Mario
Mäkinen
*a,
Timo
Weckman
b and
Kari
Laasonen
a
aDepartment of Chemistry and Materials Science, School of Chemical Engineering, Aalto University, Kemistintie 1, 02150, Espoo, Finland. E-mail: kari.laasonen@aalto.fi
bDepartment of Chemistry, University of Jyväskylä, Survontie 9 B, 40500, Jyväskylä, Finland
First published on 24th May 2024
ALD/MLD hybrid thin films can be fabricated by combining atomic layer deposition (ALD) and molecular layer deposition (MLD). Even though this deposition method has been extensively used experimentally, the computational work required to acquire the reaction paths during the thin film deposition process is still in dire demand. We investigated hybrid thin films consisting of diethyl zinc and either 4-aminophenol or hydroquinone using both gas-phase and surface reactions to gain extensive knowledge of the complex phenomena occurring during the process of hybrid thin film deposition. We used density functional theory (DFT) to obtain the activation energies of these kinetic-dependent deposition processes. Different processes of ethyl ligand removal as ethane were discovered, and we found that the hydroxyl group of 4-aminophenol was more reactive than the amino group in the migration of hydrogen to an ethyl ligand within a complicated branching reaction chain.
Based on ALD, another method, called molecular layer deposition (MLD), has also been developed, in which polymer chains are made from organic precursors. ALD has been developed since the 1970s and MLD has been developed since the 1990s. The atomic/molecular layer deposition (ALD/MLD) makes it possible to combine these methods and thus use both inorganic and organic layers of the atoms together as hybrid thin film materials.3 Future applications of these hybrid thin films include electrode and coating materials for battery applications, solar cells, UV-active photoluminescence materials, flexible, lightweight magnets, catalytic applications, and protective coatings.4 The fabrication process of hybrid thin films is still rather unknown from the perspective of chemical reaction mechanisms due to the very difficult experimental access to the properties of the transition state structure. The chemical reactions used to fabricate these hybrid materials are adsorption reactions, which can be studied using density functional theory (DFT) modelling. Thus, we can reveal the chemistry occurring in the reactor during the thin film fabrication process. This enables the fine-tuning of the deposition process and the feasibility comparison between precursors, which can enable the discovery of completely new precursors and deposition processes.
Zinc is one of the most common elements in conventional ALD due to the high demand for ultrathin zinc oxide structures in microelectronic applications.4,5 Similar to ALD, in the ALD/MLD processes, diethyl zinc is the most common inorganic precursor, and it is often combined with an organic precursor hydroquinone.4–12 To prevent hydroquinone from reacting twice within the same precursor pulse, Sood et al.13 suggested the use of 4-aminophenol, which replaces one of the two hydroxyl groups of hydroquinone with an amino group, to promote more sequential growth of the thin film due to the different reactivities of the reacting functional groups.
The hybrid thin films under investigation consisted of diethyl zinc and an organic phenol, either 4-aminophenol or hydroquinone, depending on the thin film. These zincone thin films have been studied using both gas-phase models and significantly more computationally expensive surface models. The surface models consisted of two different ethyl-saturated zinc oxide surfaces and the adsorbing organic precursor of the first precursor pulse. The organic precursor is adsorbed onto the zinc oxide surface via a branching chain reaction pathway, leading to either a ligand exchange or a dissociation reaction. 4-Aminophenol reacts faster with its hydroxyl group than with its amino group. The key step in the total hybrid thin film growth reaction was discovered to be the removal of the ethyl group as ethane. Different ethyl removal processes were discovered and found to depend on the coverage of the ethyl ligands on the zinc oxide surface.
