Open Access Article
Abida Azama,
Ramesh Sharma
*b,
Debidatta Beherac,
Hafiz Hamid Razaa,
H. Saad Alia,
Shaimaa A. M. Abdelmohsend,
Ashraf M. M. Abdelbackie and
Sanat Kumar Mukherjeec
aCentre for Advanced Studies in Physics, GC University, Lahore-54000, Pakistan
bDept. of Applied Science, Feroze Gandhi Institute of Engineering and Technology, Raebareli-229001, Uttarpradesh, India. E-mail: sharmadft@gmail.com
cDept. of Physics, Birla Institute of Technology, Mesra Ranchi, Jharkhand, India
dDepartment of Physics, College of Science, Princess Nourah Bint Abdulrahman University, P.O. Box 84428, Riyadh 11671, Saudi Arabia
ePlant Pathology Department, Faculty of Agriculture, Cairo University, Cairo 12613, Egypt
First published on 22nd May 2023
At high pressure, the pressure dependencies of the structural, electronic, optical, and thermoelectric properties of Fe2HfSi Heusler were calculated using the FP-LAPW method within the framework of the density functional theory. The calculations were carried out using the modified Becke–Johnson (mBJ) scheme. Our calculations showed that the Born mechanical stability criteria confirmed the mechanical stability in the cubic phase. Further, through Poisson and Pugh's ratios critical limits, the findings of the ductile strength were computed. At a pressure of 0 GPa, the indirect nature of the material may be deduced from the electronic band structures of Fe2HfSi as well as the estimations for its density of states. Under pressure, the real and imaginary dielectric function responses, optical conductivity, absorption coefficient, energy loss function, refractive index, reflectivity, and extinction coefficient were computed in the 0–12 eV range. Using semi-classical Boltzmann theory, a thermal response is also studied. As the pressure rises, the Seebeck coefficient decreases, while the electrical conductivity rises. The figure of merit (ZT) and Seebeck coefficients were determined at temperatures of 300 K, 600 K, 900 K, and 1200 K in order to better understand the thermoelectric properties of a material at these different temperatures. Despite the fact that the ideal Seebeck coefficient for Fe2HfSi was discovered at 300 K and was determined to be superior to that reported previously. Materials with a thermoelectric reaction has been shown to be suitable for reusing waste heat in systems. As a result, Fe2HfSi functional material may aid in the development of new energy harvesting and optoelectronic technologies.
m space group with Y atom (Hf) occupying 4b (0, 0, 0), Z atom (Si) sit 4a (1/2, 1/2, 1/2) and the 8c (1/4, 1/4, 1/4) position was occupied by the Fe atoms. The optimal crystal structure and total energy as a volume-dependent function were predicted using the Murnaghan equation27 of state and shown in Fig. 1 is given as.
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, and V are the bulk modulus, pressure derivative of the bulk modulus, and volume, respectively. The minimum energy at the optimized volume is found in the ferromagnetic (FM) phase at pressure 0 GPa with a lattice parameter of 5.920 Å and agrees with experimentally/theoretically reported values of 5.884 Å and 5.930 Å at room temperature from the family of these compounds.22,28,29 The estimated parameters of the examined Heusler compound lattice constant, its pressure derivative, unit cell volume, bulk modulus, minimum ground-state energy, and cohesive energy are presented in Table 1. The comparison30 shows that the lattice constant increases in Fe2YSi as the atomic number at Y place changes, a lesser B value anticipates that the studied compound is much easier to press as Fe2ZrSi.
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| Material property | 0 GPa | 15 GPa | 30 GPa |
|---|---|---|---|
| C11 (GPa) | 383.15 | 500.74 | 595.68 |
| C12 (GPa) | 116.89 | 155.96 | 192.17 |
| C44 (GPa) | 133.93 | 184.91 | 223.71 |
| Bulk modulus, B (GPa) | 205.65 | 270.88 | 326.67 |
| Shear modulus, G (GPa) | 133.61 | 179.79 | 214.65 |
| Young modulus, Y (GPa) | 329.486 | 441.67 | 528.81 |
| Poisson ratio, σ (GPa) | 0.232 | 0.228 | 0.230 |
| Pugh ratio, B/G (GPa) | 1.53 | 1.506 | 1.521 |
| Frantsevich ratio, G/B (GPa) | 0.649 | 0.663 | 0.657 |
| Shear anisotropy factor, A (GPa) | 1.006 | 1.150 | 1.108 |
| Cauchy pressure CP (GPa) | −17.04 | −28.95 | −31.54 |
| Transverse sound velocity (m s−1) | 3617.11 | 4066.55 | 4334.17 |
| Longitudinal sound velocity (m s−1) | 6130.4 | 6853.02 | 7323.61 |
| Average sound velocity (m s−1) | 4007.8 | 4503.38 | 4800.95 |
| Temperature θD (K) | 508.27 | 583.176 | 632.10 |
| Melting temperature Tm (K) | 2817.47 ± 300 K | 3512.39 | 4073.48 |
Table 2 provides the computed values of ϑt, ϑl, Vm, θD, and Tm
The conduction band's bottom and the valence band's top do not meet at the same symmetry point, as such is indirect in nature with a small shift in band gap around EF as pressure increases from 0 GPa to 30 GPa. This variation is exposed in Fig. 3 and also in Fig. 4. That means as pressure increases, the material tends towards more stability. As a result, pressure-induced expansion of the semiconductor heaving indirect bandgap is rather slight. The gap value rises with the addition of mBJ up to 0.6 eV in Fe2HfSi at P = 0 GPa disclosing an increase of more than 33%, as depicted in Table 3.
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| Fig. 4 Complex dielectric function (a) real, (b) imaginary part and refractive index (c) real, (d) imaginary part for Fe2HfSi at 0, 15, 30 GPa. | ||
To explore more about electronic characteristics, the densities of states (DOS) are depicted relative to EF in Fig. 4, displaying the total and partial densities of state (PDOS) over the specified range of pressure in gigapascal units. The black line indicates the overall contribution of the compound with constituent atoms Fe-3d, Hf-5d, and Si-3p at zero, fifteen, and thirty gigapascals orderly. The s-orbital of Si slightly contributes to electronic investigations of Fe2HfSi as compared to the other atoms, while the stronger contribution comes from the Fe d-orbital, Hf d-orbital whereas for the Si it is p-orbital. When the pressure is increased, there is very little discernible shift in the profile of the DOS. Moreover, there is a significant disparity in the locations of the peaks. Fe2HfSi exhibits equal contributions of Fe-3d, Hf-5d, and orbital 3p of the Si at 0–5 eV. Fe-3d is the main contributor to the unoccupied states. For Fe2HfSi, the DOS matches well with the experimental results reported in literature.33
The ε1(ω) component indicates the extent to which a material may be polarised.35 The static dielectric constant was found to be dependent upon the bandgap (Eg) of the material. While with the pressure climbing from 15 to 30 GPa, the static dielectric function declines, as the actual dielectric function falls and approaches zero at 4.8–5.0 eV. If more energy increases, the dielectric function becomes negative, which made this material might be as that of meta-material as shown in Fig. 4(a).35,36 By increasing the pressure to 30 GPa, a little movement towards higher energy areas was observed in this graph.
The imaginary part ε2(ω) contributes significantly to defining more about the optical illustration for any material. Greater values correspond to the higher absorption of explored medium. This proposes a deep effect on absorption. Fig. 4(b) depicts the relationship between the imaginary component of the dielectric function and energy, showing how the material's absorption zone thickens as pressure increases. To put it simply, the absorption peaks at 0 GPa and dips at 30 GPa due to indirect bandgap transitions at high symmetry sites between the valence band maximum and conduction band minimum. There also exist some peaks because of the inter-band transitions. To figure out the surface behaviour, the ratio of the incident power to the reflected power is used to figure out reflectivity. The dielectric pattern nearly follows as reported previously.37 The refractive index and extinction coefficient versus energy spectrum are presented in Fig. 4(c) and (d). The static index n (0) values of 4.89, 4.81, and 4.77 may be observed in the figure for cubic Fe2HfSi at 0, 15, and 30 GPa pressure, respectively. As the pressure rises over 0–30 GPa, the refractive index peaks shift somewhat toward higher energy values. However, various peaks may be seen in the graph centre, which disappears with higher energies. It is certain that the material transparency will be lost at a particular level of energy, and high-energy photons will be available to be absorbed at that point. Fig. 4(c) shows that the refractive index is lower than unity at specified energies. The group velocity of incoming radiation was found to be higher than the speed of light, based on lower than unity values of refractive index. It constitutes that the group velocity exposes a shift towards negative values reflecting the non-linear nature of the medium. Thus, it may be deduced that the material transforms into a superluminal medium for photons with high energies.38,39
Fig. 4(d) depicts a plot of extinction coefficients. It gives an idea about the light absorption and absorption characterizes the extremes of the band at the same time.40 It is an imaginary part of the refractive index with prominent peaks probably due to the transitions among the valence and the conduction bands. At varying pressures, the reaction in Fig. 5(d) is precisely connected to the imaginary component of the dielectric function.32 This constitutes the same trend of absorption with the same footprints of refractive index.
