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Issue 36, 2014
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High power nano-structured V2O5 thin film cathodes by atomic layer deposition

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Abstract

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C. The resulting films were strongly textured and rough without application of a template. The best electrochemical performance was observed for 10 nm nano-structured V2O5, that could sustain discharge rates up to 960 C while maintaining 20% of the initial 1 C capacity. The optimized cathode endured a discharge rate of 120 C for more than 1500 cycles while maintaining more than 80% of capacity, proving the rare combination of both high discharge rates and long life time simultaneously. The growth mechanism of the VO(thd)2 and ozone provides a highly textured surface consisting of platelets of V2O5 providing a large contact area towards the electrolyte. The current V2O5 films show potential as cathodes in thin film micro batteries.

Graphical abstract: High power nano-structured V2O5 thin film cathodes by atomic layer deposition

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Publication details

The article was received on 09 Feb 2014, accepted on 11 Jul 2014 and first published on 22 Jul 2014


Article type: Paper
DOI: 10.1039/C4TA00694A
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J. Mater. Chem. A, 2014,2, 15044-15051
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    High power nano-structured V2O5 thin film cathodes by atomic layer deposition

    E. Østreng, K. B. Gandrud, Y. Hu, O. Nilsen and H. Fjellvåg, J. Mater. Chem. A, 2014, 2, 15044
    DOI: 10.1039/C4TA00694A

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