Issue 29, 2021, Issue in Progress

Morphology and surface analyses for CH3NH3PbI3 perovskite thin films treated with versatile solvent–antisolvent vapors

Abstract

Organometal halide perovskite (CH3NH3PbI3) semiconductors have been promising candidates as a photoactive layer for photovoltaics. Especially for high performance devices, the crystal structure and morphology of this perovskite layer should be optimized. In this experiment, by employing solvent–antisolvent vapor techniques during a modified sequential deposition of PbI2–CH3NH3I layers, the morphology engineering was carried out as a function of antisolvent species such as: chloroform, chlorobenzene, dichlorobenzene, toluene, and diethyl ether. Then, the optical, morphological, structural, and surface properties were characterized. When dimethyl sulfoxide (DMSO, solvent) and diethyl ether (antisolvent) vapors were employed, the CH3NH3PbI3 layer exhibited relatively desirable crystal structures and morphologies, resulting in an optical bandgap (Eg) of 1.61 eV, crystallite size (t) of 89.5 nm, and high photoluminescence (PL) intensity. Finally, the stability of perovskite films toward water was found to be dependent on the morphologies with defects such as grain boundaries, which was evaluated through contact angle measurement.

Graphical abstract: Morphology and surface analyses for CH3NH3PbI3 perovskite thin films treated with versatile solvent–antisolvent vapors

Article information

Article type
Paper
Submitted
04 Apr 2021
Accepted
12 May 2021
First published
17 May 2021
This article is Open Access
Creative Commons BY license

RSC Adv., 2021,11, 17789-17799

Morphology and surface analyses for CH3NH3PbI3 perovskite thin films treated with versatile solvent–antisolvent vapors

N. Awol, C. Amente, G. Verma and J. Y. Kim, RSC Adv., 2021, 11, 17789 DOI: 10.1039/D1RA02645C

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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