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| Fig. 5 For Fe2HfSi (a) optical conductivity (b) absorption coefficient (c) EELS and (d) reflectivity data is plotted at 0, 15, 30 Gpa. | ||
One of the key optical parameters used to describe how electrons are transported in the electromagnetic radiation that is being produced in the current state is called optical conductivity. This parameter obtained for a substance demonstrates its efficacy in optoelectronic devices and system applications. At various pressures, the optical conductivity of Fe2HfSi may be shown in Fig. 5(a) as a photon energy function and we can note conductivity values are zero for energy values 0.78, 0.89, 0.90 eV at pressures of 0, 15, and 30 GPa, respectively. This is in line with the material's bandgap under varying pressures. Increasing the photon energy results in an increase in these values, which peak at 4.21, 4.42, and 4.63 eV against 0, 15, and 30 GPa pressures, respectively. It is possible to observe that the peak moves into the higher energy zone as the pressure continues to grow up to 30 GPa. After securing peak values, the graph starts showing a decreasing trend with a further increase in the energy of the photon. Practically, the optical conductivity line form is similar to that of the extinction coefficient and dielectric imaginary part spectrums. The light intensity decreases with increasing distance as it passes through a material, and this decrease is represented by the absorption coefficient. Fig. 5(b) shows the cubic Fe2HfSi absorption coefficient in relation to the frequency at different pressure values. The energy range from 0 to 12 eV is used to describe its fluctuation. Pressures of 0, 15, and 30 GPa produce maximum maxima of 11.3, 12.02, and 12.0, respectively. It has been seen that when the pressure goes up, the absorption peak moves up, with further increasing pressure, it may go towards higher values of energy as the trend shown in the presented data. It can also be noted that no absorption is observed for photon energy less than 1 eV for this pressure range. However, with greater energy than this value, it starts increasing, which is aided by the indirect bandgap values calculated Fe2HfSi at different pressures respectively.
Fig. 5(c) represents the energy loss function in the 0–30 GPa pressure range. The plasma resonance/plasma frequency features are depicted in the graph by the prominent peaks. In this pressure range, no energy loss has been observed for the photons with energy less than 1 eV. For further increase in photonic energy, energy losses start increasing and come to the maximum value in the 10.3–11.12 eV energy range for 0–30 GPa, respectively. Peak shifts toward higher energies are observed by increasing pressure up to 30 GPa. An interface between the metallic and dielectric expressions may be found in the observed data.
The zero frequency limits of reflectivity shown in Fig. 5(d) also demonstrate a rise with increasing pressure and the potential to achieve an optimal value. In comparison, the energy range from 0 to 11 eV has the lowest reflectivity due to collective plasma resonance. Additionally, the imaginary part of the dielectric function can account for plasma resonance.41 This pattern is consistent with the dielectric function imaginary portion as the reflectivity peak changes toward greater energy when the pressure is increased.33,34 The energy loss spectrum, which is often significant at plasma energies, depicts the energy loss of a fast-moving electron through a material. It is known that the frequency associated with the peak in the loss function is the plasma frequency. These bumps correlate to the spectrum's uneven edges.
Semiconductors have a substantial Seebeck coefficient (S) that is highly reliant on DOS in the vicinity of the EF. The computed S for Fe2HfSi as a function of temperature is shown in Fig. 6(a). The band structure study anticipated that holes (p-type) would be the dominant charge carriers for the material in the temperature range of 150–1200 K, and this is supported by the positive Seebeck coefficient. Additionally, Fe2HfSi has a higher S than other Fe-based Heusler alloys.42,43 Because of this, the Seebeck coefficient and indirect band gap of these alloys are rather large. Aiming for a high S value to obtain a high-efficiency TE and a close ZT is a fruitful endeavor. Utilizing the electrical conductivity and S, it gets the stuff. The charge packets must be either p/n type. We estimated the S versus chemical potential at various pressures, generally up to 30 GPa, to increase the performance of TE. Fig. 7(a)–(c) demonstrates that S is entirely boosted in the area where μ − EF = 0, indicating that a sufficiently large S value may be obtained with a lower p or n-type of doping. Therefore, we should emphasize whether the material's conductivity in the Fermi zone is n or p-type. This setting controls the number of transporters in the lead position. It presents n-type materials with a negative S value and p-type materials with a positive S value. Therefore, both p and n doping types are optimal for attaining a high S value. As pressure rises, the Seebeck coefficient falls, showing that Fe2ZrSi is an excellent thermoelectric material.
The electrical conductivity parameter, which is carrier concentration-dependent, is presented in Fig. 6(b). The electrical conductivity of cubic Fe2HfSi was measured at a spectrum of pressures and temperatures (ranging from 150 to 1200 K). It shows how many conduction-ready electrons are available. A semiconductor's band structure determines its electrical conductivity, with the most important factors being the kind and concentration of carriers, as well as the band gap.44 Fig. 6(b) illustrates that a rise in temperature and pressure causes an increase in electrical conductivity. In the pressure range of 0–30 GPa, there is an exponential increase in conductivity as temperature rises. Despite the fact that electrical conductivity increases with pressure from 0 to 15 GPa, the maximum value of electrical conductivity is found at 30 GPa and 1200 K. Where there will concentration high results in high electrical conductivity. As per the reported data with an increase in pressure, electrical conductivity goes high for that material. Electrical conductivity is shown in Fig. 7(d)–(f) in relation to chemical potential while pressures range from 0 to 30 GPa. The graph shows that the alloy is very effective in making TE systems work well. At zero chemical potential, the electrical conductivity is at its lowest, and it goes up as the chemical potential goes up. For n-type doping, the highest level of electrical conductivity is seen. The phase of the material changes because the pressure goes up as the temperature goes up.
Furthermore, the electronic thermal conductivity of a material is an important thermoelectric property that fluctuates with chemical potential and affects the material's TE response. It is shown in Fig. 7(c) that how the predicted electronic thermal conductivity changes with the change in chemical potential (μ = μ − EF) at various temperatures. It can be seen from the graph that as the temperature rises, the thermal conductivity of electrical components increases significantly. At 1200 Kelvin, κe/τ has attained its maximum value, whereas, at 300 Kelvin, it has dropped to its minimum. Even though there are no theoretical or experimental numbers to compare it to, the present change in the electronic thermal conductivity with chemical potential demonstrates that it is comparable to other Heusler alloys.45,46 However, it is based on the concentration of electronic contributions. The electronic part of thermal conductivity is under consideration because of the omission of its lattice part due to high-temperature ranges.
Power factor is a dynamic tool that shows how well TE materials work. It is written as S2σ. For a huge power factor to be reached, both σ and S must be high. At pressures from 0 to 30 GPa, the effect of chemical potential between −2 eV and 2 eV on the power factor was looked at. The results are shown in Fig. 7(j)–(l). Around −1.57 GPa, the PF goes up very quickly, and slight changes have been seen as the pressure goes from 0 to 30 GPa, but it does not go any higher than 4 GPa. Nonetheless, the best PF could be reached with p-type doping carriers. Although for the n-type doping carrier, a PF as large as p-type is unattainable, and the optimal value is challenging to achieve experimentally.47 Fig. 7(e) shows the variation of charge carrier concentration with temperature. The increasing trend suggests charge carrier concentration increases with an increase in temperature and pressure. The figure of merit (ZT) used to determine the efficiency of TE materials is based on four variables: absolute temperature, electrical conductivity, Seebeck coefficient, and thermal conductivity. A dimensionless number that has a direct relationship with the S and an inverse relation with K. Materials that have a high S value and low K values are more efficient. The largest ZT value reported is 0.80 at 15 GPa. At 30 GPa, rather than 0 or 15 GPa, the ZT value of the proposed compound is larger at ambient temperature, as observed in Fig. 6(e). As shown in Fig. 7(m)–(o), ZT climbs fast as the chemical potential approaches its maximum value. At a specific chemical potential, it is stable over a broad range of chemical potentials before rapidly dissipating. ZT appears to be close to unity (∼1) for the investigated material at all tested temperatures. In n-type regions, however, this response to a higher ZT is more prominent.
m space group was supported by optimization. Pressure has a tendency to widen the band-gap. At 30 GPa, band gaps can reach a maximum of 0.98 eV. A linear increase in pressure to 30 GPa results in a decrease in the static dielectric constant, plasma frequency, and static refractive index. In spite of this, pressure-induced increases in optical bandgap are consistent with Penn's model. The positive refractive index indicates that Fe2HfSi has not become metamaterial at this pressure. Under extreme pressure, the material shows no stability in terms of plasma frequency, which has been found to rise in frequency as pressure increases. The suggested results could be extremely valuable in understanding and developing optoelectronic devices based on Fe2HfSi under severe pressure settings. The power factor and Seebeck coefficient of Fe2HfSi are precisely determined by the material's unique composition. As a result, understanding how temperature and pressure affect ZT's maximum value will be critical in the coming years. Understanding the doping contribution of half of Heusler alloys requires an understanding of chemical potential dependence. This type of material is in high demand for TE harvesting technologies.
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