Issue 16, 2018, Issue in Progress

Adsorption of Cd2+ by an ion-imprinted thiol-functionalized polymer in competition with heavy metal ions and organic acids

Abstract

The simultaneous presence of heavy metals and organic acids in nature and wastewaters and their competition for adsorption sites determine the migration, transformation and fate of pollutants in the environment. A Cd2+-ion-imprinted polymer (Cd2+-IIP) with a thiol-functional group was hydrothermally synthesized by a surface imprinting technique combined with ultrasonic heating for selective adsorption of Cd2+ from wastewaters. The adsorbent was characterized by SEM, EDS, XPS, BET and FT-IR measurements. The experimental results concerning Cd2+ adsorption from single-, binary-, ternary- and quaternary-metal aqueous solutions containing Cu2+, Ni2+ and Zn2+ revealed high selectivity. In binary-metal solutions, relative selectivity coefficients for Cd2+ in respect to Cd2+/Cu2+, Cd2+/Ni2+, and Cd2+/Zn2+ were as high as 3.74, 5.73 and 4.15, respectively. In multi-metal solutions, competing heavy metal ions had little effect on the adsorption of Cd2+ attributed to the high selectivity of Cd2+-IIP towards Cd2+ determined by its coordination geometry. The effect of low-molecular weight organic acids on the Cd2+ adsorption was also studied and the results showed that the presence of tartaric, citric and oxalic acids as admixtures in Cd2+ aqueous solutions noticeably reduced the cation adsorption in a wide range of concentrations with the minor exception of low contents of citric and tartaric acids slightly improving adsorption.

Graphical abstract: Adsorption of Cd2+ by an ion-imprinted thiol-functionalized polymer in competition with heavy metal ions and organic acids

Article information

Article type
Paper
Submitted
26 Oct 2017
Accepted
12 Feb 2018
First published
28 Feb 2018
This article is Open Access
Creative Commons BY license

RSC Adv., 2018,8, 8950-8960

Adsorption of Cd2+ by an ion-imprinted thiol-functionalized polymer in competition with heavy metal ions and organic acids

Q. Kong, B. Xie, S. Preis, Y. Hu, H. Wu and C. Wei, RSC Adv., 2018, 8, 8950 DOI: 10.1039/C7RA11811B

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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