Issue 12, 2021

Self-defect-healing of silicalite-1 membrane in alkaline aqueous solution with surfactant

Abstract

Alkaline treatment with surfactant was applied to silicalite-1 membrane for defect healing. By immersion of silicalite-1 membrane into an aqueous solution of sodium hydroxide and cetyltrimethylammonium bromide (CTAB), defects among crystals were sealed, with amorphous silica leached from the membrane itself. During the treatment, the zeolite pores in the membrane were protected by CTAB from excess alkaline etching. As a result, the separation performance of silicalite-1 membrane was successfully improved by this post-treatment without a decrease in permeability due to the collaborative effect of NaOH and CTAB. The separation factor for n-hexane/2,3-dimethylbutane mixture increased from 86.5 to 559 after only a 15 min treatment. In addition, the separation performances of other zeolite membranes (Na-*BEA, Na-ZSM-5, and Na-MOR) were also improved by the treatment. This novel defect-healing technique breaks the trade-off line of permeation and separation performance observed with previous post-treatments.

Graphical abstract: Self-defect-healing of silicalite-1 membrane in alkaline aqueous solution with surfactant

Supplementary files

Article information

Article type
Paper
Submitted
19 Apr 2021
Accepted
17 May 2021
First published
18 May 2021
This article is Open Access
Creative Commons BY-NC license

Mater. Adv., 2021,2, 3892-3897

Self-defect-healing of silicalite-1 membrane in alkaline aqueous solution with surfactant

M. Sakai, H. Hori and M. Matsukata, Mater. Adv., 2021, 2, 3892 DOI: 10.1039/D1MA00364J

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