Issue 50, 2023, Issue in Progress

Preparation and performance of semiconductor device bonding joints based on Cu@Sn@Ag preform

Abstract

Herein, a 110 A commercial, Si continuous current diode with high heat dissipation power is attached to Cu@Sn@Ag preform, formed by electroplating and physical vapor deposition, and pressed into a preformed sheet under a pressure of 5–10 MPa. The prepared dense three-dimensional network of Cu/Cu3Sn/Ag3Sn joint, based on Cu@Sn@Ag preform obtained using transient liquid-phase diffusion soldering technology, can withstand high temperatures up to 600 °C in power device applications. The mechanical and thermal performance and power cycle reliability of the Cu@Sn@Ag joint are investigated and comparatively analyzed with PbSn5Ag2.5 joints. The results show that the average shear strength of the Cu@Sn@Ag joint is ∼35 MPa, which exceeds that of PbSn5Ag2.5 solder joint, and is similar to that of sintered nano-silver solder joint; the minimum thermal resistance of the corresponding device is ∼0.18 K W−1, near to that of PbSn5Ag2.5 joint. The growth rate of the forward voltage drops below 2% following 150 000 active power cycles, with a junction temperature difference below 60 °C, meeting the requirements of reliability test standards for vehicle specifications. It is concluded that the performance and power cycle reliability of the Cu@Sn@Ag joint are better than those of the PbSn5Ag2.5 joint.

Graphical abstract: Preparation and performance of semiconductor device bonding joints based on Cu@Sn@Ag preform

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Article information

Article type
Paper
Submitted
11 Oct 2023
Accepted
16 Nov 2023
First published
07 Dec 2023
This article is Open Access
Creative Commons BY license

RSC Adv., 2023,13, 35683-35688

Preparation and performance of semiconductor device bonding joints based on Cu@Sn@Ag preform

H. Zhang, H. Xu, T. Wang and S. Wang, RSC Adv., 2023, 13, 35683 DOI: 10.1039/D3RA06909E

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