Issue 1, 2009

Ordering domains of spin cast blends of conjugated and dielectric polymers on surfaces patterned by soft- and photo-lithography

Abstract

Spin casting polymer blends of conjugated and dielectric macromolecules onto chemically patterned metal and oxidized silicon surfaces might provide a simple method to fabricate polymer-based circuitries that can be integrated with conventional electronics. Such solution-processing of the blend components offers simultaneous deposition and pattern-directed alignment of the phase separated polymer domains. The alignment is driven by self-organization guided by preferential surface segregation. Here we demonstrate that the laterally arranged domain structures in spin cast films of the conjugated poly(3-alkylthiophenes) (P3ATs): P3BT, P3DDT and regioregular R-P3HT, blended with dielectric polystyrene (PS), can be ordered by three different surface templates. The templates are formed by a patterned self-assembled monolayer (SAM), micro-contact printed on the surface of interest, i.e. hexadecanethiols on gold (for alignment of P3DDT/PS blend) and octadecyltrichlorosilanes on oxidized silicon (for R-P3HT/PS). Additionally gold lines are micro-patterned on SiO2 with photo-lithography (for P3BT/PS mixture). The forces driving pattern-directed self-organization of the polymers are discussed based on complementary studies of preferential surface segregation, observed for blend films spin cast on homogeneous surfaces that correspond to the different regions of the surface templates.

Graphical abstract: Ordering domains of spin cast blends of conjugated and dielectric polymers on surfaces patterned by soft- and photo-lithography

Article information

Article type
Paper
Submitted
04 Jul 2008
Accepted
27 Aug 2008
First published
20 Oct 2008

Soft Matter, 2009,5, 234-241

Ordering domains of spin cast blends of conjugated and dielectric polymers on surfaces patterned by soft- and photo-lithography

J. Jaczewska, A. Budkowski, A. Bernasik, I. Raptis, E. Moons, D. Goustouridis, J. Haberko and J. Rysz, Soft Matter, 2009, 5, 234 DOI: 10.1039/B811429C

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