Issue 17, 1986

Electrochemical fabrication of a polypyrrole–polythiophene p–n junction diode

Abstract

A p–n junction thin film was fabricated by sequential electrochemical polymerization of pyrrole and thiophene on a Pt substrate, followed by controlled-potential electrochemical doping to make the polypyrrole layer anion-doped and the polythiophene layer cation-doped.

Article information

Article type
Paper

J. Chem. Soc., Chem. Commun., 1986, 1315-1317

Electrochemical fabrication of a polypyrrole–polythiophene p–n junction diode

M. Aizawa, T. Yamada, H. Shinohara, K. Akagi and H. Shirakawa, J. Chem. Soc., Chem. Commun., 1986, 1315 DOI: 10.1039/C39860001315

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements