- Article type
- 13 Jul 2012
- 14 Aug 2012
- First published
- 15 Aug 2012
Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films
X. Deng, J. M. Buriak, P. Dai, L. Wan and D. Wang, Chem. Commun., 2012, 48, 9741 DOI: 10.1039/C2CC35010F
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