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Correction: 12-state multi-level cell storage implemented in a 128 Mb phase change memory chip

Zhitang Song *a, Daolin Cai *a, Yan Cheng b, Lei Wang c, Shilong Lv a, Tianjiao Xin a and Gaoming Feng c
aState Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China. E-mail: ztsong@mail.sim.ac.cn; caidl@mail.sim.ac.cn
bKey Laboratory of Polar Materials and Devices (MOE), Department of Electronics, East China Normal University, Shanghai 200241, China
cSemiconductor Manufacturing International Corporation, Shanghai 201203, China

Received 4th May 2021 , Accepted 4th May 2021

First published on 25th May 2021


Abstract

Correction for ‘12-state multi-level cell storage implemented in a 128 Mb phase change memory chip’ by Zhitang Song et al., Nanoscale, 2021, DOI: 10.1039/d1nr00100k.


The authors regret that Fig. 2(a) and 4(a) of the original manuscript contained errors. In the previous Fig. 2(a), the blue curve was labelled as SiN/WN incorrectly – this should be changed to WN/WN. In addition, in Fig. 4(a), the red and blue curves are labelled SiO2/XY and XY/XY respectively, which contradicted the figure caption and the main text. These labels should be SiO2/WN and WN/WN instead.

Updated versions of Fig. 2(a) and 4, with associated captions, are displayed below.


image file: d1nr90100a-f2.tif
Fig. 2 TiN blade BEC electrical properties. (a) Cumulative probability distribution of resistance values for a 3 nm-thick TiN BEC with a quantity of 1k cells.

image file: d1nr90100a-f4.tif
Fig. 4 128 Mb PCM chip performance. (a) Memory windows test of PCM devices with 3 types of coating layers. Endurance of PCM devices, and the BEC coating layers are: (b) SiO2/SiO2, (c) SiO2/WN, and (d) WN/WN.

The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.


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