Issue 16, 2010
From the journal:

Chemical Communications

Edge-differentiating deposition of Co on SiO2-supported MoS2 particles

Yasuaki Okamoto,*a   Kenta Tamuraa  and  Takeshi Kubotaa  

* Corresponding authors

a Department of Material Science, Shimane University, Matsue 690-8504, Japan
E-mail: yokamoto@riko.shimane-u.ac.jp
Fax: +81-852-32-6466
Tel: +81-852-32-6466

Abstract

The chemical vapor deposition of Co(CO)3NO under controlled conditions onto MoS2catalysts supported on SiO2 achieves the edge-differentiating deposition of Co between (10[1 with combining macron]0) and ([1 with combining macron]010) edges of MoS2 particles, the former edge being preferentially decorated by Co at a low Co content to form a catalytically “active” structure for hydrodesulfurization.

Graphical abstract: Edge-differentiating deposition of Co on SiO2-supported MoS2 particles

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Article information

DOI
https://doi.org/10.1039/B924925G
Article type
Communication
Submitted
26 Nov 2009
Accepted
23 Dec 2009
First published
25 Jan 2010

Chem. Commun., 2010,46, 2748-2750

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Edge-differentiating deposition of Co on SiO2-supported MoS2 particles

Y. Okamoto, K. Tamura and T. Kubota, Chem. Commun., 2010, 46, 2748 DOI: 10.1039/B924925G

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