Issue 1, 2015
From the journal:

RSC Advances

Novel carbazole-based two-photon photosensitizer for efficient DNA photocleavage in anaerobic condition using near-infrared light†

Yong-Chao Zheng,ad   Mei-Ling Zheng,*a   Ke Li,bd   Shu Chen,a   Zhen-Sheng Zhao,a   Xue-Song Wangb  and  Xuan-Ming Duan*ac  

* Corresponding authors

a Laboratory of Organic NanoPhotonics and Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, No. 29 Zhongguancun East Road, Beijing 100190, P. R. China
E-mail: zhengmeiling@mail.ipc.ac.cn, xmduan@mail.ipc.ac.cn
Fax: +86-10-82543597
Tel: +86-10-82543596

b Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, No. 29 Zhongguancun East Road, Beijing 100190, P. R. China

c Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, No. 266 Fangzheng Ave, Shuitu Technology Development Zone, Beibei District, Chongqing 400714, P. R. China

d University of Chinese Academy of Sciences, No. 29 Zhongguancun East Road, Beijing 100190, P. R. China

Abstract

Two novel carbazole derivatives, BMEPC and BMEMC, were designed, synthesized and first reported as two-photon photosensitizers for DNA photodamage, which showed efficient DNA photocleavage ability under near-infrared light exposure via a two-photon process in anaerobic condition.

Graphical abstract: Novel carbazole-based two-photon photosensitizer for efficient DNA photocleavage in anaerobic condition using near-infrared light

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Article information

DOI
https://doi.org/10.1039/C4RA11133H
Article type
Communication
Submitted
24 Sep 2014
Accepted
18 Nov 2014
First published
19 Nov 2014

RSC Adv., 2015,5, 770-774

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Novel carbazole-based two-photon photosensitizer for efficient DNA photocleavage in anaerobic condition using near-infrared light

Y. Zheng, M. Zheng, K. Li, S. Chen, Z. Zhao, X. Wang and X. Duan, RSC Adv., 2015, 5, 770 DOI: 10.1039/C4RA11133H

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