of II-C3F6 contacting different termination atoms of SiO2, as shown in Fig. 4(c, e and f), they possess almost the same trend of electrostatic potential change at the same distance. However, the difference in the electrostatic potential between the II-C3F6 and SiO2–O interfaces is the largest, as shown in Fig. 4(c), which indicates that the II-C3F6–O model possesses more charge transfer and has better power generation performance.
In order to gain insight into the nature of charge transfer between the dielectric friction layers composed of polymer CxFy and SiO2 electret materials, we calculated the total density of states (TDOS) and the projected density of states (PDOS) of the atoms for these interface models, as shown in Fig. 5. Due to the difference in the C2F4 and C3F6 extra-nuclear electronic structures, the TDOS peaks of the C2F4 structure in Fig. 5(a) are smaller than those of the other C3F6 structures. Also, there is a region with no density of states near 1 eV that is also different from the other C3F6 structures, a characteristic that is not conducive to electron transfer between dielectric friction layers.
In the interface models, as shown in Fig. 5(b)–(d), one layer of the dielectric friction layers is O-terminated SiO2 and the other layer contacts different C3F6 structures. It can be seen that above the Fermi energy level, for the I-C3F6 structure, the first peak of the O atom is close to the C and F atoms and shows hybridization in both contour and value. For the II-C3F6 structure, the hybridization of the O atom with C and F atom also changes obviously, and the change in the O atom is more obvious than that of the Si atom, which makes it reasonable to assume that the II-C3F6–O structure has better orbital hybridization and charge transfer. However, for the III-C3F6 structure, the first peak does not show significant hybridization with O atoms, which shows that the charge transfer of the III-structure is not as good as that of the I- and II-structures.
In the interface models, as shown in Fig. 5(c), (e) and (f), one layer of dielectric friction layers is the polymer II-C3F6 material, the other layer contacts different termination atoms of SiO2. For the SiO2–O model, the first peak on the O, C and F atoms shows obvious hybridization above the Fermi energy level. For the SiO2–Si model, the first peak also shows obvious hybridization but is numerically smaller than the O-terminated SiO2 model. For the SiO2–SiO model, the first peak has no obvious orbital hybridization compared with the other two models. Therefore, it is considered that the II-C3F6–O interface model, constituted by II-C3F6 in contact with the O-terminated SiO2, has better output performance, which also explains the charge transfer phenomenon between the dielectric friction layers.
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