Issue 36, 2014

High power nano-structured V2O5 thin film cathodes by atomic layer deposition

Abstract

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C. The resulting films were strongly textured and rough without application of a template. The best electrochemical performance was observed for 10 nm nano-structured V2O5, that could sustain discharge rates up to 960 C while maintaining 20% of the initial 1 C capacity. The optimized cathode endured a discharge rate of 120 C for more than 1500 cycles while maintaining more than 80% of capacity, proving the rare combination of both high discharge rates and long life time simultaneously. The growth mechanism of the VO(thd)2 and ozone provides a highly textured surface consisting of platelets of V2O5 providing a large contact area towards the electrolyte. The current V2O5 films show potential as cathodes in thin film micro batteries.

Graphical abstract: High power nano-structured V2O5 thin film cathodes by atomic layer deposition

Supplementary files

Article information

Article type
Paper
Submitted
09 Feb 2014
Accepted
11 Jul 2014
First published
22 Jul 2014
This article is Open Access
Creative Commons BY license

J. Mater. Chem. A, 2014,2, 15044-15051

Author version available

High power nano-structured V2O5 thin film cathodes by atomic layer deposition

E. Østreng, K. B. Gandrud, Y. Hu, O. Nilsen and H. Fjellvåg, J. Mater. Chem. A, 2014, 2, 15044 DOI: 10.1039/C4TA00694A

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