Zhi Zhoua,
Nan Zhou*a,
Xiangyang Lu*b,
Melvin ten Katec,
David Valdesueirod,
J. Ruud van Ommenc and
H. T. (Bert) Hintzend
aScience College of Hunan Agricultural University, Changsha 410128, China. E-mail: zhounan@hunau.edu.cn
bCollege of Bioscience and Biotechnology, Hunan Agricultural University, Changsha 410128, China. E-mail: xiangyangcn@163.com
cDepartment of Chemical Engineering, Delft University of Technology, Van der Maasweg 9, 2629 HZ Delft, The Netherlands
dGroup Luminescent Materials, Section Fundamental Aspects of Materials and Energy, Faculty of Applied Sciences, Delft University of Technology, The Netherlands
First published on 8th August 2016
To improve the thermal stability, Al2O3 has been successfully coated on a Y3Al5O12:Ce3+ (YAG:Ce) phosphor powder host by using the Atomic Layer Deposition (ALD) approach in a fluidized bed reactor. Transmission Electron Microscopy (TEM) and Energy Dispersive X-ray spectroscopy (EDX) analysis indicate that coating an Al2O3 thin layer by ALD is highly feasible. The luminescence properties (such as excitation and emission as well as quantum efficiency and UV-absorption of the coated YAG:Ce phosphor) were systematically analysed, with the further examination of the thermal resistance characteristics. The Al2O3 thin layer coating with precisely controlled thickness by ALD can obviously improve the luminescence intensity and greatly enhances the thermal stability of the YAG:Ce phosphor. It is suggested that the alumina coating with tailoring thickness seems not only to act like a barrier to decrease the thermal quenching, but also as a great help to promote the light absorption and transfer.
Coating a phosphor with a protective layer has been proved to be an efficient approach to protect a phosphor from environmental attack.4–12 Thus, several techniques have been explored to deposit coating layers on phosphors. This includes (1) solid-state techniques such as rolling, milling, grinding of mixtures of phosphor powders with the precursor, followed by drying or a heat treatment if necessary; (2) liquid-phase techniques such as sol–gel,4–6 emulsion,7 hetero-coagulation,8 and precipitation;9 and (3) gas-phase techniques such as Chemical Vapor Deposition (CVD),10 Pulsed Laser Deposition (PLD),11 and Atomic Layer Deposition (ALD).12,13 However, most of the conventional coating methods suffer from inhomogeneous and/or ununiformed coating layer deposition, which will provide a negative effect on the optical properties.6 Therefore, a closed thin film coating method is needed in order to protect phosphor particles while maintaining (or even improving) the optical properties.
ALD is well known for depositing thin films on a flat surface, but with the combination of a fluidized bed reactor, it can also be used for coating micro and nano-sized powders.14 In such a fluidized bed reactor the particles are suspended in an upward gas flow so that good contact between gas and particles is ensured. Besides thin but nevertheless closed coating, another main advantage of ALD is that the thickness of a coated layer can be precisely designed by strictly controlling the number of ALD cycles. Thus, ALD can supply a uniform coating even on high surface area materials allowing a variation of thickness at an atomic resolution, all of which benefits ALD as a suitable method for homogeneous ultrathin layer deposition.15 Li et al.16 successfully deposited a 15 nm TiO2 thin film on Cu2O-based photocathodes through ALD method after ALD coating of an appropriate 20 nm buffer layer of Ga2O3 on Cu2O microcrystals. The high thermal resistance of Ga2O3 allowed for the double coating at relatively high temperatures, resulting in a better photo-voltage of the whole active cathode. A thin 1.2 nm TiO2 coating was performed by ALD on cobalt particles to prevent both leaching and sintering during aqueous-phase reactions. The TiO2/Co/TiO2 composite showed a high catalysis activity for aqueous-phase hydrogenation reactions with excellent stability.17 All above demonstrate that ALD techniques can produce continuous, pinhole-free oxide films with Angstrom-level-controllable thickness. In particular within a fluidized bed reactor, ALD shows high potential for depositing a protective thin layer coating on a phosphor particle without hurting the optical properties.
Many kinds of the oxides, such as Al2O3,18–20 SiO2,21,22 TiO2,23,24 ZnO,25,26 and ZrO27 have been used as coating material in ALD processes. Among them, Al2O3 is considered to be a promising coating agent to enhance the resistance of the coated materials. For example, the capacity fading of LiMn2O4 spinel as a battery material can be significantly reduced due to Al2O3 coating and consistent discharge curves were found even after 50 charging/discharging cycles at an elevated temperature of 55 °C.28 Ultrathin compact Al2O3 layers deposited by ALD were also utilized to improve the ambient stability of quantum dot films29 and organic–inorganic perovskite solar cells.20 The results demonstrate that the stability of the solar cell against humidity was greatly enhanced without an obvious reduction in efficiency. Besides, Al2O3 demonstrates a unique affinity to a large variety of substrates,14 together with its low deposition temperature, led to the judgments that depositing Al2O3 as a coating via ALD in a fluidized bed reactor is a promising way to increase resistance against outside attacks for phosphor materials like Y3Al5O12:Ce3+.
Y3Al5O12:Ce3+(the trivalent cerium activated yttrium aluminate phosphor with garnet structure, referred to as YAG:Ce), is a well-known luminescent material which has been broadly applied in the fields of flying spot scanner tubes in the past and white LED (WLED) devices nowadays. However, like most of the luminescence phosphors, YAG:Ce also suffers from the thermal instability, especially when used in practical WLED devices.3 In this work, YAG:Ce phosphor powder is employed as model material to study the improvement of the thermal stability by Al2O3 coating through ALD process performed in a fluidized bed reactor under atmospheric pressure. The impact of ALD cycle numbers on the thickness of the Al2O3 layer is investigated, as well as the thermal and optical performance of YAG:Ce phosphor. It will be shown that the ALD method with a fluidized bed reactor using alumina as oxide coating material could be a feasible way for the ultrathin film coating of YAG:Ce phosphors and apply a protective barrier for improving thermal resistance while maintaining the optical properties.
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Fig. 1 Schematic illustration of the ALD set-up and process: (A) nitrogen gas tank; (B) and (C) reactant tanks; (D) Fluidized Bed Reactor (FBR); (E) vibro-motors; (F) gas washers. |
Generally, one ALD cycle can be divided into four process steps: (1) TMA exposure, (2) purge with nitrogen gas, (3) oxygen exposure and (4) purge with nitrogen gas again. The whole ALD set needs to be purged with nitrogen for about 20 min before starting the first ALD cycle. For the first step of TMA exposure, nitrogen was purged through the reactant bubbler (part B) filled with TMA and making a gas stream for carrying the reactant into the FBR (part D) with a flow rate of 0.6 L min−1 (0.02 m s−1 superficial gas velocity). Subsequently, N2 was pumped into the reactor to carry away the redundant TMA at the second step. After that, synthetic air was pumped into the reactor to oxidize TMA and form the Al2O3 coating. Finally, the extra oxygen was blown away by N2 and then a new cycle can be started. Duration of each step has been optimized as 3, 10, 3 and 10 minutes, respectively.
Effluent gases from the reactor were led through a double set of gas washers (part F) filled with mineral oil. The gas streams containing TMA was led through separate gas washers to prevent reaction in the washers. Any TMA absorbed in the gas washers was neutralized after the experiment. The effluent from the gas washers was filtered using Pall Kleenpak pharmaceutical grade sterilizing filters to capture elutriated nanoparticles. The pressure at the outlet was atmospheric, meaning that the pressure in the column is slightly above atmospheric pressure. This is uncommon, as most ALD is carried out at vacuum. More details about the reactor can be found in our previous work.14
The temperature dependent luminescence properties were measured by home-built equipment. The emission spectra were measured in air with the temperature increased from 300 K to 600 K. The emission spectrum was recorded from 480 nm to 700 nm with an excitation wavelength of 460 nm came from a Xe flash lamp. The sample chamber was heated up with a rate of 10 K min−1. The equipment was maintained for extra 5 min before each measurement to hold a constant temperature. The excitation and emission slits were set at 5 nm. Excitation spectra were automatically corrected for the variation in the lamp intensity by a second photomultiplier and a beam-splitter. All the spectra were measured with a scan speed of 100 nm min−1.
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Fig. 2 XRD patterns of the uncoated (0 cycle) and coated YAG:Ce phosphor powders after different ALD cycles. |
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Fig. 3 SEM images of (a) the uncoated (0 cycle) and coated samples at different cycles (b) 5 cycles; (c) 10 cycles; (d) 15 cycles; (e) 40 cycles under low and high magnification (insets). |
The elemental distribution of the coated YAG:Ce phosphor was mapped, as illustrated in Fig. 4. Results indicate that the Y, Al, O and Ce elements are uniformly distributed on the same particle, which confirms the uniform and homogeneous coating of alumina via ALD process in fluidized bed. Meanwhile, EDX analysis with SEM shows that the ratio of Al content divided by (Y + Ce) content grows from 1.38 to 1.76 along with the increase of number of ALD cycles, as shown in Table 1, which should be attributed to the increase of thickness of deposited Al2O3 layers with adding more ALD cycles. It needs to be mentioned that the ratio of Al/(Y + Ce) measured by EDX was relatively low compare to the ideal ratio (1.67) calculated for stoichiometric Y3Al5O12:Ce3+. However, impurities and defects are generally formed during the synthesis of Y3Al5O12, and they exist within the crystals especially after doping with other cations.31,32
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Fig. 4 SEM images of (a) YAG:Ce particle and corresponding elemental mapping of (b) Al, (c) Y, (d) Ce and (e) O. |
Cycle(s) | 0 | 5 | 10 | 15 | 40 |
Al/(Y + Ce) | 1.38 | 1.43 | 1.51 | 1.60 | 1.76 |
Furthermore, cross section SEM by dual beam was performed on the 40 cycles coated sample, as shown in Fig. 5. The signal of Ga comes from the ions beam, which was utilized to section the YAG:Ce particle. According to the EDX examination, the ratio of Al/(Y + Ce) at the surface (spot 2) turns out to be about 3.7, while that in the bulk (spot 1) is about 1.34, which is in accordance with the Al/(Y + Ce) ratio determined for the uncoated sample (Table 1). A higher level of Al/(Y + Ce) ratio at the surface than in the inner part of the particle, demonstrates that Al2O3 had been deposited on the surface of the phosphor particle and Al2O3 thin layer coating with ALD is highly feasible.
To further study the thickness of the ALD coating, TEM images of the coated samples were made. Unfortunately, the alumina layers covering the surface of the YAG:Ce particles were too thin to be observed for 5 and 10 cycles coated samples. But after 15 cycles of ALD coating, a 2 nm coating layer was detected and a clearer layer with 5 nm thickness was found for the sample coated with Al2O3 for 40 cycles by ALD process, TEM images are shown in Fig. 6. Besides, the alumina coating layers of both samples processed after 15 and 40 cycles were uniform, tight, and homogeneous, indicating that the ALD process performed in a fluidized bed is a promising approach for covering protective materials on phosphor particles. The thickness of the coating layer on the particles after 15 and 40 cycles is about 2 nm and 5 nm, respectively, from which the thickness of a single layer coating within one cycle can be estimated to be about 0.13 nm.
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Fig. 7 Excitation and emission spectra of the uncoated and ALD coated YAG:Ce samples for different ALD cycles (5–40 cycles). |
Some experimental results from Zhang et al.36 confirm that the optical absorption behavior of phosphor composite materials can be largely dependent on the amount of Al2O3 compound. However, results achieved above indicate that the Al2O3 coating has no obvious affection on the luminescence properties of the sample. The reason might be that the alumina-coating layer is too thin to affect the light diffusion.
Nevertheless, the intensity of both excitation and emission bands show significant difference when comparing the uncoated and coated samples. The excitation and emission intensity continuously increase with increasing ALD cycle numbers, except for 40 cycles. After 40 cycles coating, the intensity dropped quite strongly and a value even lower than the uncoated phosphor was obtained. It can be concluded that alumina coating layer with controlled thickness of about 2 nm deposited via ALD process can benefit the luminescence properties, but too thick a coating will lower the excitation absorption as well as the emission radiation. The enhancement of emission intensity can be attributed to an increased absorption radiation, a larger quantum efficiency of absorbed radiation converted into emitted radiation and an improved light outcoupling of emitted radiation. But when the thickness of the covering went to 5 nm, the incident illumination and the emitted light were largely obstructed by the over protective covering, thus the intensity of both excitation and emission decreased rapidly.
A further illustration about the increased absorption strength is provided by the diffuse reflectance spectra of coated and uncoated samples as shown in Fig. 8. In comparison with the uncoated YAG:Ce sample, the Al2O3 coated ones with different number of cycles exhibit similar absorption profiles and band widths, confirming that the Al2O3 coating material has no significant effect on the absorption characteristics of YAG:Ce phosphor powder. As compared to the uncoated phosphor, the reflection (around 340 and 455 nm) decreased (i.e. adsorption around 340 and 455 nm increased) for higher number of ALD cycles, except for the 40 cycles sample (Table 2). All of the above results are in agreement with the conclusion made from Fig. 7, further confirming that the covering thickness of the alumina coating should be optimized since a high amount of Al2O3 can hamper the light absorption as well as the light emission (Table 2).
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Fig. 8 Diffuse reflectance spectra of the uncoated (0 cycles) and Al2O3 coated YAG:Ce samples for different ALD cycles (5–40 cycles). |
Number of coating cycles | Emission (arb. units) | Absorption at 460 nm | Relative quantum efficiency |
---|---|---|---|
0 cycle | 61![]() |
0.93 | 1.00 |
5 cycles | 63![]() |
0.94 | 1.01 |
10 cycles | 64![]() |
0.94 | 1.03 |
15 cycles | 66![]() |
0.95 | 1.06 |
40 cycles | 52![]() |
0.93 | 0.96 |
The relative quantum efficiency is estimated by comparing the emission intensity (EI) of the coated samples with that of the uncoated YAG:Ce phosphor powder from the equation below:
Fig. 9(d) summarizes the emission intensity at different temperatures of all samples according to the temperature-dependent emission spectra. The intensity of each sample was normalized to that exhibited at the starting temperature of 300 K for comparison. As shown in Fig. 9(d), although started at the same point, remarkable changes have already been observed for the alumina coated YAG:Ce phosphor powders after 50 degrees temperature increment. More than 5% intensity decrease was found for the uncoated phosphor, while the intensity of the 5 cycles sample dropped only about 2% and the intensity of samples with 10 and 15 cycles coating remained more or less constant. The thermal stability of the coated phosphor has been remarkably improved even for only 5 ALD coating cycles, and for higher ALD cycle numbers, better thermal stability can be achieved. Especially at elevated temperature of 550 K and 600 K, the emission intensity of the uncoated phosphor dropped rapidly to 47% and 32%, while that of the 40 cycles coated sample remained at a high value of 70% and 57%, respectively. The enhancement of thermal stability should be attributed to the effect of the thermal barrier coating of alumina formed by ALD process, which can keep the inner phosphor particles from directly exposure to the hot environment and protect Ce3+ against oxidization to Ce4+.
A phenomenon needs to be mentioned is that a lower relative emission intensity was exhibited by sample with 40 cycles coating than that of samples with 10 and 15 cycles coating during the temperature range of 300 K to 500 K, indicating that high thickness alumina layer coatings might impede the luminescence properties of the phosphor below 550 K. It has been reported that Al2O3 sometimes works like an insulator that can barrier the transfer of light, electrons or heat.34 This conclusion is in accordance with the results of the luminescence property analysis discussed above.
Fig. 10 schematically illustrates the mechanism of the enhancing emission intensity and thermal stability from the protective alumina layer for YAG:Ce phosphor. Firstly, coating the YAG:Ce phosphor powders with a thin Al2O3 layer with an appropriate thickness can increase the quantum efficiency due to reduced number of surface defects, enhance the light absorption and form a thermal barrier coating. Secondly, Al2O3 is kind of wide band gap oxide material, which could confine the inside excitation of the phosphor and suppress the ion–ion energy transfer (short range Forster transfer), ultimately decrease the non-radiative recombination. Finally, the lack of Ce ion in the outer coating shell would effectively suppress the energy transfer from the inner part of the particle to the outside surface. Combined the above three, the quantum efficiency, emission intensity as well as thermal stability of the phosphor can be remarkably improved.
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Fig. 10 Schematic diagram of enhancing of luminescence intensity coating Al2O3 layer by ALD process in YAG:Ce host. |
This journal is © The Royal Society of Chemistry 2016 |