Issue 24, 2019

Halogen bonding in UiO-66 frameworks promotes superior chemical warfare agent simulant degradation

Abstract

Herein, a series of halogenated UiO-66 derivatives was synthesized and analyzed for the breakdown of the chemical warfare agent simulant dimethyl-4-nitrophenyl phosphate (DMNP) to analyze ligand effects. UiO-66-I degrades DMNP at a rate four times faster than the most active previously reported MOFs. MOF defects were quantified and ruled out as a cause for increased activity. Theoretical calculations suggest the enhanced activity of UiO-66-I originates from halogen bonding of the iodine atom to the phosphoester linkage allowing for more rapid hydrolysis of the P–O bond.

Graphical abstract: Halogen bonding in UiO-66 frameworks promotes superior chemical warfare agent simulant degradation

Supplementary files

Article information

Article type
Communication
Submitted
24 জানু. 2019
Accepted
21 ফেব্রু. 2019
First published
21 ফেব্রু. 2019

Chem. Commun., 2019,55, 3481-3484

Author version available

Halogen bonding in UiO-66 frameworks promotes superior chemical warfare agent simulant degradation

M. Kalaj, M. R. Momeni, K. C. Bentz, K. S. Barcus, J. M. Palomba, F. Paesani and S. M. Cohen, Chem. Commun., 2019, 55, 3481 DOI: 10.1039/C9CC00642G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements