Issue 8, 2011
From the journal:

Chemical Communications

Electrochemically-deposited benzophenone moieties: precursors for dual mode patterning of polymer brushes on conducting surfaces†

Maria Celeste Tria,a   Jin Young Parka  and  Rigoberto Advincula*a  

* Corresponding authors

a Department of Chemistry and Department of Chemical and Biomolecular Engineering, University of Houston, TX 77204-5003, USA
E-mail: radvincula@uh.edu
Fax: +1 713-743-1755
Tel: +1 713-743-1760

Abstract

A new method for patterning polymer brushes on conducting surfaces via electro-deposited benzophenone moieties is reported. The dual patterning capability of the technique was demonstrated and characterized via the AFM and for the first time, an IR-imaging technique for a patterned brush.

Graphical abstract: Electrochemically-deposited benzophenone moieties: precursors for dual mode patterning of polymer brushes on conducting surfaces

About
Cited by
Related
Download options Please wait...

Supplementary files

Article information

DOI
https://doi.org/10.1039/C0CC04046K
Article type
Communication
Submitted
24 Sep 2010
Accepted
14 Nov 2010
First published
02 Dec 2010

Chem. Commun., 2011,47, 2393-2395

Permissions

Request permissions

Electrochemically-deposited benzophenone moieties: precursors for dual mode patterning of polymer brushes on conducting surfaces

M. C. Tria, J. Y. Park and R. Advincula, Chem. Commun., 2011, 47, 2393 DOI: 10.1039/C0CC04046K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements