Rick L.
Paul
Analytical Chemistry Division, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
First published on 24th November 2004
An instrument for cold neutron prompt gamma-ray activation analysis (PGAA), located at the NIST Center for Neutron Research (NCNR), has proven useful for the measurement of boron in a variety of materials. Neutrons, moderated by passage through liquid hydrogen at 20 K, pass through a 58Ni coated guide to the PGAA station in the cold neutron guide hall of the NCNR. The thermal equivalent neutron fluence rate at the sample position is 9 × 108 cm−2 s−1. Prompt gamma rays are measured by a cadmium- and lead-shielded high-purity germanium detector. The instrument has been used to measure boron mass fractions in minerals, in NIST SRM 2175 (Refractory Alloy MP-35-N) for certification of boron, and most recently in semiconductor-grade silicon. The limit of detection for boron in many materials is <10 ng g−1.
Prompt gamma-ray activation analysis (PGAA) is particularly sensitive to the measurement of boron mass fractions, with detection limits at ng g−1 levels. Although boron may also be determined by inductively coupled plasma mass spectrometry (ICP-MS) and inductively coupled plasma optical emission spectrometry (ICP-OES), PGAA has the advantage of being nondestructive, allowing boron to be analyzed in situ. Therefore the losses and contamination during chemical processing that are inherent in other techniques may be avoided. There is a theoretical disadvantage in that only 10B is measured.
Thermal neutron PGAA has been used at NIST since 1979 to determine boron in reference materials.1–4 An instrument for cold neutron PGAA, operational in the cold neutron guide hall of the NIST Center for Neutron Research (NCNR) since 1991, has the advantage of lower detection limits due to higher neutron capture rates and boron-free construction. This instrument is part of a national users’ facility and is available to scientists worldwide through submission of proposals The measurement of boron content of various materials by this instrument is the subject of this study.
PGAA was used to assign the boron mass fraction value in NIST SRM 2175 (Refractory Alloy MP-35-N) for the purpose of certification. The metal, an alloy of cobalt, nickel, chromium, and molybdenum, was in the form of small chips. Replicate portions, ≈50 mg each, were weighed into Teflon bags and sealed.
Boron-10 was determined at native levels in silicon as part of a CCQM (Comité Consultatif pour la Quantité de la Matière) study. The silicon wafer production industry commonly uses infrared (IR) spectroscopy, photoluminescence, and electrical resistivity methods to measure the boron content of silicon. However, these are not primary methods, and calibration factors are necessary to calculate the boron content of the silicon. The CCQM therefore commissioned the following pilot study in order to determine whether primary methods could be used to determine the mass fraction of boron in silicon. An unmodified 200 mm wafer material, designated CCQM-P33, supplied by a German silicon manufacturer was used in this study. The boron content, according to electrical resistivity measurements, was specified to be ω(B) ≈ 40 ng g−1; preliminary studies using ICP-MS yielded a boron mass fraction of 70 ng g−1. Samples (≈1 cm × 1 cm), obtained by breaking up one wafer, were distributed to participants in the study. Eight of these samples were measured by cold neutron PGAA. Samples for PGAA were cleaned by soaking in ethanol and ultrapure water, and were then allowed to dry. Each sample was then sealed into a Teflon bag.
All samples were mounted by suspension between Teflon strings and irradiated at the cold neutron PGAA station. Irradiation times, dependent on the sample size and amount of boron in the sample, varied from 2 h for the alloy samples to up to 2 d for the silicon. Changes in neutron fluence rate were monitored by periodic irradiation of a titanium foil. Over the course of a day, the Ti count rate variation was generally <0.5%.
In order to minimize the effects of neutron self shielding in the analysis of the refractory alloy SRM, the ratio of B to Co in the metal was measured.8 The boron standards prepared above were used in this analysis, along with a 46 mg Co foil (σcapture = 37 b). Additional standards for ratio measurement were prepared by mixing 0.9979 mL of cobalt solution (NIST spectrometric solution SRM 3113, 10.00 mg mL−1) with 0.0514 mL of the above mentioned boron solution and sealing the mixtures in Teflon bags.
NIST Standard Reference Material 2137 (Boron in Silicon Implant), certified at (0.01692 ± 0.000
89)
µg 10B cm−2, was used as a standard for the CCQM silicon samples. A 1 cm × 1 cm portion of the SRM was cleaned in the same manner as the silicon samples and sealed into a Teflon bag.
The boron background was not negligible in the analysis of the CCQM silicon, the background comprising about 10% of the total count rate. A major concern with these measurements was that the reagents used to clean the silicon samples and Teflon bags might actually introduce boron contamination. To settle this issue, two background measurements were made, one by irradiation of a Teflon bag without washing, and a second background by irradiation of a Teflon bag that had been washed and dried in the same manner as the samples. The boron count rates for the two bags were identical within counting statistics, indicating that washing did not add or remove a significant amount of boron. Thus we conclude that the irradiated bag represents a true background (blank) and that boron is not introduced by cleaning.
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Fig. 1 Boron peak measured in a boron standard (H3BO3/SiO2/graphite pellet). |
Element | Interference peak/keV | Reference peak(s)/keVa | Ratio (interference peak/reference peak)a |
---|---|---|---|
a The reference peaks used in the calculation of correction factors are also shown. | |||
Na | 472.2 | 874.3 | 9.4 |
Mo | 480.6, 480.9 | 778 | 0.046 |
Ni | 483.4 | 465 | 0.017 |
Co | 484.3 | 230, 277, 556 | 0.088 (230), 0.095 (277), 0.16 (556) |
Si | 477 | 752.2 | 0.044 |
Boron count rates for the mineral separates were corrected for a sodium interference at 472.2 keV (Fig. 2). This correction was relatively small for these materials, ≤5% of the total count rate for all but one of the samples measured.
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Fig. 2 Boron peak measured in a muscovite sample, with sodium interference. |
Boron count rates for the alloy samples were corrected for a large cobalt interference at 474.3 keV and smaller interferences from nickel (483.3 keV) and molybdenum (480.5 keV, 480.9 keV) (Fig. 3). The cobalt correction was about 50% of the count rate of the combined peak.
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Fig. 3 Boron peak measured in a sample of SRM 2175 (Refractory Alloy MP-35-N) with cobalt interference at 484 keV. |
For measurement of boron at nanogram levels in CCQM silicon, a silicon interference at 477 keV yielded a count rate equivalent to about 50% of the combined peak (Fig. 4). The correction factor was smaller for the SRM 2137 standard because of the higher boron-to-silicon ratio.
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Fig. 4 (a) Boron peak measured in a sample of CCQM silicon showing silicon interference. (b) Boron peak measured in SRM 2137 (Boron in Silicon Implant). |
Table 2 gives boron mass fractions determined for mineral separates. Mass fractions range from to 2 mg kg−1 to 200 mg kg−1. The boron mass fraction determined by PGAA for the control material, SRM 1633a (Coal Flyash), is in agreement with a consensus value reported by Gladney et al.11 Only one other independent boron measurement has been made on any of these samples (Kerrick's sillimanite by atomic absorption spectrometry (AAS)), and this measurement is in agreement with the PGAA value. Secondary ion mass spectroscopy (SIMS) measurements have been made on the sillimanite and muscovite samples, using the PGAA data for calibration (Fig. 5).
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Fig. 5 Calibration plot for measurement of boron in minerals by SIMS, using muscovite standards calibrated by PGAA. The broken line shows the linear calibration calculated only from the data. The continuous line, obtained by forcing the plot to pass through the origin, is the actual calibration used. |
Sample | Boron mass fraction/mg kg−1 | |
---|---|---|
PGAAc | Other measurements | |
a Atomic absorption measurement, J. Husler, University of New Mexico. (Private communication from Edward Grew, University of Maine.) b Consensus value from E. S. Gladney et al., ref. 10. c Expanded uncertainties (k = 2) were evaluated using uncertainties arising from counting statistics, irradiation geometry and variations in neutron fluence rate, sample inhomogeneity due to mixing, and preparation of standards. | ||
556 (sil) | 19.1 ± 1.2 | |
H-944 (sil) | 2.5 ± 0.2 | |
AD13 (sil) | 21.7 ± 1.4 | |
Kerrick's (sil) | 200 ± 7 | 200a |
2–8/7/63 (musc) | 45.0 ± 2.7 | |
22–8/7/58 (musc) | 43.8 ± 2.6 | |
6–8/7/63 (musc) | 48.3 ± 2.9 | |
17–8/14/59 (musc) | 63.4 ± 3.7 | |
7–8/5/59 (musc) | 29.3 ± 1.8 | |
7–8/3/59 (musc) | 32.8 ± 2.1 | |
27–9/10/59 (musc) | 19.8 ± 1.2 | |
5–9/20/61 (bio) | 11.1 ± 0.7 | |
16–7/18/60 (bio) | 17.1 ± 1.0 | |
7–8/5/59 (bio) | 2.0 ± 0.2 | |
Control material—SRM 1633a, Coal Flyash | 39.4 ± 2.1 | 40.3 ± 2.1b |
Table 3 gives boron mass fractions determined for SRM 2175 (Refractory Alloy MP-35-N). In order to minimize uncertainties due to neutron self shielding, the ratio of the boron mass fraction to the cobalt mass fraction was determined from the ratio of the boron/cobalt count rates measured in the sample and boron and cobalt sensitivities measured in a mixed standard. The boron mass fraction for each sample was then determined by normalizing this ratio to a cobalt mass fraction consensus value of 33.3% measured by ICP-OES, instrumental neutron activation analysis (INAA), and X-ray fluorescence (XRF). For the purpose of quality control, the boron/cobalt mass fraction ratio was also determined for SRM 349a (Waspaloy) with certified mass fractions of (0.005 ± 0.001)% for boron and (12.46 ± 0.08)% for cobalt. The ratio measured by PGAA was in agreement with the ratio of mass fractions calculated from the boron and cobalt certified values. The mean boron mass fraction of (95.2 ± 4.4) mg kg−1 determined for SRM 2175 was combined with measurements from outside laboratories to yield the certified value of (97 ± 23) mg kg−1.
Sample | (B mass fraction)/(Co mass fraction) | B mass fraction/mg kg−1 | |
---|---|---|---|
PGAAa | From certified valuesa | ||
a The expanded uncertainty (k = 2) for the final value was evaluated using uncertainties arising from measurement replication, determination of interference corrections, normalization to cobalt, gamma-ray attenuation, and preparation of standards. | |||
SRM 2175 9 | 0.000![]() |
93.5 | |
SRM 2175 178 | 0.000![]() |
94.6 | |
SRM 2175 268 | 0.000![]() |
93.8 | |
SRM 2175 416 | 0.000![]() |
94.9 | |
SRM 2175 442 | 0.000![]() |
97.6 | |
SRM 2175 449 | 0.000![]() |
96.6 | |
Average value | 0.000![]() |
95.2 | |
Final value | 95.2 ± 4.4 | ||
Control material—SRM 349a (Waspaloy) | 0.000![]() ![]() |
0.000![]() ![]() |
Table 4 gives boron-10 mass fractions determined in the CCQM silicon samples. The 10B/Si ratio was measured in order to minimize uncertainties. This ratio was determined by measuring the ratio of count rates of the boron 478 keV and silicon 1273 keV peaks in the samples and comparison of boron and silicon sensitivities determined from the SRM 2137 standard. A complete evaluation of uncertainties for 10B is given in Table 5. The mean 10B mass fraction was found to be (10.5 ± 1.7) × 10−9 g g−1 (expanded uncertainty). Assuming a natural atomic abundance of 0.199 for 10B, this corresponds to a mean mass fraction for total boron of 53 × 10−9 g g−1 . However, since ICP-MS measurements of the silicon indicate some deviation from normal isotopic composition, this value for total boron should be considered an approximation, and is listed only to give the reader a feel for the total boron content of the wafer.
Sample | 10B (×10−9 g g−1 |
---|---|
N02 | 10.0 |
N03 | 9.68 |
N04 | 11.5 |
N05 | 9.73 |
N06 | 10.8 |
N10 | 10.3 |
N12 | 11.0 |
N18 | 11.1 |
Average value | 10.5 |
Standard deviation | 0.7 |
Source of uncertainty | Uncertainty in 10B mass fraction × 10−9/g g−1 |
---|---|
Measurement replication (s/√n) | 0.24 |
Interference correction | 0.1 |
Background subtraction | 0.7 |
Standard: counting statistics | 0.32 |
Standard concentration | 0.17 |
Combined uncertainty | 0.84 |
Coverage factor | 2 |
Expanded uncertainty | 1.7 |
LOD = 4.65 (Rb/t)1/2/S |
Footnote |
† The identification of certain commercial equipment, instruments, or materials does not imply recommendation or endorsement by the National Institute of Standards and Technology. These identifications are made only in order to specify the experimental procedures in adequate detail. |
This journal is © The Royal Society of Chemistry 2005 |