Epitaxial electro-optical BaTiO3 films by single-source metal–organic chemical vapour deposition

Abstract

Chemical vapour deposition (CVD) is a promising process for the production of ferroelectric complex oxide films having a large electro-optical coefficient. We report the epitaxial growth of high-quality BaTiO ₃ films using a single-source CVD process. A variety of epitaxial relationships have been achieved with BaTiO ₃ films grown cube-on-cube on substrates of large lattice mismatched LaAlO ₃ and MgO, and «001», «110» and «111» oriented SrTiO ₃ . A large quadratic electro-optic coefficient was measured for CVD-prepared BaTiO ₃ films. These films also have values of the optic refractive indices and second electro-optic susceptibilities close to those of bulk BaTiO ₃ crystals, indicating their excellent quality.