Issue 7, 2021

The influence of additives on orthogonal reaction pathways in the Mizoroki–Heck arylation of vinyl ethers

Abstract

The Mizoroki–Heck arylation of electron-rich alkenes such as butyl vinyl ether often results in regioisomeric mixtures of products under typical reaction conditions. To discover new catalytic systems for achieving α-selective arylation, an alternative approach to generating aryl methyl ketones, we have combined microscale high-throughput experimentation with mechanistic studies on a model system. A specific combination of catalyst, solvent, base, and additives was found to be crucial for both activity and selectivity, especially when translating screening hits into preparative-scale synthesis.

Graphical abstract: The influence of additives on orthogonal reaction pathways in the Mizoroki–Heck arylation of vinyl ethers

Supplementary files

Article information

Article type
Paper
Submitted
31 মার্চ 2021
Accepted
29 এপ্রিল 2021
First published
30 এপ্রিল 2021

React. Chem. Eng., 2021,6, 1212-1219

The influence of additives on orthogonal reaction pathways in the Mizoroki–Heck arylation of vinyl ethers

J. Becica, O. D. Glaze, D. P. Hruszkewycz, G. E. Dobereiner and D. C. Leitch, React. Chem. Eng., 2021, 6, 1212 DOI: 10.1039/D1RE00124H

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements