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Correction: Atomic layer deposition of Cu(I) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water
J. R.
Avila
ab,
A. W.
Peters
ab,
Zhanyong
Li
a,
M. A.
Ortuño
c,
A. B. F.
Martinson
bd,
C. J.
Cramer
c,
J. T.
Hupp
*abd and
O. K.
Farha
*ae
aDepartment of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA. E-mail: o-farha@northwestern.edu
bArgonne-Northwestern Solar Energy Research (ANSER) Center, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208, USA
cDepartment of Chemistry, Chemical Theory Center, and Supercomputing Institute, University of Minnesota, Minneapolis, Minnesota 55455, USA
dArgonne National Laboratory, 9700 S. Cass Ave., Argonne, IL 60439, USA
eKing Abdulaziz University, Faculty of Science, Department of Chemistry, Jeddah, Saudi Arabia
First published on 28th April 2017
Abstract
Correction for ‘Atomic layer deposition of Cu(I) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water’ by J. R. Avila, et al., Dalton Trans., 2017, DOI: 10.1039/c6dt02572b.
The authors would like to add the following section to the article.
Acknowledgements
The computational studies conducted by C. J. C. and M. A. O. were supported as part of the Inorganometallic Catalyst Design Center (ICDC), an Energy Frontier Research Center (EFRC) funded by the U.S. DOE, Office of Science, Basic Energy Sciences (DE-SC0012702). The experimental work by the remaining authors was supported as part of the Argonne-Northwestern Solar Energy Research (ANSER) Center, an EFRC funded by the U.S. DOE, Office of Science, Basic Energy Sciences under Award No. DESC0001059. A. W. P. was supported by the Department of Defense (DoD) through the National Defense Science and Engineering Graduate (NDSEG) Fellowship program. This work made use of the Keck-II facility of Northwestern University's NUANCE Center, which has received support from the Soft and Hybrid Nanotechnology Experimental (SHyNE) Resource (NSF ECCS-1542205); the MRSEC program (NSF DMR-1121262) at the Materials Research Center; the International Institute for Nanotechnology (IIN); the Keck Foundation; and the State of Illinois, through the IIN.
The Royal Society of Chemistry apologises for these errors and any consequent inconvenience to authors and readers.
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