Issue 8, 2021

Strain-controlled electronic and magnetic properties of tVS2/hVS2 van der Waals heterostructures

Abstract

The structural, electronic and magnetic properties of the T-phase and H-phase of the VS2 monolayer and their heterobilayers are studied by means of first-principles calculations. We find that the two phases of the VS2 monolayer are both ferromagnetic (FM) semiconductors and that these two monolayers form a typical van der Waals (vdW) heterostructure with a weak interlayer interaction. By comparing the energy of different magnetic configurations, the FM state of the tVS2/hVS2 heterostructure is found to be in the ground state under normal conditions or biaxial strains. Under compressive strains, the anti-FM (AFM) and FM states degenerate. Based on the band structure obtained and the work function, it is found that the T-phase and H-phase are capable of forming an efficient p–n heterostructure. Due to spontaneous charge transfer at the interface, a gapless semiconductor is formed in our HSE06 calculations. We also find that the twist angle between the monolayers has a negligible impact on the band structure of the heterostructure in its spin-down channel. Moreover, the tVS2/hVS2 heterostructure is found to switch from a gapless semiconductor to a metal or a half-metal under some given biaxial or uniaxial strains. Therefore, the heterostructure could be a half-metallic property with strains, realizing 100% polarization at the Fermi level. Our study provides the possibility of realizing 100% spin-polarization at the Fermi level in these FM vdW heterostructures, which is significant for further spin transport exploration.

Graphical abstract: Strain-controlled electronic and magnetic properties of tVS2/hVS2 van der Waals heterostructures

Supplementary files

Article information

Article type
Paper
Submitted
14 Oct 2020
Accepted
28 Jan 2021
First published
29 Jan 2021

Phys. Chem. Chem. Phys., 2021,23, 4669-4680

Strain-controlled electronic and magnetic properties of tVS2/hVS2 van der Waals heterostructures

D. Jin, M. Shi, P. Li, H. Zhao, M. Shen, F. Ma, Z. Tian and Y. Liu, Phys. Chem. Chem. Phys., 2021, 23, 4669 DOI: 10.1039/D0CP05395C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements