Plasmonic heterostructure Bi2S3/Ti3C2 with continuous photoelectron injection mediated near-infrared self-powered photoelectrochemical sensing

Ding Jiang; Yude Zhang; Xiaojiao Du; Linhua Zhang; Xueling Shan; Wenchang Wang; Hiroshi Shiigi; Zhidong Chen

doi:10.1039/D2CC05683F

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Plasmonic heterostructure Bi₂S₃/Ti₃C₂ with continuous photoelectron injection mediated near-infrared self-powered photoelectrochemical sensing†

Ding Jiang,^a Yude Zhang,^a Xiaojiao Du,^b Linhua Zhang,^a Xueling Shan,^a Wenchang Wang,^a Hiroshi Shiigi

^c and Zhidong Chen

*^a

Author affiliations

* Corresponding authors

^a Jiangsu Key Laboratory of Advanced Catalytic Materials and Technology, School of Petrochemical Engineering, Changzhou University, Changzhou, Jiangsu, P. R. China
E-mail: zdchen@cczu.edu.cns

^b Oakland International Associated Laboratory, School of Photoelectric Engineering, Changzhou Institute of Technology, Changzhou, Jiangsu, P. R. China

^c Department of Applied Chemistry, Osaka Prefecture University, 1-2 Gakuen, Naka, Sakai, Osaka 599-8570, Japan

Abstract

Herein, a novel near-infrared (NIR) self-powered photoelectrochemical platform was constructed based on nonmetallic plasmon Ti₃C₂ MXene coupled with sulphur vacancy engineered Bi₂S₃. The continuous photoelectron injection from Bi₂S₃ to Ti₃C₂ MXene induced a stable SPR effect and high photoelectric conversion efficiency, which is beneficial for developing high-performance NIR self-powered biosensors. As a proof of concept, a sensitive NIR self-powered sensor was constructed by conjunction with an aptamer using Microcystin-RR as a model analyte, which is one of the most common and toxic hepatotoxins released by cyanobacteria.

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Article information

DOI: https://doi.org/10.1039/D2CC05683F
Article type: Communication
Submitted: 19 Oct 2022
Accepted: 03 Jan 2023
First published: 03 Jan 2023

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Chem. Commun., 2023,59, 1185-1188

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Plasmonic heterostructure Bi₂S₃/Ti₃C₂ with continuous photoelectron injection mediated near-infrared self-powered photoelectrochemical sensing

D. Jiang, Y. Zhang, X. Du, L. Zhang, X. Shan, W. Wang, H. Shiigi and Z. Chen, Chem. Commun., 2023, 59, 1185 DOI: 10.1039/D2CC05683F

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