Issue 43, 2008
From the journal:

Journal of Materials Chemistry

Flexible deposition of nanocrystalline vanadium oxide thin films

Yuri Diaz-Fernandez,a   Lorenzo Malavasi*a  and  Eliana Quartaronea  

* Corresponding authors

a Universita Di Pavia, Dipartimento Di Chimica Fisica, Viale Taramelli, 16, Pavia, Italy
E-mail: lorenzo.malavasi@unipv.it
Fax: +39 0382-507 575
Tel: +39 0382-507 921

Abstract

We have investigated the rf sputtering deposition of V2O3, VO2 and V2O5 from metallic V as target material, and we present the results related to the optimal conditions for the deposition of the three oxides.

Graphical abstract: Flexible deposition of nanocrystalline vanadium oxide thin films

About
Cited by
Related
Download options Please wait...

Article information

DOI
https://doi.org/10.1039/B812419A
Article type
Communication
Submitted
21 Jul 2008
Accepted
02 Oct 2008
First published
10 Oct 2008

J. Mater. Chem., 2008,18, 5190-5192

Permissions

Request permissions

Flexible deposition of nanocrystalline vanadium oxide thin films

Y. Diaz-Fernandez, L. Malavasi and E. Quartarone, J. Mater. Chem., 2008, 18, 5190 DOI: 10.1039/B812419A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements