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Issue 39, 2016
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Direct nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation

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Abstract

In this communication, we report on the growth, direct writing and nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation using a scanning electron microscope. The nanoblocks are produced by placing a droplet of an ethylene glycol solution containing silver nitrate and polyvinylpyrrolidone diluted in ethanol directly on a hot substrate heated up to 150 °C. Upon complete evaporation of the droplet, nanospheres, nano- and micro-triangles and nanoblocks made of silver-containing polymers, form over the substrate surface. Considering the nanoblocks as a model system, we demonstrate that such nanostructures are extremely sensitive to the e-beam extracted from the source of a scanning electron microscope operating at low acceleration voltages (between 5 and 7 kV). This sensitivity allows us to efficiently create various nanopatterns (e.g. arrays of holes, oblique slits and nanotrenches) in the material under e-beam irradiation. In addition to the possibility of writing, the nanoblocks revealed a self-healing ability allowing them to recover a relatively smooth surface after etching. Thanks to these properties, such nanomaterials can be used as a support for data writing and erasing on the nanoscale under low energy electron beam irradiation.

Graphical abstract: Direct nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation

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Supplementary files

Article information


Submitted
19 Aug 2016
Accepted
02 Sep 2016
First published
07 Sep 2016

Nanoscale, 2016,8, 17108-17112
Article type
Communication

Direct nanopatterning of polymer/silver nanoblocks under low energy electron beam irradiation

A. El Mel, N. Stephant and R. Gautier, Nanoscale, 2016, 8, 17108 DOI: 10.1039/C6NR06582A

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