Issue 13, 2026, Issue in Progress

Recent advances and challenges in advanced oxidation processes for degradation of nano- and microplastics in water: a critical review

Abstract

This review consolidates recent advances in advanced oxidation processes (AOPs) for nanoplastic and microplastic (NMP) degradation, focusing on four major approaches: ozonation, photocatalysis, Fenton-based systems, and electrochemical oxidation. It critically examines how NMP characteristics, operational conditions, material design, and technological advancements influence system performance and degradation pathways. Ozonation of NMPs was enhanced through UV, ultrasound, or catalysts. Photocatalysis offers a sustainable route for degrading NMPs. Efforts such as heterojunction engineering, metal doping, and immobilization on various supports have improved activity and reusability, while multifunctional designs now allow simultaneous pollutant removal or hydrogen production. Fenton-based processes, particularly photo- and heterogeneous systems, extend operational flexibility and reduce iron leaching, but their NMP removal performance remains inconsistent, and emerging variants such as self-Fenton and bio-Fenton are still hampered by high energy requirements, slow kinetics, and scalability issues. Electrochemical oxidation of NMPs provides direct and indirect oxidative routes, with advances in electrode design, ranging from layered double hydroxides to doped-metal oxides, improving radical generation and durability. Hybrid electrochemical systems that combine sonication, oxidants, and membranes show further promise, though unresolved challenges include electrode leakage, reliance on indirect performance metrics, harsh operational conditions, and high energy use. Across all methods, integrated systems and advanced analytical tools are increasingly applied to enhance efficiency and clarify mechanisms. This review also highlights remaining knowledge gaps and proposes future directions, including the adoption of advanced analysis, standardized evaluation, and the development of scalable, cost-effective designs to ensure the safe and practical deployment of AOPs for NMP remediation.

Graphical abstract: Recent advances and challenges in advanced oxidation processes for degradation of nano- and microplastics in water: a critical review

Supplementary files

Transparent peer review

To support increased transparency, we offer authors the option to publish the peer review history alongside their article.

View this article’s peer review history

Article information

Article type
Review Article
Submitted
03 Dec 2025
Accepted
20 Feb 2026
First published
05 Mar 2026
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2026,16, 11874-11896

Recent advances and challenges in advanced oxidation processes for degradation of nano- and microplastics in water: a critical review

T. N. Bao Dung, T. T. Huyen Nguyen, Q. V. Ly, H. L. Ong and H. B. Truong, RSC Adv., 2026, 16, 11874 DOI: 10.1039/D5RA09364C

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements