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A self-propagating system for Ge incorporation into nanostructured silica†
Abstract
Technologically-relevant levels of Ge can be incorporated into cell wall
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Supplementary files
Article information
- Article type
- Communication
- Submitted
- 26 Mar 2008
- Accepted
- 01 Jul 2008
- First published
- 04 Aug 2008
Chem. Commun., 2008, 4495-4497
Permissions
A self-propagating system for Ge incorporation into nanostructured silica
A. K. Davis and M. Hildebrand, Chem. Commun., 2008, 4495 DOI: 10.1039/B804955F
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