Bo Liangab,
Yongchao Raoa and
Xiangmei Duan
*ab
aSchool, of Physical Science and Technology, Ningbo University, 315211, China. E-mail: duanxiangmei@nbu.edu.cn
bLaboratory of Clean Energy Storage and Conversion, Ningbo University, Ningbo, 315211, China
First published on 26th November 2019
The electronic properties of the g-C3N4/β-As and g-C3N4/β-Sb heterojunctions are investigated via density functional theory. We find that both heterostructures are indirect band gap semiconductors that, when applied to a photocatalytic device, will suffer from inefficient light emission. Fortunately, the band gap of the two junctions can be adjusted by external biaxial strain. As strain increases from compression to extensive, both compounds undergo a transition from metals, indirect semiconductors to direct semiconductors. Moreover, due to the charge transfer, each junction forms a large built-in electric field, which helps to prevent the recombination of electrons and holes. Our results are expected to widen the potential applications of these heterojunctions in nanodevices.
Among the allotropes of the non-metallic carbon nitride, graphitic C3N4 (g-C3N4) is the most stable phase under ambient conditions.24 It exhibits the characteristic of semiconductor (with a band gap of 2.7 eV25), and is non-toxic, visible light responsive and easy to synthesize.26–28 In addition, g-C3N4 has caused great concern due to its conceivable usage in electronic devices and optoelectronic conversion.
For bulk arsenic and antimony, the most stable allotrope is beta gray arsenic and beta gray antimony, respectively. Both are buckled honeycomb structure analogous to blue phosphorus.29 And their monolayer counterparts are known as gray arsenene (β-As) and gray antimonene (β-Sb), respectively. β-As and β-Sb sheets have been experimentally synthesized,30–33 with a corresponding indirect band gap of 2.49 and 2.28 eV,30 as well as considerable carrier mobility.34–36 It is critical to have a tunable band gap for semiconductor materials, especially when applied to nanodevices. Previous studies have reported that the electronic structure of few-layer arsenic and antimony nanosheets depends sensitively on the number of layers, stacking modes and defects.36–40 Meanwhile, β-As or β-Sb can be converted into direct band gap semiconductors under electric field and biaxial strain.37,41,42 An interesting idea arises: can the electronic properties of β-As and β-Sb based heterostructures be modulated under strain?
In this paper, the electronic properties of g-C3N4/β-As and g-C3N4/β-Sb heterostructures are systematically investigated by using first-principles calculations. We find that the stable heterostructures can be readily formed due to the slight lattice mismatch between the compounds. The charge transfer between each junction results in a built-in electric field, which helps to prevent the recombination of electrons and holes. The heterostructures are indirect band gap semiconductors, however, their electronic properties could be tuned by the biaxial strain (ε).
Binding energy, Eb, can be used to present the structural stability of the heterostructure system. For instance, the binding energy of g-C3N4 and β-As is defined as
Eb = (Eg-C3N4/β-As − Eg-C3N4 − Eβ-As)/N |
The charge density difference is determined by subtracting the electronic charge of the corresponding isolated compositions from the heterojunctions, for g-C3N4/β-Sb, that is, Δρ = ρg-C3N4/β-Sb − ρg-C3N4 − ρβ-Sb, where ρg-C3N4/β-Sb, ρg-C3N4, and ρβ-Sb are the charge density of the corresponding g-C3N4/β-Sb heterostructure, g-C3N4 and β-Sb sheet. The amount of transferred charge ΔQ(z) is calculated by
The biaxial strain is defined as ε = (l − l0)/l0 × 100%, where l and l0 is the strained and original lengths of the monolayer along one of strain direction. The sample is compressed or tensile in two distinct directions with the same strain level.
g-C3N4 | β-As | β-Sb | |
---|---|---|---|
a (Å) | 7.13 (7.13)b | 3.62 (3.68)c | 4.06 (4.01)d |
Eg (eV) | 1.20 (1.19)e | 1.63 (1.64)c | 1.12 (1.18)f |
To simulate the g-C3N4/β-As and g-C3N4/β-Sb heterostructures, a 2 × 2 supercell for β-As and a cell for β-Sb are used separately to match the 1 × 1 g-C3N4 unit cell. The lattice mismatch is only 1.54% (1.37%) respectively between β-As (β-Sb) and g-C3N4, which should be suitable for building hybrid structures. The top and side views of g-C3N4/β-As and g-C3N4/β-Sb heterostructures are illustrated in Fig. 1. The g-C3N4 and β-As sheets remain their pristine geometries with a vertical distance of 3.44 Å. While in the junction of g-C3N4/β-Sb, the layer g-C3N4 tilts slightly, the average distance between the two counterparts is 3.42 Å. Therefore, the heterojunctions are connected by van der Waals interaction. The binding energy is calculated to be −37.14 meV and −42.86 meV for g-C3N4/β-As and g-C3N4/β-Sb, respectively, indicating the stability of both heterojunctions. The strength of the interaction is stronger than that of graphene/β-As (graphene/β-Sb) heterojunctions, in which Eb is −29.70 meV or −39.62 meV, as reported by similar DFT calculations.46,47
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Fig. 1 Top (left panel) and side (right panel) views of g-C3N4/β-As (a) and g-C3N4/β-Sb (b). Blue, gray, green, and brown spheres represent the N, C, As, and Sb atoms, respectively. |
Band structure and density of states for the hybrid g-C3N4/β-As and g-C3N4/β-Sb are shown in Fig. 2. The PBE calculation gives an indirect band gap of 1.24 eV for g-C3N4/β-As and 0.83 eV for g-C3N4/β-Sb. For the former, the VBM locates at Γ point and CBM at K point. While for the latter, the VBM is located at Γ too and CBM at M. Intriguingly, a large dispersion of band nears the VBM of the g-C3N4/β-Sb can be observed, indicating the high mobility of photogenerated holes. While both the CBM and VBM of g-C3N4/β-As are relatively localized, meaning a low carrier mobility.
To quantitatively understand carrier migration, we calculate the effective mass of charge carriers by the formula and list the results in Table 2. Generally, the values of effective masses along different directions have a large difference in g-C3N4/β-As and g-C3N4/β-Sb, confirming the obvious anisotropy in the heterojunctions. For β-As junction, the great values of holes,
along the Γ–K and Γ–M directions, and the mass of electrons,
along the K–M direction, reveal poor mobility of carrier migration. Fortunately, the mass
along the Γ–K direction is small, which provides the possibility for potential application of this material. In the case of g-C3N4/β-Sb, the effective masses of
along the Γ–K and Γ–M directions are reduced to 0.78 and 0.43 in comparison to the two separate sheets, which is expected to be used in photo-electronic devices.
From the partial density of states (PDOS) plots (shown in Fig. 2) of the two heterostructures, it can be seen that the VBM of g-C3N4/β-As is mainly contributed by the 2p states of N atoms and slightly by the 2p states of C atoms, its CBM consists of the 2p states of C atoms and N atoms, i.e. the VBM and CBM are mostly contributed by g-C3N4 side. In the case of g-C3N4/β-Sb, the VBM is attributed by 5p states of the Sb atoms, in contrast, the CBM is composed of the 2p states of C atoms and N atoms. More intuitively, the orbital diagrams in Fig. 3 shows that the VBM and CBM of g-C3N4/β-As are both located in the monolayer g-C3N4 [see (a) and (b)].
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Fig. 3 The charge density corresponding to the HOMO and LUMO states for g-C3N4/β-As (a and b) and g-C3N4/β-Sb (c and d) with an isosurface value of 0.004 e Å−3. |
The band edge alignment tells that g-C3N4/β-As is a type-I heterojunction, with the HOMO and LUMO locating in the same material of heterostructure. Whereas, the HOMO and LUMO of g-C3N4/β-Sb are located in different parts. The HOMO (VBM at Γ point) is mainly composed of the Sb atoms, while the LUMO (CBM at M point) is primarily contributed by the C atoms and N atoms from g-C3N4 side, indicating a type-II heterojunction, which has lower carrier recombination rate due to the separation of photogenerated electrons and holes, therefore it has higher carrier mobility and stronger photocatalytic activity.
We further investigate the charge density difference and the amount of transferred charge. Fig. 4(a) and (c) present the redistribution of charge density in two systems. Additionally, the vertical lateral charge transfer is shown in Fig. 4(b and d). We note that for g-C3N4/β-Sb junction, the charge density is redistributed by forming triangular shaped electron- and hole-rich regions, i.e., an electron–hole puddle within the β-Sb layer. The formation mechanism of electron–hole enrichment zone is due to the inhomogeneous planar g-C3N4 substrate. The planar averaged charge density difference in Fig. 4(b and d) shows that the g-C3N4 layer donates electrons to β-As or β-Sb side. Thus, the charge transfer between β-As or β-Sb and g-C3N4 introduces a built-in electric field, which produces a driving force to separate the photogenerated carriers to different monolayers.
It is well known that strain can significantly adjust the electronic properties of 2D materials, especially in the application of band engineering and device design. Since the systems g-C3N4/β-As and g-C3N4/β-Sb are all indirect band gap semiconductors, when applied to a photocatalytic device, they will suffer from poorly efficient light emission. We next study how the geometric stability and electronic properties of heterojunctions change under external biaxial strain, for the intact strain range, we then focus on their band regulation. Fig. 5(a) presents the stress varies with the strain for the two junctions. It can be seen that g-C3N4/β-As keeps its structure intact under the strain from 12% compressive to 8% tensile, while g-C3N4/β-Sb can sustain a biaxial compressive and tensile strain up to 10% means that the structure of the membrane is robust under a strain.
Combining the Fig. 5(b) and (c), it can be seen that the band gap of g-C3N4/β-As and g-C3N4/β-Sb junctions have a significant regulation under external biaxial strain (ε). When ε is in the range of [−6, 5], g-C3N4/β-As has an indirect band gap, which turns into a direct one when ε increases above 5%. A further decrease of ε less than −6%, the junction undergoes a transition from a semiconductor to a metal. Similarly, the g-C3N4/β-Sb exhibits metallic property when ε ≤ −6%. While it is still indirect band gap semiconductor in the strain range of [−5, 9]. When ε is in [−6, −5] and [9, 10], the junction experiences a transition from an indirect band gap semiconductor to a direct one. To figure out which part of the compounds dominate the change of the band structure under strain. We systematically investigate the electronic behavior of g-C3N4, β-As and β-Sb monolayers as a function of strain. As illustrated in Fig. 5(b) and (c), intriguingly, the variation trends of band gap for g-C3N4/β-As and g-C3N4/β-Sb are similar to the β-As and β-Sb, indicating β-As and β-Sb play a central role in the transition of the electronic characteristic of the junctions.
To reveal the mechanism for the transition of an indirect band gap semiconductor to a direct band gap, the electronic structure of g-C3N4/β-As at ε = 6% and g-C3N4/β-Sb at ε = 10% is compared with those of the unstrained system, respectively. For the junction containing β-As (β-Sb), the strain changes the CBM originally located at K (M) point to Γ point, while the location of VBM remains at Γ point. Moreover, the carrier distributions of the HOMO and LUMO states, as shown in Fig. 6, indicates the separation of electrons and holes for both systems, which is beneficial to prevent the recombination of the photogenerated carriers.
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Fig. 6 The charge density distribution of the HOMO and LUMO states for g-C3N4/β-As at ε = 6% (a and b) and for g-C3N4/β-Sb under ε = 10% (c and d). The isosurface value is 0.004 e Å−3. |
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