Issue 10, 2024

A thermodynamically favorable route to the synthesis of nanoporous graphene templated on CaO via chemical vapor deposition

Abstract

Template-assisted chemical vapor deposition (CVD) is a promising approach for fabricating nanoporous materials based on graphene walls. Among conventional metal oxide templates, CaO, produced through the thermal decomposition of CaCO3, offers improved environmental sustainability and lower production costs, thereby potentially making it a viable candidate for green template materials. Nevertheless, the underlying reaction mechanisms of the interaction on the CaO surface during the CVD process remain indeterminate, giving rise to challenges in regulating graphene formation and obtaining high-quality materials. In this work, a comprehensive experimental–theoretical investigation has unveiled the CVD mechanism on CaO. CaO exhibits efficient catalytic activity in the dissociation of CH4, thereby facilitating a thermodynamically favorable conversion of CH4 to graphene. These findings highlight the potential of using CaO as a substrate for graphene growth, combining both sustainability and cost-effectiveness. When the shell-like graphene layer deposited on CaO particles is released through the dissolution of CaO with HCl, the resulting nanoporous graphene-based materials can be readily compacted by the capillary force of the liquid upon drying. The folded surfaces, however, can become available for electric double-layer capacitance via electrochemical exfoliation under a low applied potential (<1.2 V vs. Ag/AgClO4).

Graphical abstract: A thermodynamically favorable route to the synthesis of nanoporous graphene templated on CaO via chemical vapor deposition

Supplementary files

Article information

Article type
Paper
Submitted
09 Jan 2024
Accepted
29 Mar 2024
First published
11 Apr 2024
This article is Open Access
Creative Commons BY-NC license

Green Chem., 2024,26, 6051-6062

A thermodynamically favorable route to the synthesis of nanoporous graphene templated on CaO via chemical vapor deposition

K. Pirabul, Q. Zhao, S. Sunahiro, Z. Pan, T. Yoshii, Y. Hayasaka, E. Hoi-Sing Pang, R. Crespo-Otero, D. Di Tommaso, T. Kyotani and H. Nishihara, Green Chem., 2024, 26, 6051 DOI: 10.1039/D4GC00116H

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