Sood et al.13 investigated the use of heterobifunctional 4-aminophenol in zincone hybrid thin films. Two different functional groups and the stiff backbone of the aromatic ring should prevent double reactions of the precursor within the same precursor pulse. These double reactions are undesirable because they hinder the growth of the thin films, as the precursor cannot react further with the diethyl zinc of the next precursor pulse. Zincone hybrid thin films were deposited on top of 40 zinc oxide layers. The deposition temperature ranged from 140 to 330 °C. The growth of the thin film was linear, with an approximate growth rate of 1.1 Å. The hybrid films were stable in the ambient atmosphere, even at relatively high humidity levels, when capped with few zinc oxide layers. The films were reported to be amorphous, and the FTIR spectra revealed that both the hydroxyl and amino groups were bonded to zinc. Hybrid thin films fabricated with varying ratios of 4-aminophenol, diethyl zinc, and water were investigated by Sundberg et al.14 The ratio between the components was found to alter the hardness, chemical stability, surface roughness, density, and crystallinity of thin films. 4-Aminophenol can be removed from the structure using acetone, but this can be prevented by a 10 nm-thick topmost layer of zinc oxide.
Quite recently, computational research studies have been conducted on titanicone17 and alucone18,19 hybrid thin films. Tanskanen et al.17 studied the thermodynamics of the reactions of both hydroquinone and 4-aminophenol with TiCl4, which were adsorbed onto a TiO2 surface. They found that both the hydroxyl and amino groups of 4-aminophenol can bind to Ti4+-ions and that the hydroxyl group binds more strongly than the amino group. Muriqi et al.18 studied the thermodynamics of reactions between the methyl-terminated Al2O3 surface and both hydroquinone and 4-aminophenol. Both amino and hydroxyl groups bind favorably with either Al–O or Al–N bonds and eliminate CH4 from the surface. The hydroxyl group was found to be more reactive than the amino group. Yang et al.19 studied the gas-phase reaction between trimethyl aluminum and both 4-aminophenol and hydroquinone. They discovered that aluminum binds tightly to the hydroxyl group while eliminating H and CH3. This reaction is irreversible until all methyl groups are consumed. The reaction between the amino group and trimethyl aluminum is reversible. The reaction sequence was found to be considerably slower for the amino group than for the hydroxyl group.
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Fig. 1 Precursors used to build ALD/MLD hybrid thin films investigated in this study: diethyl zinc (left) reacted either with hydroquinone (middle) or 4-aminophenol (right). |
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Fig. 4 Migration reaction investigated in this study, which grows ALD/MLD hybrid thin films: after dissociation reaction presented in Fig. 3, the hydrogen originally from 4-aminophenol can migrate to an ethyl ligand and cleave it as ethane from the surface. |
The macrostructure of the thin film can be either a more traditional hybrid thin film, where a single layer of organic molecules and a metal atom alternate, or a more unconventional superlattice structure, where layers of single organic molecules are surrounded by relatively thick zinc oxide layers. The differences between the hybrid thin film and superlattice structures are presented in Fig. 5.
The reactions between the precursors presented in Fig. 1 were studied using DFT calculations. The energy ΔE of these reactions can be calculated by subtracting the energy of the initial state Einit from the energy of the reacted state Efin, which corresponds to the final state of the reaction. The activation energy Eact for the reaction between the precursors can be calculated using the energy of the highest energy state, i.e. the transition state Ets along the minimum energy path from the initial state to the final state of the reaction, and subtracting Einit from Ets. One can also calculate the energy of the molecular adsorption ΔEm.ads. of the precursor molecule on the ethyl-saturated zinc oxide surface using eqn (1),
ΔEm.ads. = Einit − Emeox − Eadsorbate | (1) |
Due to the large number of rotational degrees of freedom of the ethyl ligands present in the studied ethyl-saturated zinc oxide surfaces, 3 ps molecular dynamics (MD) simulations with 1 fs time steps were used to effectively probe the potential energy surface. Then, geometry optimization was used for the generated structures between 500 fs intervals to find a minimum for the given surface structure. A small polarized double-ζ basis set was used for the dynamic simulations. The temperature was kept constant at 450 K using a Berendsen thermostat to prevent unwanted decomposition, which could be caused by a temperature that is too high. Additionally, relaxed surface scans were employed to determine an energetically favorable structure for the physisorption of 4-aminophenol onto the zinc oxide surface. The reaction coordinate was chosen to be the distance between the nitrogen or oxygen atom of the functional group of 4-aminophenol and the chosen zinc atom in the surface structure. Then, using constrained optimization, the surface was probed along the reaction coordinate.
The use of DFT, especially when not paired with a relatively computationally expensive hybrid functional, can lead to an underestimation of activation energies of chemical reactions.30 This study focuses on the relative comparison of the transition state energies and the detection of reaction paths with relatively high activation energies. Even if the real reaction barriers are slightly higher than our results, this would not change the conclusions of our work. Despite these limitations in the calculations of absolute energies, DFT is recognized as the most viable and, thus, widely used approach to gather information about the chemical reaction rates for complicated surface reactions.31–33 DFT can also be utilized in the ab initio molecular dynamics,34 which can aid in the research of dynamical systems, but this approach is useful only if reaction rates are fast, which is not the case for the chemical reactions investigated in this study.
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Fig. 7 Initial state (left), transition state (middle), and final state (right) of the reaction between the amino group of 4-aminophenol and diethyl zinc molecule. The atom colors are the same as those in Fig. 6. |
Precursor reacting with diethyl zinc | E a (eV) | ΔE (eV) |
---|---|---|
Hydroquinone | 0.9 | −0.7 |
4-Aminophenol (hydroxyl group) | 0.8 | −0.7 |
4-Aminophenol (amino group) | 1.5 | −0.1 |
As the forming thin film of an ALD process is dependent on numerous variables such as temperature, the actual structure of the model benefits when it is benchmarked against experimental thin films. Hence, ethyl-saturated zinc oxide surface slabs were adopted from the work of Weckman and Laasonen,35,36 and are presented in Fig. 8. These zinc oxide structures are rigorously validated estimates of thin film structures fabricated at lower (approximately 100–140 °C) and higher (approximately 140–180 °C) deposition temperatures.
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Fig. 8 Structures of ethyl-saturated zinc oxide surface slabs used in this study: case 1 (left) is an estimate of the structure at lower deposition temperatures, whereas case 2 (right) is an estimate of the structure at higher deposition temperatures. The atom colors are the same as those in Fig. 6. |
The structure deposited at lower temperatures, denoted as case 1, occurs when the hydroxyl groups of the hydroxylated (100) zinc oxide surface react with five diethyl zinc molecules in a ligand-exchange reaction, as shown in eqn (2). Hydroxylation was conducted using four dissociated water molecules on three layers of (ZnO)8. Five ligand-exchange reactions eliminated a total of five hydrogen atoms from the dissociated water from the surface, making the chemical formula of case 1 surface (ZnO)24(ZnC2H5)5O4H3. Five monoethyl zincs were chosen, as higher concentrations made the structure unstable, thus making the final coverage of monoethyl zinc 7.1 nm−2.35
||− Zn − OH + Zn(C2H5)2 → ||− Zn − O − Zn(C2H5) + C2H6 | (2) |
In the higher deposition temperature structure, denoted case 2, the structure is similar to case 1, as three layers of (ZnO)8 were initially hydroxylated with four dissociating water molecules. However, at higher deposition temperatures, monoethyl zinc can also react further, thus creating bare zinc atoms on the surface, as illustrated in eqn (3). For the case 2 structure, it was assumed that all hydrogens on the surface were consumed in the ligand-exchange reactions, as presented in eqn (2) and (3). The most stable structure included four monoethyl zinc groups and two zinc atoms; thus, the chemical formula of the surface in case 2 was (ZnO)24(ZnC2H5)4Zn2O4. The final coverage of monoethyl zinc was 5.7 nm−2.35
||− Zn − O − Zn(C2H5) + ||− Zn − OH → (||− Zn − O)2 − Zn + C2H6 | (3) |
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Fig. 9 Reaction pathways for the direct and indirect ligand elimination reactions on the case 1 surface, when the hydroxide group of the 4-aminophenol acts as the hydrogen-donating group. This hydrogen atom can be donated either directly from the physisorbed 4-aminophenol, or it can be initially chemisorbed to an oxygen atom in the surface structure, from where it will migrate to the ethyl ligand. The atom colors are the same as those in Fig. 6. The most feasible reaction pathway is shown in bold. Migrating hydrogen atoms are marked with an asterisk. |
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Fig. 10 Reaction pathways for the direct and indirect ligand elimination reactions on the case 1 surface, when the amino group of the 4-aminophenol acts as the hydrogen-donating group. This hydrogen atom can be donated either directly from the physisorbed 4-aminophenol, or it can be initially chemisorbed to an oxygen atom in the surface structure, from where it will migrate to the ethyl ligand. The atom colors are the same as those in Fig. 6. The most feasible reaction pathway is shown in bold. Migrating hydrogen atoms are marked with an asterisk. |
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Fig. 11 Reaction pathways for the direct and indirect ligand elimination reactions on the case 2 surface, initiated by the donation of a hydrogen atom from the 4-aminophenol's hydroxide group. The ligand-exchange reaction is hindered by dissociative adsorption, which will lead to a reverse reaction back to the initial state or to a very slow hydrogen migration to the ethyl ligand. The atom colors are the same as those in Fig. 6. The most feasible reaction pathway is shown in bold. Migrating hydrogen atoms are marked with an asterisk. |
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Fig. 12 Reaction pathways for the direct and indirect ligand elimination reactions on the case 2 surface, initiated by donation of a hydrogen atom from the amino group of 4-aminophenol. The activation energies of these reactions are relatively high, and therefore, the reactions of the hydroxyl group presented in Fig. 11 are significantly more feasible on the case 2 surface. The atom colors are the same as in Fig. 6. The most feasible reaction pathway is in bold. The migrating hydrogen atom is marked with an asterisk. |
The amino group of 4-aminophenol reacts more slowly than the hydroxide group, both kinetically and thermodynamically. This result suggests that 4-aminophenol first reacts with its hydroxyl group. According to our surface model, additional surface reaction pathways are available at the interface between zinc oxide and the organic layer of these films, which are not taken into account in the gas-phase model; however, these do not change this result. The relatively high activation energies, especially for the reactions of the amino group, are in agreement with the slow growth of the zincone thin film presented by Sood et al.13 Interestingly, the tendency for 4-aminophenol to react with the hydroxyl rather than the amino group first has been discovered computationally also for titanicone17 and alucone18,19 hybrid thin films. Due to the amorphous structure13 of these films, the growth should be more polymer-like in later precursor pulses, which in practice corresponds to more degrees of freedom for the reactants. This further indicates that gas-phase reactions are beneficial in the discovery of the growth reactions in later pulses, as they offer a hard limit on the effect of degrees of freedom for the system, as an amorphous or crystal structure is always more rigid than a gas-phase structure.
To summarize, on the case 1 surface, the main growth reaction of the hybrid thin film is the ligand-exchange reaction, where 4-aminophenol first reacts with its hydroxyl group. The ALD/MLD process is mainly driven by reaction kinetics due to the relatively short pulsing times, and the 0.9 eV barrier of the direct ligand elimination is the lowest on the case 1 surface.
For the reaction at the lower ethyl-ligand concentration surface (case 2), the situation is more complex. The most feasible reaction path to remove ethane from the surface is the direct ligand elimination reaction of the hydroxyl group of 4-aminophenol. However, this reaction path is hindered by the dissociation reaction, which has a lower reaction barrier of 0.4 eV, but does not proceed to hydrogen migration to eliminate ethane due to a high 1.8 eV reaction barrier. As the relatively small physisorption energy of 4-aminophenol makes physisorption non-spontaneous when entropy is taken into consideration, only a small fraction of ligand elimination reactions occur, while the majority of the reactions occur in equilibrium between the gas phase, physisorbed state, and dissociatively chemisorbed state. This tendency to get trapped in a dissociatively adsorbed state was even more noticeable when the amino group reacted first. For the amino group, dissociative adsorption is the only reaction step with an activation energy below 1.5 eV. Thus, ligand elimination via the amino group reacting first is unlikely to occur due to the high activation energies of both reaction paths.
As the first pulse of the ALD/MLD thin film growth is being built on the zinc oxide surface, the first precursor pulse is responsible for surface reactions that may not be present in later precursor pulses. Therefore, these reactions can be crucial for the fabrication of superlattices, where a very thin organic layer alternates with a much thicker inorganic layer. For the investigation of hybrid thin films with higher concentrations of organic layers, both the gas-phase and surface models yield similar results for ligand elimination when the reactions involving the zinc oxide layer, which is not present in further precursor pulses, are excluded from the results. This result suggests that the more computationally feasible gas-phase model can provide relevant results regarding the growth of hybrid thin films.
In contrast to superlattice structures, in the studied hybrid thin film surface structures, the unreacted ethyl ligands cannot escape from the surface, as there is no future water precursor for ALD pulses, which could remove ethyl ligands as gaseous ethane. Thus, all of the reactions of ethyl ligands occur with an organic precursor, which is either 4-aminophenol or hydroquinone. In addition, a small physisorption energy of −0.2 or −0.3 eV is not sufficient to account for the entropy of these relatively large organic molecules, making the physisorption non-spontaneous. As the reaction of the first molecule in the unit cell is energetically demanding, the possibility of the second 4-aminophenol adsorbed within the same unit cell seems highly unlikely from an energetic point of view because the repulsion on the surface increases significantly after the adsorption of the first 4-aminophenol, thus hindering the adsorption of the second 4-aminophenol. This makes the growth direction vertical, even though there are still seemingly available reaction sites on the surface. For comparison, these reaction sites are also available in ALD thin films, where the organic precursor is replaced with water,37 which is much smaller in size. This also indicates that repulsion plays a significant role in the final structure of hybrid thin films. To summarize, the next reaction should be the diethyl zinc precursor that reacts with the 4-aminophenol adsorbed on the surface. As the 4-aminophenol is more likely to react first with the hydroxyl group, diethyl zinc should react with the amino group.
The oxygen in the zinc oxide layer can accept a hydrogen atom from the dissociating 4-aminophenol, thus hindering the elimination of the ethyl ligand as gaseous ethane, as the reaction can become trapped between the physisorbed and dissociatively adsorbed states. This effect, in conjunction with the relatively high reaction barriers and non-spontaneous physisorption, results in the overall slow growth of the hybrid thin film. For superlattice structures, where zinc oxide layers are separated by only a single organic layer, this effect is present in every deposition of the organic precursor. However, this effect should be absent from the later precursor pulses of hybrid thin films, as the oxygen of the zinc oxide should be available only for the initial organic precursor pulse, as the precursors used do not contain water apart from the initial ALD layer of zinc oxide.
The surface model provides detailed information about the growth reactions at the interface between the zinc oxide and 4-aminophenol layers. This information is important, especially in the study of superlattice structures, and much of this information is not present in the gas-phase models. However, due to the absence of oxygen in later precursor pulses and the higher number of degrees of freedom precursors have when bonding in an amorphous form in comparison to a more rigid crystalline structure, a gas-phase model should be sufficient for investigating the polymer-like growth of the hybrid thin film. Hence, this study investigated hybrid thin films using both approaches to gain comprehensive knowledge of the complex phenomena that occur during the hybrid thin film deposition process.
Footnote |
† Electronic supplementary information (ESI) available: The xyz coordinates of the reactions studied are included in the supplementary material. With these coordinates the systems can be visualized, and with an appropriate DFT code our results can be reproduced. This data, along with the relevant metadata and the results of the Bader charge analysis, are also presented in the Harvard Dataverse.1 See DOI: https://doi.org/10.1039/d4cp00249k |
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