Cl− modification for effective promotion of photoelectrochemical water oxidation over BiVO4

Zhe Li; Qiqi Zhang; Xin Chen; Fang Yang; Defa Wang; Lequan Liu; Jinhua Ye

doi:10.1039/D0CC05334A

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Cl⁻ modification for effective promotion of photoelectrochemical water oxidation over BiVO₄†

Zhe Li,^ab Qiqi Zhang,^ab Xin Chen,^ab Fang Yang,^ab Defa Wang,

^ab Lequan Liu

*^ab and Jinhua Ye

^abc

Author affiliations

* Corresponding authors

^a TJU-NIMS International Collaboration Laboratory, Key Laboratory of Advanced Ceramics and Machining Technology (Ministry of Education) and Tianjin Key Laboratory of Composite and Functional Materials, School of Material Science and Engineering, Tianjin University, Tianjin 300072, China
E-mail: Lequan.Liu@tju.edu.cn

^b Collaborative Innovation Centre of Chemical Science and Engineering (Tianjin), Tianjin 300072, China

^c International Centre for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science (NIMS), Japan

Abstract

Postsynthetic treatment is an attractive method to enhance photoelectrochemical water splitting. The facile Cl⁻ modification approach developed in this work remarkably promotes the photocurrent density of BiVO₄ up to 2.7 mA cm⁻² by facilitating carrier transfer in addition to a charge carrier separation efficiency enhancement.

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Article information

DOI: https://doi.org/10.1039/D0CC05334A
Article type: Communication
Submitted: 05 Aug 2020
Accepted: 22 Sep 2020
First published: 23 Sep 2020

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Chem. Commun., 2020,56, 13153-13156

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Cl⁻ modification for effective promotion of photoelectrochemical water oxidation over BiVO₄

Z. Li, Q. Zhang, X. Chen, F. Yang, D. Wang, L. Liu and J. Ye, Chem. Commun., 2020, 56, 13153 DOI: 10.1039/D0CC05334A

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Chemical Communications